In this work, a potential drawback of simultaneously representing a set of data that contains line-ends, isobar, block structure, and pitch linearity intensity signal using a single representative model have been reso...
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In this work, a potential drawback of simultaneously representing a set of data that contains line-ends, isobar, block structure, and pitch linearity intensity signal using a single representative model have been resolved. In a typical model OPC procedure, a set of pattern data representative of OPC layout is calibrated using a single representative model, and this model may be a scalar or a vector at constant threshold or variable threshold. Nevertheless, traditional methodology treats a set of pattern data as a whole believing that it provides a best representation of a more complicated environment. In this study, pattern type specific models are used to perform optical proximity correction. this multi-model approach distinguishes each pattern type and specified pitch range a priori to obtaining intensity signal by checking for neighboring segment. Based on this search result, its segment is classified into a pattern type and subgroup, and then, pattern specific models are applied. this approach provides improved calibration result for strong off-axis illumination and optical proximity correction result which will be difficult to achieve with a single representative model.
In this paper we address the problem that most face recognition approaches neglect that faces share strong visual similarities, which can be exploited when learning discriminative models. Hence, we propose to model fa...
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the principle of maximum entropy is a powerful framework that can be used to estimate class posterior probabilities for patternrecognition tasks. In this paper, we show how this principle is related to the discrimina...
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In this study we consider the classification of emblematic gestures based on ensemble methods. In contrast to HMM-based approaches processing a gesture as a whole, we classify trajectory segments comprising a fixed nu...
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In this paper a writer-independent on-line handwriting recognition system is described comparing the effectiveness of several confidence measures. Our recognition system for single german words is based on Hidden Mark...
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We present a system for tracking the hands of a user in a frontal camera view for gesture recognition purposes. the system uses multiple cues, incorporates tracing and prediction algorithms, and applies probabilistic ...
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Electrostatic chucking is the plan of record for mask clamping in Extreme Ultraviolet (EUV) lithography. In order to minimize mask distortion it is recommended by the EUV lithography community that identical electrost...
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Electrostatic chucking is the plan of record for mask clamping in Extreme Ultraviolet (EUV) lithography. In order to minimize mask distortion it is recommended by the EUV lithography community that identical electrostatic chucks be used in the mask patterning and metrology tools. the high voltages used in electrostatic chucking have the potential to establish voltages on the mask surface, which may influence the electron optical characteristics of the pattern generator to the detrimental imaging of the pattern. To understand the relationship between image degradation and mask surface voltages, we are modeling the interaction between mask potential and electron beam columns. the first system modeled consists entirely of electrostatic elements, and the second one is a more traditional electron beam lithography system with electrostatic and magnetic components. All of the working parameters of the systems were fixed to establish optimal imaging on the grounded mask. We then altered the potential on the mask surface and determined the impact on focus and deflection errors. the simulation results establish the relationship between the mask potential, focus and deflection errors. Detailed data of focus deflection error versus mask potential will be presented for these electron beam column configurations. When combined with ITRS roadmap specifications, these results set boundaries on mask and chuck configurations as well as grounding schemes. the results are also applicable to charged particle maskless lithography schemes as well as issues of substrate charging in bothpattern generators and metrology tools.
During analyzing of geophysical data, the problem of highlighting a form of geophysical signals often appears. In this work, it is proposed to use deep learning, which is currently one of the top priorities in the fie...
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ISBN:
(数字)9781510631694
ISBN:
(纸本)9781510631694
During analyzing of geophysical data, the problem of highlighting a form of geophysical signals often appears. In this work, it is proposed to use deep learning, which is currently one of the top priorities in the field of artificial intelligence and machine learning. the samples of geophysical signals, as well as the generated samples of signals by their mathematical models and typical examples of forms, act as a training dataset for deep neural network. End-to-end demonstration examples of the highlighting of reflection traces from different layers of the ionosphere in the ionograms, as well as the highlighting of whistler forms in the VLF spectrograms are presented.
In this paper, we present a new scheme for off-line recognition of multi-font numerals using the Takagi-Sugeno (TS) model. In this scheme, the binary image of a character is partitioned into a fixed number of sub-imag...
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Sum-of-Squares polynomial normalizing flows have been proposed recently, without taking into account the convexity property and the geometry of the corresponding parameter space. We develop two gradient flows based on...
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