AN ERD RBS PIXE APPARATUS FOR SURFACE-ANALYSIS AND CHANNELING

作     者：JANICKI, C HINRICHSEN, PF GUJRATHI, SC BREBNER, J MARTIN, JP 

作者机构：Laboratoire de Physique Nucléaire Université de Montreal C.P. 6128 Succursale “A” Montreal Quebec Canada H3C 3J7 

出 版 物：《NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS》 (物理学研究中的核仪器与方法，B辑：射束与材料及原子的相互作用)

年 卷 期：1988年第34卷第4期

页      面：483-492页

核心收录：

学科分类：08[工学] 0804[工学-仪器科学与技术] 0827[工学-核科学与技术] 0702[理学-物理学] 

基　　金：Natural Sciences and Engineering Research Council of Canada, NSERC Fonds pour la Formation de Chercheurs et l'Aide à la Recherche, FCAR 

主　　题：Crystals 

摘      要：A system for surface analysis, lattice localisation of impurities, defect studies in crystalline solids and routine ERD (elastic recoil detection) is described. The apparatus features a high vacuum chamber, a computer controlled precision goniometer and an energy plus time-of-flight mass discrimination system. First results of channeling/ERD experiments using 15–30 MeV 35 Cl beams on silicon crystals implanted with B + and BF 2 + are presented, as well as data on the effect of beam induced damage on the boron distribution.