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检索条件"任意字段=3rd Conference on Advances in X-Ray/EUV Optics and Components"

共 145 条记录，以下是1-10 订阅

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advances in magnetic smart materials for synchrotron x-ray optics: a progress report on annealing and ultra-thin glass substrates 19

Advances in magnetic smart materials for synchrotron X-ray o...

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conference on advances in x-ray/euv optics and components xIx

作者： Ulmer, Melville P. Capoot, Connor J. Assoufid, Lahsen Quispe, Daniel Buchholz, Donald B. Chung, Yip-Wah Cao, Jian Northwestern Univ Ctr Interdisciplinary Explorat & Res Astrophys CI 2145 Sheridan Rd Evanston IL 60208 USA Northwestern Univ Dept Phys & Astron 2145 Sheridan Rd Evanston IL 60208 USA Northwestern Univ Dept Mech Engn 2145 Sheridan Rd Evanston IL 60208 USA Argonne Natl Lab Adv Photon Source Argonne IL 60439 USA Northwestern Univ Mat Res Ctr Dept Mat Sci & Engn 2145 Sheridan Rd Evanston IL 60208 USA

ISBN: (纸本)9781510679610;9781510679603

Magnetic smart materials (MSMs) offer an alternative to the typical piezo-electric actuators currently used to control x-ray optics on beamlines. MSMs, combined with an overcoating of a magnetic hard material, create a deformable mirror that can operate in a power-off mode. The non-reflective side of the mirror is coated with an MSM and the magnetic hard overcoat. The process works by using an electromagnet (EM) to impose a magnetic field in the bilayer of the MSM and the magnetic hard overcoat, causing the mirror to deflect. Once the EM is turned off, the mirror settles into a new shape within minutes, which can remain intact for days. Since the EM is not fixed to the mirror, the exact placement of the magnetic field can be adjusted by relocating the EM. This feature allows for fine-scale adjustments and avoids the "dead pixel" replacement problem common with piezo patches attached to the mirror. Here, we provide a progress report based on laboratory-produced data.

关键词： deformable mirrors Terfenol-D magnetostriction active x-ray optics annealing

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Post-production correction of lamellar x-ray gratings by ion beam figuring 19

Post-production correction of lamellar x-ray gratings by ion...

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conference on advances in x-ray/euv optics and components xIx

作者： Voronov, D. L. Wang, T. Park, S. Huang, L. Gullikson, E. M. Salmassi, F. Samudrala, S. Ch Padmore, H. A. Idir, M. Lawrence Berkeley Natl Lab 1 Cyclotron Rd Berkeley CA 94720 USA Brookhaven Natl Lab POB 5000 Upton NY 11973 USA

ISBN: (纸本)9781510679610;9781510679603

Ion-beam figuring (IBF) capable of providing sub-nanometer shape accuracy, is often used for fabrication of ultra-precise x-ray optics. However, in the case of gratings, the optical surface may degrade during the following ruling procedure or etching processes. This leads to the necessity for a post-ruling surface correction to recover the ultra-precise shape of the optics, while the IBF substrate finish prior the ruling could be omitted. If so, the gratings can be made using relatively inexpensive substrates produced with conventional mechanical or chemical-mechanical polishing with medium optical surface quality and then processed with a post- ruling IBF to bring the shape to the sub-nanometer accuracy. The key question is whether the grating grooves survive the IBF treatment since the ion beam bombardment is known to result in surface smoothing. We previously investigated smoothing of saw-tooth surfaces sputtered by Ar+ ions and found that IBF worked well for low blaze angle gratings which are highly stable during a reasonably short IBF treatment [Voronov et al., Opt. Express 31 (21) 2023]. In this work we investigate the possibility of post- production IBF correction for lamellar x-ray gratings. A 200 lines/mm lamellar grating made using a lambda/20 Si substrate was processed with IBF to achieve a subnanometer flat optical surface of the final grating. We report on impact of the IBF process on groove profile, surface roughness, and diffraction efficiency of the grating.

