Quaternary ammonium-functionalized polysilsesquioxanes for antifogging coating

作     者：Hamada, Takashi Sugimoto, Tetsuya Tanaka, Arata Maeda, Tetsuya Katsura, Daiji Koga, Hiroyuki Ohshita, Joji 

作者机构：Collaborative Research Laboratory Graduate School of Advanced Science and Engineering Hiroshima University 1-4-1 Kagamiyama Higashi-Hiroshima Hiroshima 739-8527 Japan Quantum Materials and Applications Research Center Takasaki Institute for Advanced Quantum Science National Institutes for Quantum Science and Technology (QST) 1233 Watanuki-machi Takasaki Gunma 370-1292 Japan Technical Research Center Mazda Motor Corporation Aki-gun Hiroshima 730-8670 Japan Smart Innovation Program Graduate School of Advanced Science and Engineering Hiroshima University 1-4-1 Kagamiyama Higashi-Hiroshima Hiroshima 739-8527 Japan Division of Materials Model-Based Research Digital Monozukuri (Manufacturing) Education and Research Center Hiroshima University 3-10-32 Kagamiyama Higashi-Hiroshima Hiroshima 739-0046 Japan 

出 版 物：《RSC Applied Polymers》 (RSC appl. polym.)

年 卷 期：2024年第3卷第1期

页      面：92-96页

摘      要：Aiming to develop antifogging materials with enhanced antifogging properties and scratch resistance, polysilsesquioxane films containing quaternary ammonium groups were prepared via a sol-gel reaction and quaternization. Owing to their high water uptake, scratch hardness, and transparency, the prepared quaternary ammonium-functionalized polysilsesquioxane films are promising for application in antifogging coatings. © 2025 RSC.