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作者机构:Department of Electrical and Computer Engineering National University of Singapore 4 Engineering Drive 3 117576 Singapore Data Storage Institute (A'STAR) Agency for Science Technology and Research 2 Fusionopolis Way 138634 Singapore Department of Mechanical and Electrical Engineering Xiamen University Xiamen 361005 China
出 版 物:《光电工程》 (Opto-Electronic Engineering)
年 卷 期:2017年第44卷第2期
页 面:185-191页
核心收录:
学科分类:08[工学]
基 金:financial support from A*STAR SERC 2014 Public Sector Research Funding (PSF) Grant (SERC Project No. 1421200080)
主 题:surface-enhanced Raman scattering nanostructure fabrication plasmonics metal-insulator-metal
摘 要:Surface enhanced Raman scattering(SERS)is an efficient technique to detect low concentration *** this work,periodical silicon nanowires(Si NWs)integrated with metal-insulator-metal(MIM)layers are employed as SERS *** interference lithography(LIL)combined with reactive ion etching(RIE)is used to fabricate large-area periodic nanostructures,followed by decorating the MIM *** to MIM disks array on Si surface,the SERS enhancement factor(EF)of the MIM structures on the Si NWs array can be increased up to 5 times,which is attributed to the enhanced electric field at the boundary of the MIM ***,high density of nanoparticles and nanogaps serving as hot spots on sidewall surfaces also contribute to the enhanced SERS *** changing the thickness of the insulator layer,the plasmonic resonance can be tuned,which provides a new localized surface plasmon resonance(LSPR)characteristic for SERS applications.