关键词： x-ray diffraction gratings lamellar gratings ion-beam figuring stitching interferometry diffraction efficiency

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Performance of Plane Wavefront Fizeau Interferometers in Power Spectral Density Measurements with Tilted Plane optics 19

Performance of Plane Wavefront Fizeau Interferometers in Pow...

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conference on advances in x-ray/euv optics and components xIx

作者： Yashchuk, Vladimir V. Munechika, Kazuo Rochester, S. Takacs, P. Z. Lacey, I Yamada, K. LBNL Adv Light Source 1 Cyclotron Rd Berkeley CA 94720 USA HighRl Opt Inc 5401 Broadway TerrSt 304 Oakland CA 94618 USA Rochester Sci LLC 2041 Tapscott Ave El Cerrito CA 94530 USA Surface Metrol Solut LLC 19 S 1st StUnit B901 Minneapolis MN 55401 USA

ISBN: (纸本)9781510679610;9781510679603

Binary pseudo-random array (BPRA) test samples are useful devices for calibrating the instrument transfer function (ITF) of Fizeau interferometers, interferometric microscopes, and other optical and non-optical surface and wavefront metrology instruments. The intrinsic white noise character of the power spectral density (PSD) function of the BPRA pattern simplifies the extraction of the ITF from the measured PSD. The ITF determined in a dedicated calibration experiment can be used to reconstruct the surface height profile from the measured data, effectively enhancing the instrument's spatial resolution. For a high confidence reconstruction procedure, a reliable analytical model of the IFT is desirable. Usually, the model accounts for the contributions to the ITF related the imperfections of the instrument's optical and detector systems. Here, we experimentally demonstrate that in the case of surface height metrology with Fizeau interferometers, the PSD measurements and, therefore, the efficacy of the ITF calibration of the tool, are strongly affected by the instrument data acquisition and processing procedures, as well as by the shape of the optic under test and its alignment with respect to the interferometer.

关键词： Fizeau interferometry calibration systematic error retrace error instrument transfer function binary pseudorandom surface metrology x-ray optics

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Measurement of aspherical and free-form mirror using ultrahigh accurate 3-D profilometer (UA3P) 19

Measurement of aspherical and free-form mirror using ultrahi...

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conference on advances in x-ray/euv optics and components xIx

作者： Handa, Koji Sakuma, Tatsuya Sugino, Akihiko Kobayashi, Kazumi Shibutani, Toshio Panasonic Prod Engn Co Ltd 2-7 Matsuba Cho Kadoma Osaka 5718502 Japan

ISBN: (纸本)9781510679610;9781510679603

CMMs (Coordinate Measuring Machines) can measure the geometric tolerances of various mechanical components, but even the most accurate CMM have submicron accuracy, which makes it difficult to use them for evaluating optical components. On the other hand, more accurate mu-CMMs that can measure small optical components have also been developed [1] [2] [3]. Our mu-CMM (UA3P) has three high-precision plane mirrors to construct three-dimensional orthogonal xYZ coordinates and uses a frequency-stabilized HeNe laser as the length scale. By scanning the surface of the object with a tactile-type probe, it is possible to measure the profile of optical components such as aspherical or free-form mirrors and lenses with an accuracy of less than 50 nm[4]. In this paper, by using a high accurate flat bar mirror whose profile has been measured by National Institute of Advanced Industrial Science and Technology (AIST) and making error table to correct the profile of the Z reference mirror installed in the machine, we could reduce the profile error of Z reference mirror within 24 nm on the 400 mm square in the xY plane. For tactile-type measurement machine, if the measurement range is large, the measurement time may be over an hour. Even in such the case of long-time measurements, we verified a method of configuring the profile of measured surfaces by referring to base axis data measured in a short period of time, and confirmed that profile waviness can be detected with 10 nm precision by comparison with an interferometer. The advantage of a mechanical tactile measuring machine is that it can evaluate the profile without being influenced by the profile of the object. This means that our mu-CMM can perform highly accurate absolute profile measurement and evaluation for large-area free-form samples that are difficult to measure with an interferometer.

