Mechanical confinement effects on the phase separation morphology of polymer blend thin films

作     者：K. Dalnoki-Veress J. A. Forrest J. R. Dutcher 

作者机构：[]Department of Physics and the Guelph-Waterloo Program for Graduate Work in Physics University of Guelph Guelph Ontario Canada N1G 2W1 

出 版 物：《Physical Review E》 (物理学评论E辑：统计、非线性和软体物理学)

年 卷 期：1998年第57卷第5期

页      面：5811-5811页

核心收录：

学科分类：07[理学] 070203[理学-原子与分子物理] 0702[理学-物理学] 

主　　题：Plastic films 

摘      要：We have measured the phase separation morphology of polystyrene–poly (methyl methacrylate) (PS-PMMA) blend films of thickness h on a silicon oxide (SiOx) substrate with a SiOx capping layer. We observe a novel phase separation morphology for small capping layer thicknesses L and a transition from lateral to lamellar morphology as L is increased. We present a simple model that explains the observed lateral morphology and the transition in morphology in terms of a balance between the free energy increase associated with forming the interfaces between PS-rich and PMMA-rich domains and the free energy increase associated with the elastic bending of the SiOx capping layer. The simple model reveals the dependence of the transition capping layer thickness Lc on the polymer blend film thickness h, and gives a reasonable quantitative prediction of Lc.