Trimming of microring resonators by photo-oxidation of a plasma-polymerized organosilane cladding material

作     者：Sparacin, DK Hong, CY Kimerling, LC Michel, J Lock, JP Gleason, KK 

作者机构：MIT Dept Mat Sci & Engn Cambridge MA 02139 USA MIT Dept Chem Engn Cambridge MA 02139 USA MIT Inst Soldier Nanotechnol Cambridge MA 02139 USA 

出 版 物：《OPTICS LETTERS》 (光学快报)

年 卷 期：2005年第30卷第17期

页      面：2251-2253页

核心收录：

学科分类：070207[理学-光学] 07[理学] 08[工学] 0803[工学-光学工程] 0702[理学-物理学] 

主　　题：WAVE-GUIDES FILTERS FILMS 

摘      要：As the complexity of microphotonic devices grows, the ability to precisely trim microring resonators becomes increasingly important. Photo-oxidation trimming uses UV irradiation to oxidize a cladding layer composed of polymerized hexamethyldisilane (6M2S) deposited with plasma-enhanced chemical vapor deposition (PECVD). PECVD 6M2S has optical properties that are compatible with microring devices, and its high cross linking renders it insoluble. Photo-oxidation decreases the refractive index of PECVD 6M2S by nearly 4%, permitting large resonance shifts that are not feasible with thermal trimming techniques. Resonance shifts from single-mode, 100 mu m diameter Si3N4 (n=2.2) rings were as large as 12.8 nm for the TE mode and 23.5 nm for the TM mode. (c) 2005 Optical Society of America.