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作者机构:School of Electromechanical Engineering Guangdong University of Technology Guangzhou510006 China Guangdong Provincial Key Laboratory of Advanced Manufacturing Technology of Marine Energy Equipment Guangdong University of Technology Guangzhou510006 China Key Laboratory of Green Fabrication and Surface Technology of Advanced Metal Materials Ministry of Education Anhui University of Technology Maanshan City243000 China Guangdong University of Technology China Pusan National University Busan609-735 Korea Republic of
出 版 物:《SSRN》
年 卷 期:2023年
核心收录:
主 题:Magnetron sputtering
摘 要:Microstructure and properties of WTi alloy films with 0~23 at.% Ti prepared by magnetron sputtering were investigated. The electrical resistivity gradually increased with the increase in the Ti content. When the Ti content was 6.8 at.%, the TCR value of the alloy film reaches the maximum value of 19.5×10-4 K-1, which is 3.6 times higher than that of the pure W film. After several thermal resistance tests, the TCR value of the WTi alloy film with 6.8 at.% Ti decreased gradually. After five times of measurements, the TCR value decreased gradually from 19.5×10-4 to 16.3×10-4 K-1. After annealing at 500℃ for 30 min, the grain size of the WTi alloy film (6.8 at.% Ti) increased, a few pores appeared, and the density of the film decreased. The TCR value decreased from 19.5×10-4 K-1 to 14×10-4 K-1. When the annealing time was increased to 60 min, the structure and properties of the WTi alloy film remained basically unchanged. After conducting the annealing treatment for 30 min, the WTi films showed excellent stability in the thermal resistance tests, and its TCR value was basically consistent after cyclic thermal loading, which has promising application prospects for the temperature measurement of tools and dies. © 2023, The Authors. All rights reserved.