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作者机构:State Key Laboratory of Advanced Displays and Optoelectronics Technologies Department of Electronics and Computer Engineering The Hong Kong University of Science and Technology Clear Water Bay Clear Water Bay Hong Kong China IAS Center for Quantum Technologies HKUST Jockey Club Institute for Advanced Study Lo Ka Chung Building Lee Shau Kee Campus Hong Kong University of Science and Technology Clear Water Bay Kowloon Hong Kong China
出 版 物:《SID Symposium Digest of Technical Papers》
年 卷 期:2024年第55卷第S1期
页 面:118-120页
学科分类:12[管理学] 1201[管理学-管理科学与工程(可授管理学、工学学位)] 08[工学]
主 题:Photolithography Color Filter quantum rod polarization emission
摘 要:This study reports a method to fabricate linearly polar ized color filters (CFs) using quantum rods (QRs) as emitters. Direct photolithography is employed with a li quid crystal polymer matrix to align QR-CFs. Red and green CFs are developed using CdSe/CdS and CdSe/CdZnS QRs. Optimization of the curing agent concent ration improves QR dispersion and emission. The fabr icated single-pixel CFs demonstrate a polarization deg ree of 0.33. This novel patterning technique produces high-quality polarized CFs with applications in next-ge neration displays.