Fabrication of Si-based two-dimensional photonic quasicrystals by using multiple-exposure holographic lithography

作     者：Yeo, Jong-Bin Yun, Sang-Don Kim, Nam-Hoon Lee, Hyun-Yong 

作者机构：Faculty of Applied Chemical Engineering Chonnam National University Gwangju 500-757 Korea Republic of Research Institute for Catalysis Chonnam National University Gwangju 500-757 Korea Republic of 

出 版 物：《Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures》 (J Vac Sci Technol B Microelectron Nanometer Struct)

年 卷 期：2009年第27卷第4期

页      面：1886-1889页

核心收录：

基　　金：This work was supported by the Korea Research Foundation grant funded by the Korean Government (MOEHRD) (Grant No. KRF-2007-412-J02003). Main calculations were performed by using the supercomputing resource of the Korea Institute of Science and Technology Information (KISTI) 

主　　题：Fabrication 

摘      要：Two-dimensional (2D) photonic quasicrystal (PQC) template patterns have been fabricated by using multiple-exposure holographic lithography (MHL). The MHL technique is based on Lloyd s mirror setup using interference of two equivalent beams, which is an excellent method for fabricating periodic structures of a large area. The 2D PQC array shows various sizes and shapes with a change in the incident angle (θ) and rotation angle (γ) of the multiple-exposure beams. In addition, the filling factor (), which is a very important factor for optical characteristic of 2D PQCs, was controlled by the exposure time (τ). The fabricated PQCs showed eight-, ten-, and 12-fold patterns with high-order rotational symmetries. Diffraction patterns using 632.8 nm HeNe laser were also observed with n -rotation symmetry for the corresponding n -fold PQCs. After fabricating the PQCs, reactive-ion etching of the silicon wafer was performed with 50-nm-thick chromium (Cr) as a mask in CF4 / O2 plasma to a 1.3 μm depth. The authors confirmed that fabrication of n -fold 2D PQCs in a large area with suitable optical characteristics could be controlled by some parameters of MHL. © 2009 American Vacuum Society.