Surface smoothing mechanism of gas cluster ion beams

作     者：Toyoda, N Hagiwara, N Matsuo, J Yamada, I 

作者机构：Kyoto Univ Ion Beam Engn Expt Lab Kyoto 6068501 Japan 

出 版 物：《NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS》 (物理学研究中的核仪器与方法，B辑：射束与材料及原子的相互作用)

年 卷 期：2000年第161卷

页      面：980-985页

核心收录：

学科分类：08[工学] 0804[工学-仪器科学与技术] 0827[工学-核科学与技术] 0702[理学-物理学] 

主　　题：cluster surface smoothing Monte Carlo simulation 

摘      要：Sputtering phenomena by gas cluster ions were modeled based on experimental results, and the surface smoothing effects with cluster ion beam were studied with Monte Carlo simulations. When a cluster ion impacts a slope, ejected atoms move down the slope, and consequently, the valley is filled by these dislocated atoms. An initially rough surface is made smooth by these effects. The dislocated atoms filling the valley are eventually removed with increasing dose, and finally, a very smooth surface with a thin, damaged layer can be obtained. Due to the small distance of the atomic motion induced by a cluster-ion impact, surfaces with narrow hill-and-valley are smoothed initially, and those with longer-scale roughness require more ion-dose to be smoothed. (C) 2000 Elsevier Science B.V. All rights reserved.