Development of Nanostructured Antireflection Coatings for EO/IR Sensor and Solar Cell Applications

作     者：Ashok K. Sood Adam W. Sood Roger E. Welser Gopal G. Pethuraja Yash R. Puri Xing Yan David J. Poxson Jaehee Cho E. Fred Schubert Nibir K. Dhar Dennis L. Polla Pradeep Haldar Jennifer L. Harvey 

作者机构：College of Nanoscale Science and Engineering Albany USA Department of Electrical and Computer Systems Engineering and Physics Rensselaer Polytechnic Institute Troy USA Magnolia Solar Inc. Albany USA Microsystems Technology Office of the Defense Advanced Research Projects Agency Arlington USA New York State Energy Research and Development Authority Albany USA. 

出 版 物：《Materials Sciences and Applications》 (材料科学与应用期刊（英文）)

年 卷 期：2012年第3卷第9期

页      面：633-639页

学科分类：07[理学] 0702[理学-物理学] 

主　　题：Antireflection Coating Nanostructured Layer Oblique Angle Deposition Silicon Dioxide Broadband Omni-Directional 

摘      要：Electro-optical/infrared (EO/IR) sensors and photovoltaic power sources are being developed for a variety of defense and commercial applications. One of the critical technologies that will enhance both EO/IR sensor and photovoltaic module performance is the development of high quality nanostructure-based antireflection coatings. In this paper, we review our work on advanced antireflection structures that have been designed by using a genetic algorithm and fabricated by using oblique angle deposition. The antireflection coatings are designed for the wavelength range of 250 nm to 2500 nm and an incidence angle between 00 and 400. These nanostructured antireflection coatings are shown to enhance the optical transmission through transparent windows over a wide band of interest and minimize broadband reflection losses to less than one percent, a substantial improvement over conventional thin-film antireflection coating technologies.