Closed loop controlled deposition of Ba_xSr_1-xTiO₃ thin films in spray flames

作     者：Vukasinovic, B Sundell, S Oljaca, M 

作者机构：MicroCoating Technol Atlanta GA 30341 USA 

出 版 物：《SURFACE ENGINEERING》 (表面工程)

年 卷 期：2003年第19卷第3期

页      面：179-184页

核心收录：

学科分类：080503[工学-材料加工工程] 08[工学] 0805[工学-材料科学与工程（可授工学、理学学位）] 

主　　题：sapphire substrate timing adjustment Control procedures thin films closed-loop controller film thickness Optical properties Films Sapphire deposite film 

摘      要：Control logic was developed,for automated thin film deposition in the combustion chemical vapour deposition (CCVD) process. In situ film thickness and deposition temperature measurements were used as a feedback to control film thickness and optical properties through real-time adjustment of the deposition parameters. The closed loop controller was optimised for the deposition of barium-strontium-titanate (BaxSr1-xTiO3, BST) films on sapphire but it can be used for other coating/ substrate combinations. Besides enabling repeatable depositions of BST films with optimal thickness and optical properties for electronic applications, this control process proved that unique features of the Nanomiser atomiser can be implemented to tune the film deposition rate. Comparison of scanning electron microscopy cross-sections of epitaxial BST films on sapphire substrate with the predicted film thickness suggests that the closed loop controller can be used to control the thickness of the deposited film to within +/-2%.