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检索条件"任意字段=2022 IEEE Symposium on VLSI Technology and Circuits, VLSI Technology and Circuits 2022"
6930 条 记 录,以下是1-10 订阅
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2022 ieee symposium on vlsi technology and circuits, vlsi technology and circuits 2022
2022 IEEE Symposium on VLSI Technology and Circuits, VLSI Te...
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2022 ieee symposium on vlsi technology and circuits, vlsi technology and circuits 2022
The proceedings contain 211 papers. The topics discussed include: a reference-free phase noise measurement circuit achieving 24.2 fs periodic jitter sensitivity and 275 fsrms resolution with background self-calibratio...
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2024 ieee symposium on vlsi technology and circuits, vlsi technology and circuits 2024
2024 IEEE Symposium on VLSI Technology and Circuits, VLSI Te...
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2024 ieee symposium on vlsi technology and circuits, vlsi technology and circuits 2024
The proceedings contain 249 papers. The topics discussed include: on the reliability of high-performance dual gate (DG) W-doped In2O3 FET;a 12-bit 10GS/s time-interleaved SAR ADC with even/odd channel-correlated absol...
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2023 ieee symposium on vlsi technology and circuits, vlsi technology and circuits 2023
2023 IEEE Symposium on VLSI Technology and Circuits, VLSI Te...
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2023 ieee symposium on vlsi technology and circuits, vlsi technology and circuits 2023
The proceedings contain 229 papers. The topics discussed include: a wireless sensor-brain interface system for tracking and guiding animal behaviors through goal-directed closed-loop neuromodulation;a wireless neural ...
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2024 ieee symposium on vlsi technology and circuits [Conference Reports]
2024 IEEE Symposium on VLSI Technology and Circuits [Confere...
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作者: Loke, Alvin Arnaud, Franck Kanda, Masahiko Tokuda, Takashi
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2023 ieee symposium on vlsi technology and circuits [Conference Reports]
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ieee Solid-State circuits Magazine 2023年 第4期15卷 88-94页
作者: Alvin Loke Mitsuya Fukazawa Kazuhiko Endo
Provides society information that may include news, reviews or technical notes that should be of interest to practitioners and researchers.
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2024 ieee symposium on vlsi technology and circuits [Conference Reports]
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ieee Solid-State circuits Magazine 2024年 第4期16卷 139-147页
作者: Alvin Loke Franck Arnaud Masahiko Kanda Takashi Tokuda
Provides society information that may include news, reviews or technical notes that should be of interest to practitioners and researchers.
来源: 评论
VirtualN2PDK: A Predictive Process Design Kit for 2-nm Nanosheet FET technology
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ieee TRANSACTIONS ON VERY LARGE SCALE INTEGRATION (vlsi) SYSTEMS 2025年 第4期33卷 1004-1013页
作者: Liu, Yiying Yin, Minghui Zhou, Huanhuan You, Yunxia Zhang, Weihua Liu, Hongwei Wang, Chen Zou, Yajie Li, Zhiqiang Chinese Acad Sci Inst Microelect EDA Ctr Beijing 100029 Peoples R China Univ Chinese Acad Sci Sch Integrated Circuits Beijing 100049 Peoples R China State Key Lab Fabricat Technol Integrated Circuits Beijing 100029 Peoples R China
Nanosheet FETs (NSFETs) are considered promising candidates to replace FinFETs as the dominant devices in sub-5-nm processes. To encourage further research into NSFET-based integrated circuits, we present Virtual_N2_P... 详细信息
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Compact On-Chip Half-Mode SIW-Based Dual-Band Bandpass Filter Using 3-D Stacked Inductors With Controllable Transmission Zero
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ieee TRANSACTIONS ON VERY LARGE SCALE INTEGRATION (vlsi) SYSTEMS 2025年 第4期33卷 1167-1171页
作者: Liu, Nuo Liu, Xiaoxian Zhang, Lei Fan, Chenhui Zhu, Zhangming Xidian Univ Sch Microelect Minist Educ Key Lab Analog Integrated Circuits & Syst Xian 710071 Peoples R China
A compact half-mode substrate-integrated waveguide (HMSIW) dual-band bandpass filter (BPF) is proposed based on the through silicon vias (TSVs) technology in this brief. The two pass bands of the filter operating at 1... 详细信息
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Comprehensive Study of the Impact of LWR on Device Performance in vlsi technology
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ieee TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING 2025年 第1期38卷 12-18页
作者: Wang, Yaoting Wu, Yongyu Gao, Dawei Xu, Kai Zhejiang Univ Coll Integrated Circuits Hangzhou Zhejiang Peoples R China Zhejiang Univ Coll Integrated Circuits ZJU Hangzhou Global Sci & Technol Innovat Ctr Hangzhou 311200 Zhejiang Peoples R China Zhejiang Univ Zhejiang Technol Innovat Ctr CMOS IC Mfg Proc & De Hangzhou 311200 Zhejiang Peoples R China
Line Width Roughness (LWR) has emerged as a pivotal challenge that the semiconductor manufacturing industry must confront. This study provides experimental data to elucidate the mechanism by which LWR affects device p... 详细信息
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Area-Efficient Non-Binary LDPC Decoder With Column-Wise Trellis Min-Max Algorithm
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ieee JOURNAL OF SOLID-STATE circuits 2025年 第3期60卷 1082-1091页
作者: Choe, Jeongwon Lee, Youngjoo Pohang Univ Sci & Technol POSTECH Dept Elect Engn Pohang 37673 South Korea
Considered a next-generation error-correction solution, non-binary low-density parity-check (NB-LDPC) codes exhibit remarkable correcting capabilities, outperforming binary counterparts for severe channel conditions. ... 详细信息
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