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检索条件"任意字段=3rd Conference on Advances in Laboratory-Based X-Ray Sources and Optics"

共 78 条记录，以下是41-50 订阅

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Crystal Quality Analysis and Improvement Using x-ray Topography

Crystal Quality Analysis and Improvement Using X-ray Topogra...

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3rd conference on advances in x-ray/EUV optics and Components

作者： Maj, J. A. Goetze, K. Macrander, A. T. Zhong, Y. C. Huang, x. R. Maj, L. Argonne Natl Lab 9700 S Cass Ave Argonne IL 60439 USA Univ Chicago Chicago IL 60637 USA

ISBN: (纸本)9780819472977

The Topography x-ray laboratory of the Advanced Photon Source (APS) at Argonne National laboratory operates as a collaborative effort with APS users to produce high performance crystals for APS x-ray beamline experiments. For many years the topography laboratory has worked closely with an on-site optics shop to help ensure the production of crystals with the highest quality, most stress-free surface finish possible. It has been instrumental in evaluating and refining methods used to produce high quality crystals. Topographical analysis has shown to be an effective method to quantify and determine the distribution of stresses, to help identify methods that would mitigate the stresses and improve the Rocking curve, and to create CCD images of the crystal. This paper describes the topography process and offers methods for reducing crystal stresses in order to substantially improve the crystal optics.

关键词： Crystals x-rays Silicon Crystal optics Laser crystals Monochromators Surface finishing Diamond Photonic crystals Germanium

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Aberrations in curved x-ray multilayers

Aberrations in curved x-ray multilayers

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3rd conference on advances in x-ray/EUV optics and Components

作者： Morawe, Ch. Guigay, J-P. Mocella, V. Ferrero, C. Mimura, H. Handa, S. Yamauchi, K. European Synchrotron Radiat Facil BP 220 F-38043 Grenoble France CNR IMM I-80131 Naples Italy Osaka Univ Suita Osaka 5650871 Japan

ISBN: (纸本)9780819472977

Aberration effects in curved multilayers for hard x rays are studied using a simple analytical approach. The method is based on geometrical ray tracing including refraction effects up to the first order of the refractive index decrement delta. The interpretation of the underlying equations provides fundamental insight into the focusing properties of these devices. Using realistic values for the multilayer parameters the impact on spot broadening and chromaticity is evaluated. The work is complemented by a comparison with experimental focusing results obtained with a W/B4C multilayer mirror.

关键词： x-ray optics x-ray multilayers nano-focusing aberrations

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Development of ultrahigh-resolution inelastic x-ray scattering optics

Development of ultrahigh-resolution inelastic x-ray scatteri...

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3rd conference on advances in x-ray/EUV optics and Components

作者： Huang, xian-Rong Zhong, Zhong Cai, Yong Q. Coburm, S. Brookhaven Natl Lab Natl Synchrotron Light Source 2 Upton NY 11793 USA

ISBN: (纸本)9780819472977

One of the major goals of the National Synchrotron Light Source II project is to achieve ultrahigh energy resolution up to 0.1 meV for medium-energy inelastic x-ray scattering spectroscopy based on the angular dispersion optics employing extremely asymmetric backscattering geometry. In this papaer, we describe the complete monochromatization mechanisms underlying the new optics. We have also designed and tested a CDW-CDW prototype under ambient condition. with which we have successfully demonstrated the important angular dispersion effect, the Borrman enhanced transmission effect, and other optical principles involved in every step of the entire diffraction process, and found good agreement with the theoretical expectations. These studies indicate that the new optics are feasible in principle but face some technical challenges that need to be solved by our future systematic research and development activities before their practical applications.

关键词： x-ray optics angular dispersion monochromator analyzer inelastic x-ray scattering

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Opto-mechanical design considerations for the Linac Coherent Light Source x-ray mirror system

Opto-mechanical design considerations for the Linac Coherent...

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3rd conference on advances in x-ray/EUV optics and Components

作者： McCarville, T. J. Stefan, P. M. Woods, B. Bionta, R. M. Soufli, R. Pivovaroff, M. J. Lawrence Livermore Natl Lab 7000 East Ave Livermore CA 94550 USA Stanford Linear Accelerator Ctr Menlo Pk CA 94025 USA

ISBN: (纸本)9780819472977

The Linac Coherent Light Source (LCLS) is all x-ray Free Electron Laser (FEL) currently under construction at the Stanford Linear Accelerator Center. Coherent x-rays present interesting challenges for the opto-mechanical system that delivers the beam to experiments. One challenge is to limit the effect mirror reflections have on the beam intensity profile at the experiment stations. This imposes stringent requirements on mirror surface figure. A second challenge is that the distance from the mirrors to experiments is much greater than for prior generation x-ray sources. This imposes stringent requirements on mirror pointing resolution and stability. Pointing resolution must be within 100 nano-radians for the furthest experiments, and must be stable throughout the experiment duration. This paper describes the opto-mechanical system being designed for LCLS, and how it rises to these challenges. The design approach and supporting analysis are described, along with experimental results from prototypes.

