Analysis of thermal effect on transparent conductive oxide thin films ablated by UV laser

作     者：Chen, Ming-Fei Ho, Yu-Sen Hsiao, Wen-Tse Huang, Kuo-Cheng Chen, Yu-Pin 

作者机构：Department of Mechatronics Engineering National Changhua University of Education Changhua 50007 Taiwan System Control and Integration Division Instrument Technology Research Center National Applied Research Laboratories 20 R and D Rd. VI Hsinchu Science Pk. Hsinchu City Taiwan PCB Department Tongtai Machine and Tool Co. Ltd Kaohsiung 82151 Taiwan 

出 版 物：《Thin Solid Films》 (Thin Solid Films)

年 卷 期：2009年第518卷第4期

页      面：1067-1071页

核心收录：

学科分类：080701[工学-工程热物理] 1201[管理学-管理科学与工程(可授管理学、工学学位)] 0808[工学-电气工程] 0809[工学-电子科学与技术（可授工学、理学学位）] 0817[工学-化学工程与技术] 0806[工学-冶金工程] 08[工学] 0807[工学-动力工程及工程热物理] 0703[理学-化学] 0803[工学-光学工程] 0701[理学-数学] 

基　　金：The authors would like to thank the National Science Council of the Republic of China  Taiwan for financially supporting this research under Contract No. NSC 97-2221-E-018-007-MY2 

主　　题：Heat affected zone 

摘      要：Transparent conductive oxide thin films are applied to many computer, communication and consumer electronics products including thin film transistor liquid crystal displays, organic light emitting diodes, solar cells, mobile phones, and digital cameras. The laser direct write patterning of the indium tin oxide (ITO) thin film processing technique produces a heat affected zone that has an enormous effect on the electro-optical efficiency of transparent conductive oxide films. This is because direct laser writing patterning in thermal machining process can create debris and micro-cracks in the substrate. Therefore, this study establishes the ultraviolet (UV) laser ablation of temperature model on the polycarbonate and soda-lime glass substrates using the finite element analysis software ANSYS, and measures the temperature field based on the laser micro-patterning process. The meshing model determines the structure of the pre-processors and parameters were set with ANSYS parameter design language. This study also simulates the Gaussian distribution laser irradiation on the pre-processor structure. A UV laser processing system made micro-patterning on ITO thin films to analyze which conditions damaged the substrates. Comparing the simulation and experiment results reveals the minimum laser ablation threshold of the ITO thin films with the melting and vaporization temperatures. Simulation results show that the temperature distribution on PC and soda-lime glass substrates after laser irradiation of 1.05 μs with a laser output power of 0.07 W produces temperatures of approximately 52 °C, 54 °C and 345Cand 205 °C at the laser output power of 0.46 W. The experiment results show that the patterning region is similar to the simulation results, and the lower laser power does not damage the substrates. © 2009.