Growth of Dispersed Nanodiamonds Via Vapor Phase Nucleation by Microwave Plasma Assisted Chemical Vapor Deposition

作     者：Liang, Ying Liu, Kang Liu, Benjian Li, Yicun Fan, Saifei Dai, Bing Zhang, Yumin Zhu, Jiaqi 

作者机构：National Key Laboratory of Science and Technology on Advanced Composites in Special Environments Harbin Institute of Technology Harbin150080 China Key Laboratory of Micro-systems and Micro-structures Manufacturing Ministry of Education Harbin150080 China of Unmanned Equipment & Al Zhongshan528400 China 

出 版 物：《SSRN》 

年 卷 期：2023年

核心收录：

主　　题：Nucleation 

摘      要：Microwave plasma assisted chemical vapor deposition (MPCVD) is a technique for preparing high-quality diamonds. However, the low yield and easy bonding between particles to form films are drawbacks that in the preparation of nano-diamond (ND) particles. These issues are believed to be mainly caused by the adverse factors of substrate nucleation and continuous growth of particles. In this study, to inhibit these factors, diamond vapor phase nucleation (VPN) - growth plasma environment is achieved by adjusting the spatial distribution of the carbon and hydrogen groups in plasma. In this environment, NDs nucleate without using a seeded substrate, grow and fall on the disk isolated from its nucleation and growth environment. The dispersed particle density breaks through the highest value of the conventional theory of MPCVD NDs deposition by 2 orders of magnitude (~ 1010cm−2). Besides, we further analyzed and improved the VPN growth mechanism. This study opens up a new mode of using MPCVD, which can be used to grow dispersed NDs. The development and improvement of this method is expected to provide higher quality NDs for fine grinding, composite material reinforcement, and color center applications. © 2023, The Authors. All rights reserved.