关键词： mu-CMM 3D profilometer Free-form mirror Aspherical lens tactile measurement machine

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Binary pseudo-random array standards for calibration of 3D optical surface profilers used for metrology with significantly curved x-ray optics 19

Binary pseudo-random array standards for calibration of 3D o...

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conference on advances in x-ray/euv optics and components xIx

作者： Munechika, K. Yamada, K. Rochester, S. Barnard, H. Chao, W. Laceyd, I Pina-Hernandez, C. Takacs, P. Z. Yashchuk, V. V. HighRI Opt Inc 5401 Broadway TerrSt 304 Oakland CA 94618 USA Rochester Sci LLC 2041 Tapscott Ave El Cerrito CA 94530 USA Lawrence Berkeley Natl Lab Ctr Xray Opt Berkeley CA 94720 USA Lawrence Berkeley Natl Lab Adv Light Source Berkeley CA 94720 USA Surface Metrol Solut LLC 19 S 1st StUnit B901 Minneapolis MN 55401 USA

ISBN: (纸本)9781510679610;9781510679603

High-accuracy metrology is vitally important in manufacturing ultra-high-quality free-form mirrors designed to manipulate x-ray light with nanometer-scale wavelengths. The current capabilities and possibility for improvements in xray mirror manufacturing are limited by inherent imperfections of the integrated metrology tools. In the case of Fizeau interferometry, metrology tools are currently calibrated with super-polished flat test-standard/reference mirrors. This is acceptable for measuring slightly curved x-ray optics. However, for even moderately curved aspherical x-ray mirrors the flat-reference calibration is not sufficiently accurate and stitching Fizeau interferometer-based surface metrology is used to mitigate the problem. But still, the retrace and aberration errors, as well as the limited spatial resolution, described with the instrument transfer function (ITF), can be transferred into the optical surface topography of x-ray mirrors obtained in stitching metrology. For ITF calibration, we have developed an original technique, based on test standards structured as two-dimensional (2D) highly-randomized (HR) binary pseudo-random arrays (BPRAs). The technique employs the unique properties of the HR BPRA patterns in the spatial frequency domain., i.e. the inherent 2D power spectral density of the HR BPRA pattern has a deterministic white-noise-like character that allows direct determination of the ITF with uniform sensitivity over the entire spatial frequency range and field-of-view of an instrument. Here, we explore technological, metrological, and analytical aspects essential for calibration of the retrace and aberration errors of Fizeau interferometers using different types of tilted test samples, including a super-polished reference mirror for the re-trace calibration and the uniformly redundant array (URA) BPRA standards for the geometrical distortion (aberration) calibration. While the first method was previously demonstrated by researchers at DIAMOND L

关键词： Fizeau interferometer retrace errors geometrical distortion calibration binary pseudo-random test standard instrument transfer function stitching surface metrology

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Magnetic smart material application to synchrotron x-ray optics: prospects and current progress 27

Magnetic smart material application to synchrotron X-ray opt...

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conference on advances in x-ray/euv optics and components xVII

作者： Ulmer, Melville P. Quispe, Daniel Buchholz, Donald B. Chung, Yip-Wah Cao, Jian Kritikos, Konstantina Northwestern Univ Ctr Interdisciplinary Explorat & Res Astrophys CI 2145 Sheridan Rd Evanston IL 60208 USA Northwestern Univ Dept Phys & Astron 2145 Sheridan Rd Evanston IL 60208 USA Northwestern Univ Dept Mech Engn 2145 Sheridan Rd Evanston IL 60208 USA Northwestern Univ Mat Res Ctr Dept Mat Sci & Engn 2145 Sheridan Rd Evanston IL 60208 USA Northwestern Univ Dept Chem Engn 2145 Sheridan Rd Evanston IL 60208 USA

