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16th european conference on mask technology for integrated circuits and microcomponents

作者： Rosenbusch, Anja Bailey, Vicky Eran, Yair Falah, Reuven Holmes, Neil Hourd, Andrew C. McArthur, Andrew Staud, Wolf Sigma-C Inc Campbell United States

Inspection is one of the major challenges in mask making, as it is one of its most performance crucial steps in the entire mask making process. Especially contact patterns show difficulties in die-to-database inspection as the CAD data asks for square corners. the paper presents the impact of Laser Proximity Correction (LPC) on inspectability of contact and line patterns. LPC is a mask enhancement technique improving image quality and CD linearity for laser pattern generators. the use of the LBM (linewidth bias monitor) tool in order to characterize CD uniformity over the entire plate is demonstrated.

关键词： masks

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Advanced writing strategies for high-end mask making

Advanced writing strategies for high-end mask making

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16th european conference on mask technology for integrated circuits and microcomponents

作者： Lemke, Melchior Gramss, Juergen Doering, Hans-Joachim Eichhorn, Hans Schubert, Gerhard Leica Microsystems Lithography GmbH Jena Germany

In general the writing strategies of the Leica ZBA 320 tool are presented to the audience. Methods to achieve a high productivity in writing masks of the next generation are highlighted. thus, such writing modes like variable-shaped beam (VSB) using 6 shape types, vector scan and `writing-on-the-fly' are explained in their inter-action. Our strategies to constantly improve the accuracy parameters, such like n-pass writing and soft boundaries are not only described but also illustrated by our latest application results. Finally data processing by hierarchical data structures as the main factor to support the above-mentioned writing strategies is outlined in this paper.

关键词： masks

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Major improvements in mask CD metrology: Enhanced performance on attenuated Phase Shift masks, corner rounding measurements, and improved measurement automation

Major improvements in mask CD metrology: Enhanced performanc...

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16th european conference on mask technology for integrated circuits and microcomponents

作者： Schlueter, Gerhard Scheuring, Gerd Falk, Guenther Brueck, Hans-Juergen Schaetz, thomas Lehnigk, Sigrid Leica Microsystems Wetzlar GmbH Wetzlar Germany

With continuously shrinking design rules enhanced techniques are required in mask manufacture which require more sophisticated procedures for their characterization. As Phase Shift masks (PSM) are of growing importance a new CD algorithm had to be developed to achieve the same or even higher level of CD accuracy and repeatability as on chrome masks. Major improvements in measurement performance on attenuated PSM have been achieved resulting from improving the PSM CD algorithm based on the experiences reported earlier. With shrinking feature sizes and masks layouts with denser patterns the quantification of corner rounding effects on contacts and line ends is of growing importance. Based on the algorithm developed for the effect of corner rounding on line end shortening a measurement procedure has been developed for contact holes. Measurement results will been shown. To further improve CD measurement automation and to enable easy measurement job modifications a highly flexible device has been developed to import measurement parameters into a macro template.

关键词： masks

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Lithography and CD performance of advanced MEBES mask pattern generators

Lithography and CD performance of advanced MEBES mask patter...

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16th european conference on mask technology for integrated circuits and microcomponents

作者： Chabala, J.M. Cole, D. Pearce-Percy, H. Phillips, W. Lu, M. Weaver, S. Alexander, D. Coleman, T. Sauer, C. Abboud, F. Etec Systems Inc Hayward United States

As optical lithography is extended to the 130 nm generation and beyond, demanding requirements are placed on mask pattern generators to produce quartz substrate masks. this paper reports on the lithography and critical dimension (CD) performance of the MEBES 5500 mask pattern generator. Compared to previous MEBES tools, this system employs a new high-dose electron gun and column design. We summarize experiments relating lithographic quality to increased dose and the effects of spot size on lithography. Methods to reduce beam-induced pattern placement errors are reviewed. A new graybeam writing strategy, Multipass Gray-II (MPG-II), is described in detail. this strategy creates eight dosed gray levels and provides increased writing throughput (up to 8× compared to single-pass printing) without loss of lithographic quality. these experiments are performed with ZEP 7000 resist and dry etch process;improvements in CD control have been achieved by optimizing the process. A consequence of the improvement in CD control and throughput is improved productivity in generating 180 nm devices.

