High Aspect Ratio Machining of Nanocarbon Materials by Reactive Ion Etching

作     者：Sekiguchi, Atsuko Futaba, Don N. Yamada, Takeo Hata, Kenji 

作者机构：Natl Inst Adv Ind Sci & Technol CNT Applicat Res Ctr Tsukuba Ibaraki 3058565 Japan 

出 版 物：《MRS ADVANCES》 

年 卷 期：2017年第2卷第1期

页      面：9-14页

主　　题：machining reactive ion etching C 

摘      要：We demonstrate anisotropic, vertical deep etching of graphite and densely packed carbon nanotube (CNT) thick layer beyond the micrometer scale, which representing the first step toward nanocarbon bulk micromachining. This micromachining process is compatible with standard lithography and therefore allows the fabrication of graphite and CNT architectures with 1 mu m lateral resolution and up to 10 mu m scale depth.