Meta-device:advanced manufacturing

作     者：Borui Leng Yao Zhang Din Ping Tsai Shumin Xiao 

作者机构：Department of Electrical EngineeringCity University of Hong KongHong Kong999077China Centre for BiosystemsNeuroscience and NanotechnologyCity University of Hong KongHong Kong999077China The State Key Laboratory of Terahertz and Millimeter WavesCity University of Hong KongHong Kong999077China Ministry of Industry and Information Technology Key Lab of Micro-Nano Optoelectronic Information SystemGuangdong Provincial Key Laboratory of Semiconductor Optoelectronic Materials and Intelligent Photonic SystemsHarbin Institute of TechnologyShenzhen 518055China Pengcheng LaboratoryShenzhen 518055China 

出 版 物：《Light(Advanced Manufacturing)》 (光（先进制造）（英文）)

年 卷 期：2024年第5卷第1期

页      面：115-130页

学科分类：080901[工学-物理电子学] 0809[工学-电子科学与技术（可授工学、理学学位）] 08[工学] 080401[工学-精密仪器及机械] 0804[工学-仪器科学与技术] 0803[工学-光学工程] 

基　　金：support from the University Grants Committee/Research Grants Council of the Hong Kong Special Administrative Region,China[Project No.AoE/P-502/20,CRF Project:C1015-21E C5031-22G,and GRF Project:CityU15303521,CityU11305223,CityU11310522,CityU11300123] the Department of Science and Technology of Guangdong Province[Project No.2020B1515120073] City University of Hong Kong[Project No.9380131,9610628,and 7005867] S.M.Xiao acknowledges financial support from National Key R&D Program of China(Grant Nos.2021YFA1400802) the National Natural Science Foundation of China(Grant Nos.62125501,and 6233000076) Fundamental Research Funds for the Central Universities(Grant No.2022FRRK030004 Shenzhen Fundamental Research Projects(Grant Nos.JCYJ20220818102218040) 

主　　题：Meta-device Metasurface Nanofabrication COMS-compatible fabrication 

摘      要：Metasurfaces are one of the most promising devices to break through the limitations of bulky optical *** offering a new method of light manipulation based on the light-matter interaction in subwavelength nanostructures,metasurfaces enable the efficient manipulation of the amplitude,phase,polarization,and frequency of light and derive a series of possibilities for important ***,one key challenge for the realization of applications for meta-devices is how to fabricate large-scale,uniform nanostructures with high *** this review,we review the state-of-the-art nanofabrication techniques compatible with the manufacture of *** lithography,masked lithography,and other nanofabrication techniques are highlighted in *** also delve into the constraints and limitations of the current fabrication methods while providing some insights on solutions to overcome these challenges for advanced nanophotonic applications.