ISBN: (纸本)9781510654655;9781510654648

Magnetic smart materials (MSMs) offer an alternative to the typical piezo-electric actuators that are currently being used to control x-ray optics on beam lines. MSMs combined with an overcoating of a magnetic hard material means a deformable mirror whose non-reflecting side is coated with a MSM plus magnetic hard overcoat can work in a power-off mode. The process works by using an electromagnet (EM) to impose a magnetic field in the bilayer of MSM and magnetic hard overcoat. Once the EM is turned off, the mirror settles to a new shape within minutes. The new shape can then remain intact for days. Since the EM is not fixed to the mirror, the exact placement of the magnetic field can be adjusted by relocating the EM. This feature allows for fine-scale adjustments and avoids the "dead pixel" replacement problem common with piezo patches that are attached to the mirror. We will give an overview and a progress report.

关键词： deformable mirrors Terfenol-D magentostriction Active x-ray optics

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Addressing Calibration of High Harmonic Generation Sources used for Studying Magnetism 18

Addressing Calibration of High Harmonic Generation Sources u...

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advances in x-ray/euv optics and components xVIII 2023

作者： Buckway, Taylor J. Redd, Aaron Lewis, Devin Gullikson, Eric Vawdrey, Joshua Chesnel, Karine Allred, David Sandberg, Richard L. Department of Physics and Astronomy Brigham Young University N269 Eyring Science Center Provo United States Lawrence Berkeley National Laboratory 1 Cyclotron Rd Berkeley United States

ISBN: (纸本)9781510666023

Tabletop extreme ultraviolet (euv) sources based on high harmonic generation (HHG) have been used as a powerful tool for probing magnetism. Obtaining magnetic information via magneto-optical contrast often requires the energy of the light to be tuned to magnetic resonance energies of the magnetic element present in the material;therefore, it is essential to calibrate the HHG spectrum to well defined absorption energies of materials. We have designed and assembled a HHG based euv source for studying transition metal magnetic materials at their resonant M-absorption edges (35-75 eV of photon energy). One material of interest is iron, for which the iron M2,3 edge is 52.7 eV (23.5 nm wavelength) according to CxRO. We prepared and characterized a thin sample of iron for absorption spectroscopy and calibration of the absorption edge with beamline 6.3.2 at the Advance Light Source (ALS) in Lawrence Berkeley National Laboratory. This well characterized sample was capped with gold to prevent oxidation. From these measurements we extracted the absorption part of the index of refraction β spectrally and confirmed that the absorption edge of iron is 52.7 eV. With this information, we can better calibrate the HHG spectrum of our tabletop euv source. Calibration of the HHG spectrum was achieved using model fitting the HHG spectrum using the grating equation and law of cosines while taking account into the results of the ALS data. We have determined that driving wavelength of the HHG process to be 773 nm. We also conclude that the chirp of the driving laser pulse can cause an energy shift to a HHG spectrum. © 2023 SPIE.

关键词： Iron

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Fabrication of low blaze angle gratings by replication and plasma etch 27

Fabrication of low blaze angle gratings by replication and p...

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conference on advances in x-ray/euv optics and components xVII

作者： Park, Sooyeon Voronov, Dmitriy L. Wojdyla, Antoine Gullikson, Eric M. Salmassi, Fahard Padmore, Howard A. Lawrence Berkeley Natl Lab 1 Cyclotron Rd Berkeley CA 94720 USA

ISBN: (纸本)9781510654655;9781510654648

We suggest a new method of making ultra-low blaze angle gratings for synchrotron application. The method is based on reduction of the blaze angle of a master grating by replication followed by a plasma etch. A master blazed grating with a relatively large blaze angle is fabricated by anisotropic wet etching of a Si single crystal substrate. The surface of the master grating is replicated by a polymer material on top of a quartz substrate by nanoimprinting and then transferred into quartz by a plasma etch. Then a 2nd nanoimprint step is applied to transfer the saw-tooth surface into a resist layer on top of a Si grating substrate. The plasma etch through the patterned resist layer provides transfer of the grooves into the Si substrate and results in reduction of the blaze angle due to the difference in etch rates of the resist and Si. We investigated the impact of the replication process on the groove shape, facet surface roughness, and diffraction efficiency of the fabricated 200 lines/mm low blaze angle grating.

