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检索条件"任意字段=15th European Conference on Mask Technology for Integrated Circuits and Microcomponents"
98 条 记 录,以下是21-30 订阅
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Proceedings of SPIE: 18th european conference on mask technology for integrated circuits and microcomponents
Proceedings of SPIE: 18th European Conference on Mask Techno...
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18th european conference on mask technology for integrated circuits and microcomponents 1998
this Volume 4764 of the conference proceedings contains 32 papers. Topics discussed include next generation masks, mask applications, pattern generation, materials and processes, enhanced techniques and data processin... 详细信息
来源: 评论
through the looking glass: What is on the horizon for the mask Maker?
Through the looking glass: What is on the horizon for the Ma...
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19th european conference on mask technology for integrated circuits and microcomponents
作者: Mackay, RS Eynon, BG Mathur, DP Photron Inc Austin TX 78728 USA
the future of mask industry technology is in flux. While the requirements for current and near-term lithographic capability is well understood, advanced lithography options pose a completely new set of challenges to t... 详细信息
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Inspecting alternating phase shift masks by matching stepper conditions
Inspecting alternating phase shift masks by matching stepper...
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19th european conference on mask technology for integrated circuits and microcomponents
作者: Hemar, S Rosenbusch, A Etec Syst Mask Business Grp IL-76705 Rehovot Israel
the paper presents a new technology to inspect alternating phase shifting masks. Instead of finding defects based on a size-dependent defect specification, defects are found according to their impact at the wafer CD r... 详细信息
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mask technologies for deep X-ray LIGA
Mask technologies for deep X-ray LIGA
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19th european conference on mask technology for integrated circuits and microcomponents
作者: Singleton, L Detemple, P Inst Mikrotech Mainz GmbH D-55129 Mainz Germany
masks for LIGA applications requiring deep X-ray lithography have different specifications compared to those masks used in microelectronic applications. Generally, deep X-ray LIGA applications require resist heights g... 详细信息
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Early mask making during the 1960's in Dresden
Early mask making during the 1960's in Dresden
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19th european conference on mask technology for integrated circuits and microcomponents
作者: Becker, HW Fraunhofer Inst Photon Mikrosyst IPMS Dresden Germany
One of the first european institutes for microelectronics, the Arbeitsstelle fur Molekularelektronik Dresden AME, was founded in 1961 by WERNER HARTMANN. the purpose was to develop processes for fabrication of integra... 详细信息
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Development and characterization of new CD mask standards:: a status report
Development and characterization of new CD mask standards:: ...
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19th european conference on mask technology for integrated circuits and microcomponents
作者: Schätz, T Hauffe, B Döbereiner, S Brück, HJ Brendel, B Bettin, L th, KD Steinberg, W Speckbacher, P Sedlmeier, W Engel, T Hässler-Grohne, W Mirandé, W Bosse, H Infineon Technol AG D-81541 Munich Germany
We report on the current status of a project on development and characterization of CD photomasks with 6025 format to be used as reference standards for different type of CD metrology instruments. the project consorti... 详细信息
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Integration of mask R&D and mask manufacturing to support the european semiconductor industry
Integration of mask R&D and mask manufacturing to support th...
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19th european conference on mask technology for integrated circuits and microcomponents
作者: Dilger, M AMTC Adv Mask Technol Ctr D-01330 Dresden Germany
the increasing gap between microelectronics minimum feature size and the exposure wavelength is a key challenge to the semiconductor industry. In the last 3 to 5 years mask technology has become a key contribute to br... 详细信息
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Integration of OPC and mask data preparation
Integration of OPC and mask data preparation
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19th european conference on mask technology for integrated circuits and microcomponents
作者: Schulze, S LaCour, P Rodriguez, N Mentor Graph Corp Wilsonville OR 97070 USA
As design rules shrink aggressively while the wavelength reduction in the exposure equipment cannot keep up, extensive usage of resolution enhancement techniques (RET) has complicated the generation and handling of ma... 详细信息
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Method to determine a detection capability of the die-to-database mask inspection system in regard to pinhole and pindot defects
Method to determine a detection capability of the die-to-dat...
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19th european conference on mask technology for integrated circuits and microcomponents
作者: Avakaw, SM Opto Mech Equipment Design Off Precis Elect Tools Bldg Minsk BELARUS
the paper presents a description and results of the use of a new method to determine a capability to detect defects such as pinholes and pindots in order to test reticle and photomask inspection systems EM-6029B and E... 详细信息
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Use of nanomachining for 100 nanometer mask repair
Use of nanomachining for 100 nanometer mask repair
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19th european conference on mask technology for integrated circuits and microcomponents
作者: LoBianco, B White, R Nawrocki, T RAVE LLC (United States)
Nanomachining has recently been introduced as a new technology for subtractive repair of 130-nanometer masks. the RAVE LLC nm 1300 utilizes this innovative strategy, facilitating repairs of all materials currently use... 详细信息
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