关键词： x-ray FEL opto-mechanical mirror figure pointing resolution pointing stability

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Calibration of MCP transmissivity from 2-5.5keV

Calibration of MCP transmissivity from 2-5.5keV

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3rd conference on advances in x-ray/EUV optics and Components

作者： Cao Zhu-rong Li Hang Dong Jian-jun Wu Shun-chao Yi Rong-qing China Acad Engn Res Ctr Laser Fus Mianyang 621900 Peoples R China

ISBN: (纸本)9780819472977

A micro-channel plate (MCP) transmissivity is calibrated using the 3133 medium energy x-ray beamline (from 2.0 to 5.5keV) on Beijing Synchrotron Radiation Facility (BSRF). MCP transmissivity near the two ends of low-energy 2.0keV and high-energy 5.5keV is higher than the middle part. We calculate reflectivity and transmission in the pores array of MCP respectively, and take the experiment result into account synthetically. It uncovers that the grazing incident x-ray in pores results in the total reflection, and the reflectivity rises as the x-ray energy decreases, which successfully explains the peculiar phenomena of the high transmissivity in low energy.

关键词： MCP transmissivity synchrotron radiation x-ray beam capillary-based x-ray optical ray trace simulation x-ray reflectivity the critical angle of the reflection reflecting times

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Performance of the upgraded LTP-II at the ALS Optical Metrology laboratory

Performance of the upgraded LTP-II at the ALS Optical Metrol...

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3rd conference on advances in x-ray/EUV optics and Components

作者： Kirschman, Jonathan L. Domning, Edward E. McKinney, Wayne R. Morrison, Gregory Y. Smith, Brian V. Yashchuk, Valeriy V. Univ Calif Berkeley Lawrence Berkeley Lab Adv Light Source Berkeley CA 94720 USA

ISBN: (纸本)9780819472977

The next generation of synchrotrons and free electron laser facilities requires x-ray optical systems with extremely high performance, generally of diffraction limited quality. Fabrication and use of such optics requires adequate, highly accurate metrology and dedicated instrumentation. Previously, we suggested ways to improve the performance of the Long Trace profiler (LTP), a slope measuring instrument widely used to characterize x-ray optics at long spatial wavelengths. The main way is use of a CCD detector and corresponding technique for calibration of photo-response non-uniformity [J. L. Kirschman, et al., Proceedings of SPIE 6704, 67040J (2007)]. The present work focuses on the performance and characteristics of the upgraded LTP-II at the ALS Optical Metrology laboratory. This includes a review of the overall aspects of the design, control system, the movement and measurement regimes for the stage, and analysis of the performance by a slope measurement of a highly curved super-quality substrate with less than 0.3 microradian (rms) slope variation.

关键词： slope measuring instrument long trace profiler LTP 2D detector error systematic error reduction

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Investigation of polycrystalline structure of CVD diamond using whitebeam x-ray diffraction

Investigation of polycrystalline structure of CVD diamond us...

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3rd conference on advances in x-ray/EUV optics and Components

作者： Souvorov, Alexey Kajiwara, Kentaro Kimura, Hiroaki Goto, Shunji Ishikawa, Tetsuya SPring 8 JASRI Kouto 1-1-1 Sayo Hyogo 6795198 Japan SPring 8 RIKEN Sayo Hyogo 6795148 Japan

ISBN: (纸本)9780819472977

Polycrystalline structure of a chemical vapor deposited (CVD) diamond vacuum window was investigated by means of white-beam diffraction. Forward Laue diffraction patterns were recorded using two-dimensional flat panel sensor. A computer aided approximate indexation of the Laue spots was performed based on maximum correlation between observed and directly simulated patterns. Different sets of the diffraction patterns were attributed to the different diamond crystalline grains. Retrieved orientations of the illuminated grains were rather random and average linear dimension of the single grain was about 56-64 mu m.