关键词： Photolithography

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Experience with EFQM assessment at Siemens mask shop

Experience with EFQM assessment at Siemens mask shop

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15th european conference on mask technology for integrated circuits and microcomponents

作者： Reindl, W Steuber, S Siemens AG D-8000 Munich Germany

the EFQM Management Self-Assessment was applied to mask manufacturing and was found to be the driving process for business improvements at the mask shop. It offered an opportunity to learn about the organisation's... 详细信息

ISBN: (纸本)0819431397

关键词： european Foundation of Quality Management (EFQM) continuous improvement process management self-assessment business excellence organisation performance key processes mask shop mask manufacturing

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Experience with EFQM assessment at Siemens mask shop

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Proceedings of SPIE - the International Society for Optical Engineering 1999年 3665卷 150-165页

作者： Reindl, Werner Steuber, Siegfried Siemens AG Munich Germany

the european Foundation of Quality Management (EFQM) self-assessment is a comprehensive, systematic and regular review of an organization's activities and results referenced against a model of business excellence. the self-assessment process allows the organization to discern clearly its strength and areas in which improvements can be made and culminates in planned improvement actions which are then monitored for progress. the EFQM self-assessment was applied to mask manufacturing and was found to be the driving process for business improvements at the mask shop. It offered an opportunity to learn about the organization's strength and especially the areas where improvement was necessary.

关键词： Total quality management

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Hierarchical mask data preparation and special fracturing techniques in MGS

Hierarchical mask data preparation and special fracturing te...

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15th european conference on mask technology for integrated circuits and microcomponents

作者： Bürger, B Bätz, U Kunze, K Wolf, H Fraunhofer IMS Dresden Germany

ISBN: (纸本)0819431397

MGS is a layout postprocessor software including a fracturing engine for Leica's ZBA e-beam writers. With the ZBA series including the new ZBA300 and its ability to write submicrometer masks for advanced technologies two main tasks have to be mastered in data preparation: 1. Processing of large and dense layouts. 2. Contribution to increased mask quality by optimized fracturing. these challenges are not restricted to the ZBA tools only;on the contrary they are of general interest for data preparation.

关键词： Magnesium Photomasks Algorithm development Edge roughness integrated circuit design integrated circuits Liquid crystals Lithography Sensors Structural design

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mask technology for EUV lithography

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Proceedings of SPIE - the International Society for Optical Engineering 1999年 3665卷 30-39页

作者： Bujak, M. Burkhart, S. Cerjan, C. Kearney, P. Moore, C. Prisbrey, S. Sweeney, D. Tong, W. Vernon, S. Walton, C. Warrick, A. Weber, F. Wedowski, M. Wilhelmsen, K. Bokor, J. Lawrence Livermore Natl Lab

Extreme ultraviolet lithography (EUVL) is one of the leading candidates for the next generation lithography, which will decrease critical feature size to below 100 nm within 5 years. mask fabrication is one of the key challenges in EUVL. the mask blank is a silicon wafer coated with 40 pairs of Mo and Si, designed to maximize reflectivity at 13.4 nm. the mask blank is coated with an absorbing film that is patterned with the desired integrated circuit features using conventional mask patterning lithography, followed by reactive ion etching. the technical approaches to fabricating EUVL mask blanks and patterning mask absorber features are presented.

关键词： Photolithography

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Initial results from a Leica ZBA 31H+ shaped e-beam mask writer located at the Photronics Advanced mask Shop in Manchester, England

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Proceedings of SPIE - the International Society for Optical Engineering 1999年 3665卷 63-68页

作者： Johnson, Stephen Marshall, Paul Osborne, Peter Doering, Hans-Joachim Ehrlich, Christian Ltd Manchester United Kingdom

the ZBA 31H+ is a variable shaped spot, vector scan electron beam lithography system operating at 20 keV. Enhancements from the previous generation system include improved deflection systems, stage metrology, pattern data handling, and an address grid down to 10 nanometers. the system's specified performance enables it to produce reticles designed to support semiconductor fabrication utilizing 250 nanometer design rules and beyond, with high accuracy and productivity. the initial results from the Leica ZBA 31H+ shaped electron beam mask writer located at the Phototronics Advanced mask Shop in Manchester, England are presented.

关键词： Electron beam lithography

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Hierarchical mask data preparation and special fracturing techniques in MGS

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Proceedings of SPIE - the International Society for Optical Engineering 1999年 3665卷 135-136页

作者： Buerger, B. Baetz, U. Kunze, K. Wolf, H. Fraunhofer IMS Dresden Germany

MGS is a layout postprocessor software including a fracturing engine for Leica's ZBA e-beam writers. In MGS, a new hierarchy called output hierarchy, is automatically built from the design hierarchy as it is found in the input layout file. In all hierarchical levels of the layout input is looked for candidates to be transferred to the output hierarchy. Criteria for structure selection are, number of calls, use in array calls and dimension of structure. the goal is to achieve a 1-level output hierarchy of all disjunctive structures where one structure has the same environment at all positions where it is called.

关键词： integrated circuit layout

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