Structure and Phase Composition Study of Heavy Doped with Carbon Thin Films of TiO2 : C Deposited by RF Magnetron Sputtering

作     者：Milenov, T. Terziyska, P. Avdeev, G. Karashanova, D. Georgieva, B. Avramova, I. Genkov, K. Valcheva, E. 

作者机构：Bulgarian Acad Sci Acad Emil Djakov Inst Elect Sofia 1784 Bulgaria Bulgarian Acad Sci Georgi Nadjakov Inst Solid State Phys Sofia 1784 Bulgaria Bulgarian Acad Sci Rostislav Kaishev Inst Phys Chem Sofia 1113 Bulgaria Bulgarian Acad Sci Acad Jordan Malinowski Inst Opt Mat & Technol Sofia 1113 Bulgaria Bulgarian Acad Sci Inst Gen & Inorgan Chem Sofia 1113 Bulgaria Sofia Univ St Klinemt Ohridski Sofia 1164 Bulgaria 

出 版 物：《RUSSIAN JOURNAL OF INORGANIC CHEMISTRY》 (俄罗斯无机化学杂志)

年 卷 期：2022年第67卷第10期

页      面：1509-1520页

核心收录：

学科分类：081704[工学-应用化学] 07[理学] 08[工学] 0817[工学-化学工程与技术] 0703[理学-化学] 070301[理学-无机化学] 

基　　金：National Science Fund of Bulgaria, research equipment of Distributed Research Infrastructure INFRAMAT, part of Bulgarian National Roadmap for Research Infrastructures - Bulgarian Ministry of Education and Science [DN18/9-11.12.2017] European Regional Development Fund within the Operational Programme "Science and Education for Smart Growth 2014-2020" under Project CoE "National center of mechatronics and clean technologies" [BG05M2OP001-1.001-0008-C01] 

主　　题：r f magnetron sputtering TiO2 C thin films annealing structural characterization 

摘      要：The aim of the present research is to study some aspects of the carbon doping of TiO2 thin films and the influence of low temperature thermal annealing on the phase precipitation in thin films. Thin films of heavily doped with carbon TiO2 (up to 3 at % C) were deposited on (15 x 25 x 1 mm) glass substrates by r.f. magnetron co-sputtering of TiO2 target and carbon plates on its erosion zone in Ar + air (residual pressure of 0.5 and 0.6 Pa, respectively) atmosphere. Two different process s parameters were varied in different experiments in order to change the carbon content: the total area of the carbon plates which was 30, 84, 132, 400 and 830 mm(2)) and the radial distance between the center of the circle of the erosion zone with maximum rate of sputtering which was 2 and 4 cm. The as-deposited and annealed (air, 400 degrees C, 1h) thin films with thickness of 110-150 nm were studied by ellipsometry, grazing incidence X-ray diffractometry (GIXRD), X-ray photoelectron spectroscopy, Raman spectroscopy, transmission and scanning electron microscopies. The GIXRD patterns reveal a mix of amorphous and nanocrystalline anatase and rutile TiO2 phases for all thin films. The Raman study confirms this conclusion but the TEM and GIXRD studies show presence of non-stoichiometric nanocrystalline phase based on Ti3C20O14 together with the other phases of TiO2-anatase, rutile and brookite. Similar charcterizations were carried out after annealing at 400 degrees C in air for 60 min and the most prominent effects of thermal treatment are discussed.