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作者机构:Department of Electronic Science and Technology Huazhong University of Science and Technology Wuhan National Laboratory for Optoelectronics Huazhong University of Science and Technology State Key Laboratory on Advanced Optical Communication Systems and Networks Peking University School of Electrical and Computer Engineering Georgia Institute of Technology School of Materials Science and Engineering Georgia Institute of Technology Unité Mixte Internationale 2958 Georgia Tech-CNRS Georgia Tech Lorraine
出 版 物:《Frontiers of Optoelectronics》 (光电子前沿(英文))
年 卷 期:2009年第2卷第3期
页 面:308-311页
学科分类:080903[工学-微电子学与固体电子学] 0809[工学-电子科学与技术(可授工学、理学学位)] 07[理学] 070205[理学-凝聚态物理] 08[工学] 080501[工学-材料物理与化学] 0805[工学-材料科学与工程(可授工学、理学学位)] 0702[理学-物理学]
基 金:supported in part by the French National Center for Scientific Research (CNRS)
主 题:nanofabrication silicon waveguide roughness microring resonator grating coupler
摘 要:Fabrication of microscale and nanoscale silicon waveguide devices requires patterning silicon, but until recently, exploitation of the technology has been restricted by the difficulty of forming ever-small features with minimum linewidth fluctuation. A technique was developed for fabricating such devices achieving vertical sidewall profile, smooth sidewall roughness of less than10 nm, and fine features of 40 nm. Subsequently, silicon microring resonator and silicon-grating coupler were realized using this technique.