High Quality Wafer-scale CVD Graphene on Molybdenum Thin Film for Sensing Application

作     者：Yelena Grachova Sten Vollebregt Andrea Leonardo Lacaita Pasqualina M. Sarro 

作者机构：Delft Unviersity of Technology Faculty of Electrical Engineering Mathematics and Computer Science Department of Microelectronics Delft Institute of Microsystems and Nanoelectronics(Dimes) Feldmannweg 17 2628 CT Delft The Netherlands Politecnico di Milano Faculty of Electrical Engineering The Departmen of Electronics Information and Bioengineering Piazza Leonardo da Vinci 32 20133 Milan Italy 

出 版 物：《Procedia Engineering》 

年 卷 期：2014年第87卷

页      面：1501-1504页

学科分类：12[管理学] 1201[管理学-管理科学与工程(可授管理学、工学学位)] 08[工学] 

主　　题：Graphene copper molybdenum thin-films chemical vapour deposition Raman spectroscopy atomic force microscopy 

摘      要：The superb physical properties of graphene make it a material with great potential for sensing applications, including chemical sensors, Hall sensors and pressure sensors. However, its availability on large area substrates and the development of a scalable manufacturing process need to be addressed. In this work we propose wafer-scale, chemical vapour deposition (CVD) of graphene on sputtered thin-films of molybdenum, as alternative to the more commonly used CVD graphene processes based on copper films. The high melting point of Mo, its low thermal expansion, along with its smooth surface, create potentially favourable conditions to produce large area, wrinkle free, high quality graphene. Furthermore, the advantage of Mo, being commonly used in IC and sensor manufacturing environment, makes it an attractive choice for large volume production of sensing devices.