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作者机构:School of Chemistry and Chemical Engineering Nanjing University of Science and Technology Jiangsu Nanjing210094 China School of State Key Lab of Advanced Electromagnetic Engineering and Technology School of Electrical and Electronic Engineering Huazhong University of Science and Technology HuBei Wuhan430074 China
出 版 物:《SSRN》
年 卷 期:2023年
核心收录:
主 题:Bandwidth
摘 要:The electromagnetic waves (EMW) protection holds utmost significance for advanced communication technology and human health care. However, developing waves absorbing materials with light weight, strong reflection loss, ultra-wide response bandwidth, and thin matched thickness certainly requires intricate process and considerable time costs. The radio frequency (RF) plasma as an ultrafast and efficient technique investigated in the graphene oxide (GO) reduction process and rGO as high-performance absorbing materials is procured. The plasma processing effect on the permittivity and electromagnetic attenuation performance was studied by vector network analyzer (VNA). The ten minutes plasma treated rGO sample achieved a notable reflection loss (RL) of -44.59 dB at 4.89 GHz, with an absorption bandwidth of 3.64 GHz at a thickness of 4.98 mm. The surge of reflection loss can be attributed to the unique and controllable pouch-like structure exhibited by rGO-10 in RF plasma set conditions. This structure primarily arises from the stress as a result of a significant reduction of oxygen-functionalized groups at the edges of rGO fragments caused by electronically excited H atoms and ions generated in the plasma. This work enables the high controllability of rGO structure toward high-performance absorbing material based on the surface reaction processes via plasma. © 2023, The Authors. All rights reserved.