关键词： CVD diamond white beam Laue diffraction polycrystalline structure

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Surface roughness analysis of multilayer x-ray optics

Surface roughness analysis of multilayer x-ray optics

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3rd conference on advances in x-ray/EUV optics and Components

作者： Martynov, Vladimir V. Platonov, Yuriy Y. Rigaku Innovat Technol Inc Auburn Hills MI 48326 USA

ISBN: (纸本)9780819472977

Rigaku Innovative Technologies (RIT) produces x-ray optics based on multilayer mirrors. A multilayer mirror is deposited on a wafer and mounted on a solid backing plate in an elliptical shape to focus x-rays. The wafer surface imperfections, defects from the multilayer deposition, and figure errors induced by the mounting process result in some focal spot widening for the final optics. An AFM is used in the spatial period range 0.1 - 10 microns, and a "ZYGO" interferometric microscope is used in the spatial period range I micron - 5 mm, to study these imperfections determining the influence of each technological step oil the focal spot quality. AFM analysis shows dramatically different roughness between I x I micron and 20 x 20 micron field of view on super-polished substrates from some suppliers and only a little difference from others. A smoothing effect of a multilayer coating at spatial periods less than one micron as well as defects in multilayer coatings have been observed with power spectral density analysis. Machining marks on the surface of wafers are clearly seen at ZYGO microscope pictures. ray-tracing simulations based on the ZYGO data show the focal spot shape changes due to the figure errors introduced at the step of a multilayer coated wafer mounting and only background scattering with no focal spot widening from defects induced at the step of multilayer deposition.

关键词： x-ray optics multilayer mirrors surface roughness slope errors

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Development, characterization and experimental performance of x-ray optics for the LCLS free-electron laser

Development, characterization and experimental performance o...

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3rd conference on advances in x-ray/EUV optics and Components

作者： Soufli, Regina Pivovaroff, Michael J. Baker, Sherry L. Robinson, Jeff C. Gullikson, Eric M. McCarville, Tom J. Stefan, Peter M. Aquila, Andrew L. Ayers, Jay McKernan, Mark A. Bionta, Richard M. Lawrence Livermore Natl Lab 7000 East Ave Livermore CA 94550 USA Univ Calif Berkeley Lawrence Berkeley Natl Lab Berkeley CA 94720 USA Stanford Linear Accelerator Ctr Menlo Pk CA 94025 USA

ISBN: (纸本)9780819472977

This manuscript discusses the development of reflective optics for the x-ray offset mirror systems of the Linac Coherent Light Source (LCLS), a 0.15-1.5 nm free-electron laser (FEL) at the Stanford Linear Accelerator Center (SLAC). The unique properties (such as the high peak brightness) of the LCLS FEL beam translate to strict lit-nits in terms of materials choice, thus leading to an x-ray mirror design consisting of a reflective coating deposited on a silicon substrate. Furthermore, the physics requirements for these mirrors result in stringent surface figure and finish specifications that challenge the state-of-the-art in x-ray substrate manufacturing, thin film deposition, and metrology capabilities. Recent experimental results on the development, optimization, and characterization of the LCLS soft x-ray mirrors are presented in this manuscript, including: precision Surface metrology on the silicon substrates, and the development of boron carbide reflective coatings with reduced stress and thickness variation < 0.14 nm rms across the 175-mm clear aperture area of the LCLS soft x-ray mirrors.

关键词： free-electron lasers x-ray optics boron carbide

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Multilayer optics under CHESS A2 Wiggler Beam

Multilayer Optics under CHESS A2 Wiggler Beam

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3rd conference on advances in x-ray/EUV optics and Components

作者： Kazimirov, A. Revesz, P. Huang, Rong Cornell Univ CHESS Ithaca NY 14853 USA Univ Chicago IMCA CAT CARS Argonne IL 60439 USA

ISBN: (纸本)9780819472977

The CHESS A-line 49 pole wiggler produces a total power of 6.6 kW when operating at 5.3 GeV and 200 mA current. Half of this beam is directed into the A2 station operating with both crystal and multilayer optics. The heat load response of the multilayer optics was studied by changing the total power deposited on the first multilayer by varying the slit size. The W/B4C, 300 bi-layers, d=15 angstrom multilayers with the energy resolution of triangle E/E=0.5% were used in our experiment. The results from identical multilayers deposited on Si and SiC substrates, which differ by a factor of two in thermal conductivity, are presented and compared. The thermal distortions of the first multilayer were measured by using recently developed optical in-situ visualization technique and compared with ANSYS simulations. x-ray measurements of the monochromator throughput and effective source size confirm the results of the optical measurements and ANSYS simulations and demonstrate the superior behavior of SiC-substrate based ML optics under high heat load.

关键词： multilayers synchrotron radiation high heat load

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