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检索条件"任意字段=16th European Conference on Mask Technology for Integrated Circuits and Microcomponents"
97 条 记 录,以下是81-90 订阅
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Improvements to mask inspectability by use of pattern proximity correction
Improvements to mask inspectability by use of pattern proxim...
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16th european conference on mask technology for integrated circuits and microcomponents
作者: Rosenbusch, Anja Bailey, Vicky Eran, Yair Falah, Reuven Holmes, Neil Hourd, Andrew C. McArthur, Andrew Staud, Wolf Sigma-C Inc Campbell United States
Inspection is one of the major challenges in mask making, as it is one of its most performance crucial steps in the entire mask making process. Especially contact patterns show difficulties in die-to-database inspecti... 详细信息
来源: 评论
Advanced writing strategies for high-end mask making
Advanced writing strategies for high-end mask making
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16th european conference on mask technology for integrated circuits and microcomponents
作者: Lemke, Melchior Gramss, Juergen Doering, Hans-Joachim Eichhorn, Hans Schubert, Gerhard Leica Microsystems Lithography GmbH Jena Germany
In general the writing strategies of the Leica ZBA 320 tool are presented to the audience. Methods to achieve a high productivity in writing masks of the next generation are highlighted. thus, such writing modes like ... 详细信息
来源: 评论
Major improvements in mask CD metrology: Enhanced performance on attenuated Phase Shift masks, corner rounding measurements, and improved measurement automation
Major improvements in mask CD metrology: Enhanced performanc...
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16th european conference on mask technology for integrated circuits and microcomponents
作者: Schlueter, Gerhard Scheuring, Gerd Falk, Guenther Brueck, Hans-Juergen Schaetz, thomas Lehnigk, Sigrid Leica Microsystems Wetzlar GmbH Wetzlar Germany
With continuously shrinking design rules enhanced techniques are required in mask manufacture which require more sophisticated procedures for their characterization. As Phase Shift masks (PSM) are of growing importanc... 详细信息
来源: 评论
Lithography and CD performance of advanced MEBES mask pattern generators
Lithography and CD performance of advanced MEBES mask patter...
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16th european conference on mask technology for integrated circuits and microcomponents
作者: Chabala, J.M. Cole, D. Pearce-Percy, H. Phillips, W. Lu, M. Weaver, S. Alexander, D. Coleman, T. Sauer, C. Abboud, F. Etec Systems Inc Hayward United States
As optical lithography is extended to the 130 nm generation and beyond, demanding requirements are placed on mask pattern generators to produce quartz substrate masks. this paper reports on the lithography and critica... 详细信息
来源: 评论
Experience with EFQM assessment at Siemens mask shop
Experience with EFQM assessment at Siemens mask shop
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15th european conference on mask technology for integrated circuits and microcomponents
作者: Reindl, W Steuber, S Siemens AG D-8000 Munich Germany
the EFQM Management Self-Assessment was applied to mask manufacturing and was found to be the driving process for business improvements at the mask shop. It offered an opportunity to learn about the organisation's... 详细信息
来源: 评论
Experience with EFQM assessment at Siemens mask shop
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Proceedings of SPIE - the International Society for Optical Engineering 1999年 3665卷 150-165页
作者: Reindl, Werner Steuber, Siegfried Siemens AG Munich Germany
the european Foundation of Quality Management (EFQM) self-assessment is a comprehensive, systematic and regular review of an organization's activities and results referenced against a model of business excellence.... 详细信息
来源: 评论
Hierarchical mask data preparation and special fracturing techniques in MGS
Hierarchical mask data preparation and special fracturing te...
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15th european conference on mask technology for integrated circuits and microcomponents
作者: Bürger, B Bätz, U Kunze, K Wolf, H Fraunhofer IMS Dresden Germany
MGS is a layout postprocessor software including a fracturing engine for Leica's ZBA e-beam writers. With the ZBA series including the new ZBA300 and its ability to write submicrometer masks for advanced technolog... 详细信息
来源: 评论
mask technology for EUV lithography
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Proceedings of SPIE - the International Society for Optical Engineering 1999年 3665卷 30-39页
作者: Bujak, M. Burkhart, S. Cerjan, C. Kearney, P. Moore, C. Prisbrey, S. Sweeney, D. Tong, W. Vernon, S. Walton, C. Warrick, A. Weber, F. Wedowski, M. Wilhelmsen, K. Bokor, J. Lawrence Livermore Natl Lab
Extreme ultraviolet lithography (EUVL) is one of the leading candidates for the next generation lithography, which will decrease critical feature size to below 100 nm within 5 years. mask fabrication is one of the key... 详细信息
来源: 评论
Initial results from a Leica ZBA 31H+ shaped e-beam mask writer located at the Photronics Advanced mask Shop in Manchester, England
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Proceedings of SPIE - the International Society for Optical Engineering 1999年 3665卷 63-68页
作者: Johnson, Stephen Marshall, Paul Osborne, Peter Doering, Hans-Joachim Ehrlich, Christian Ltd Manchester United Kingdom
the ZBA 31H+ is a variable shaped spot, vector scan electron beam lithography system operating at 20 keV. Enhancements from the previous generation system include improved deflection systems, stage metrology, pattern ... 详细信息
来源: 评论
Hierarchical mask data preparation and special fracturing techniques in MGS
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Proceedings of SPIE - the International Society for Optical Engineering 1999年 3665卷 135-136页
作者: Buerger, B. Baetz, U. Kunze, K. Wolf, H. Fraunhofer IMS Dresden Germany
MGS is a layout postprocessor software including a fracturing engine for Leica's ZBA e-beam writers. In MGS, a new hierarchy called output hierarchy, is automatically built from the design hierarchy as it is found... 详细信息
来源: 评论