关键词： ALS-U x-ray diffraction gratings blaze angle saw-tooth gratings nanoimprinting plasma etching angle reduction diffraction efficiency

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Surface evaluation of high-precision monolithic mirror for soft x-ray focusing 27

Surface evaluation of high-precision monolithic mirror for s...

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conference on advances in x-ray/euv optics and components xVII

作者： Kume, T. Matsuzawa, Y. Hiraguri, K. Takeo, Y. Kimura, T. Kishimoto, H. Senba, Y. Ohashi, H. Hashizume, H. Mimura, H. Natsume Opt Corp Technol Ctr 1200-29 Kawaji Iida Nagano 3992431 Japan Univ Tokyo Inst Solid State Phys Kashiwa Chiba 2778581 Japan Japan Synchrotron Radiat Res Inst JASRI I-1-1 Kouto Sayo Cho Hyogo 6795198 Japan Univ Tokyo Sch Engn Dept Precis Engn 7-3-1 HongoBunkyo Ku Tokyo 1138656 Japan

ISBN: (纸本)9781510654655;9781510654648

For application in the soft x-ray region, focusing mirrors having a steep shape with small radii of curvature of several tens to hundreds of millimeters and a deep sag of a few millimeters have recently been designed. These mirrors are difficult to fabricate with high accuracy owing to the challenges in figure measurement. In this study, we demonstrate the surface measurement of a flat substrate and soft x-ray Wolter mirror using a tactile profiler. The comparison with a stitching interferometry image of the flat substrate showed an agreement of mid- to high-spatial-frequency errors. The tactile measurement of the Wolter mirror exhibited a root-mean-square figure error of 2.49 nm.

关键词： soft x-ray x-ray mirror figure measurement

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The large offset double-crystal monochromator for LCLS-HE upgrade 27

The large offset double-crystal monochromator for LCLS-HE up...

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conference on advances in x-ray/euv optics and components xVII

作者： Cheng, xianchao Morton, Daniel S. Baker, Robert Alan Whitney, Randy A. Armenta, Rebecca R. Zhu, Diling Zhang, Lin SLAC Natl Accelerator Lab 2575 Sand Hill Rd Menlo Pk CA 94025 USA

ISBN: (纸本)9781510654655;9781510654648

The Linac Coherent Light Source (LCLS) is being upgraded to the high repetition rate (up to 1 MHz) mode using cryogenic modules. As the key optical element at the x-ray Pump-probe (xPP) beamline, the goal of the large offset double-crystal monochromator (LODCM) for the High Energy (HE) upgrade is to maintain its x-ray beam multiplexing capability at higher average beam power (up to 200W) for the whole hard x-ray operating range of 6-25 keV. The upgraded LODCM system will use an upstream diamond transmission grating to achieve high power beam multiplexing. It will enable the 0th order 'transmission' from the grating to pass through the xPP hutch. The +1st order beam, which contains about 20% power of the incident beam of the grating, will be monochromatized at the 1st crystal position, then directed to xPP experiments at the 2nd crystal position. Both crystal positions will provide 111 and 220 Si crystals. The 1st crystals need to be cooled by Liquide Nitrogen to minimize their thermal deformation under heat load. The second crystals will be controlled close to ambient temperature. The temperature difference between the two crystals leads to a lattice constant mismatch. The corresponding difference in Bragg angles is utilized to compensate the angle between the 1st order beam and 0th order beam (initial beam propagation axis) from the grating splitter, making it possible to maintain the propagation direction of the monochromatized beam exiting the LODCM parallel to the 0th order incoming beam.

关键词： xFEL Monochromator DCM Liquid-nitrogen Beam splitting

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