Self assembled monolayers of octadecyltrichlorosilane for dielectric materials

作     者：Vijay Kumar Paridhi Puri Shivani Nain K. N. Bhat N. N. Sharma 

作者机构：1Centre for Nanoscience and Engineering Indian Institute of Science-Bangalore INDIA 2Mechanical Engineering Department Birla Institute of Technology and Science-Pilani India 3School of Automobile Mechanical & Mechatronics Manipal University-Jaipur India 

出 版 物：《AIP Conference Proceedings》 

年 卷 期：2016年第1724卷第1期

学科分类：07[理学] 0702[理学-物理学] 

摘      要：Treatment of surfaces to change the interaction of fluids with them is a critical step in constructing useful microfluidics devices, especially those used in biological applications. Selective modification of inorganic materials such as Si, SiO2 and Si3N4 is of great interest in research and technology. We evaluated the chemical formation of OTS self-assembled monolayers on silicon substrates with different dielectric materials. Our investigations were focused on surface modification of formerly used common dielectric materials SiO2, Si3N4 and a-poly. The improvement of wetting behaviour and quality of monolayer films were characterized using Atomic force microscope, Scanning electron microscope, Contact angle goniometer, Raman spectroscopy and X-ray photoelectron spectroscopy (XPS) monolayer deposited oxide surface.