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4th conference on design and process integration for microelectronic manufacturing

作者： Huang, Yongfa Tseng, Edward Lin, Benjamin Szu-Min Yu, Chun Chi Wang, Chien-Ming Liu, Hua-Yu United Microelect Corp 18 Nan Ke Rd 2Sci Based Ind Pk Shan Hua 741 Tainan County Taiwan Brion Technol Santa Clara CA 95054 USA

ISBN: (纸本)0819461997

In this paper, we will demonstrate a novel approach to improve process window prediction capability. the new method, Lithography Manufacturability Check (LMC), will be shown to be capable of predicting wafer level CDs across an entire chip and the lithography process window with a CD accuracy of better than 10nm. the impact of reticle CD error on the weak points also will be discussed. the advantages of LMC for full chip process window analysis as well as the MEEF check to catch process weak points will be shown and the application to real designs will be demonstrated in this paper. LMC and MEEF checks are based on a new lithography model referred to as the Focus Exposure Matrix Model (FEM Model). Using this approach, a single model capable of simulating a complete range of focus and exposure conditions can be generated with minimal effort. Such models will be shown to achieve a predictive accuracy of less than 5nm for device patterns at nominal conditions and less than 10nm across the entire range of process conditions which define the nominal process window. Based on the inspection results of the full chip LMC check, we identify process weak points (with limited process window or excessive sensitivity to mask error) and provide feedback to the front end design stage for pattern correction to maximize the overall process window and increase production manufacturability. the performance and full function of LMC will also be described in this paper.

关键词： process window mask error enhancement factor (MEEF) lithography manufacturability model accuracy lithography simulation process window modeling

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Integrating Kano's Model into Quality Function Deployment for Product design: A Comprehensive Review 4

Integrating Kano's Model into Quality Function Deployment fo...

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4th Asia Pacific conference on manufacturing Systems / 3rd International manufacturing Engineering conference (APCOMS-iMEC)

作者： Ginting, Rosnani Hidayati, Juliza Siregar, Ikhsan Univ North Sumatra Dept Ind Engn Jl AlmamaterKampus USU Medan 20155 Indonesia

Many methods and techniques are adopted by some companies to improve the competitiveness through the fulfillment of customer satisfaction by enhancement and improvement the product design quality. Over the past few years, several researcher have studied extensively combining Quality Function Deployment and Kano's model as design techniques by focusing on translating consumer desires into a product design. this paper presents a review and analysis of several literatures that associated to the integration methodology of Kano into the QFD process. Various of international journal articles were selected, collected and analyzed through a number of relevant scientific publications. In-depth analysis was performed, and focused in this paper on the results, advantages and drawbacks of its methodology. In addition, this paper also provides the analysis that acquired in this study related to the development of the methodology. It is hopedd this paper can be a reference for other researchers and manufacturing companies to implement the integration method of QFD-Kano for product design.

关键词： QFD Kano Product design Integrated Methodology

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Horizontal and vertical integration of product data for the design of moulded interconnect devices

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INTERNATIONAL JOURNAL OF COMPUTER INTEGRATED manufacturing 2009年第11期22卷 1024-1036页

作者： Zhuo, Y. Alvarez, C. Feldmann, K. Univ Erlangen Nurnberg Inst Mfg Automat & Prod Syst Erlangen Germany Xiamen Univ Dept Mech & Elect Engn Xiamen Peoples R China

In this paper, a methodology for the vertical and the horizontal integration of product data fitted to the needs of Moulded Interconnect Devices (3D-MID) is presented. For that purpose, an integrated product model based on STEP and the feature technology is developed. the application objects and schemas of STEP AP210 are used and extended to support the horizontal collaboration between electronic and mechanical design. Special attention is paid to the description of the three-dimensional structure of the circuit carrier and the circuit traces running within it and on its surface. In addition, the integrated product model also supports the hierarchical collaboration between upstream MID design and downstream simulation and manufacturing. Based on this product model, an effective communication between MID design in MIDCAD and the simulation of the injection moulding process in MOLDFLOW and manufacturing utilising MID-specific automatic placement equipment could be established.

关键词： product model STEP integration MID

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Research on integrated Development of Footwear design and manufacturing based on Digital Twin 4

Research on integrated Development of Footwear Design and Ma...

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4th International conference on Intelligent design, ICID 2023

作者： Qiang, Wei Pashkevych, K. Luo, Xiangdong Shaanxi University of Science and Technology College of Design and Art Xi'an China Kyiv National University of Technologies and Design Kyiv Ukraine

ISBN: (纸本)9798350342574

design is the first part of realizing smart manufacturing, and the study of digital twin-based footwear product design and manufacturing integration has an important impact on the subsequent parts processing, assembly, testing and operation and maintenance. In order to make the digital twin technology serve the deep integration of footwear product design and manufacturing, through the interaction and iteration of information and physics in the footwear R & D process, and ultimately realize the intelligent customized R & D mode that serves the whole life cycle of footwear products. To this end, this paper systematically analyzes the connotation of footwear product design and manufacturing integration based on digital twins;proposes a three-layer architecture of footwear product design based on digital twins;and based on the framework, discusses the key technologies of footwear product design and manufacturing integration based on digital twins from the frameworks of acquisition of footwear personalized design requirements, conceptual design mode, personalized function configuration and virtual prototype technology. © 2023 IEEE.

关键词： Product design

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Evaluation by Information integration Method for Improvement designs

Evaluation by Information Integration Method for Improvement...

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4th International conference on manufacturing Science and Engineering (ICMSE 2013)

作者： Izumi, Heikan Sawaguchi, Manabu Waseda Univ Shinjuku Ku Tokyo 1698555 Japan

ISBN: (纸本)9783037856932

We propose an evaluation way by Information integration Method(IIM)[1] for improvement designs. IIM is an evaluation way which is based on Shannon's information theory and is not depending on personal subjectivity. We have confirmed the effectiveness of this evaluation way by confirming a case study of an electric shaver improvement design.

关键词： Information integration Method Improvement design TRIZ VE

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the Research of CAPP System Based on Knowledge integration 4

The Research of CAPP System Based on Knowledge Integration

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4th International conference on Textile Engineering and Materials (ICTEM)

作者： Zhao, Hongzhi Yuan, Zhihua Shenyang Ligong Univ Coll Equipment Engn Shenyang 110159 Liaoning Peoples R China

ISBN: (纸本)9783038352969

After analyzing the present process design technology, the research integrates the present process design technology with CAPP system. In the paper CAPP system based on knowledge integration is introduced here. And the system's framework, data structure, function and its' work flow and design and realization methods are discussed in detail. With the application of the process design system integrated with knowledge, the knowledge of process design will be managed in a unified way and shared among it's users. thus the time spent on production research will be shortened, and the manufacturing facility will be improved.

关键词： CAPP Knowledge process design System integration Management

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An adaptive process management system (APMS)

An adaptive process management system (APMS)

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4th International Working conference on the design of Information Infrastructure Systems for manufacturing (DIISM 2000)

作者： Menzel, C Benjamin, P Knowledge Based Systems Inc. United States

ISBN: (纸本)0792373588

the increasing complexity of manufacturing systems coupled with the emergence of truly global manufacturing enterprises requires the use of novel approaches to facilitate enterprise integration. Specific challenges include (i) the lack of theoretical foundations for enterprise integration and (ii) the absence of mechanisms for knowledge sharing and semantic interoperability. this paper presents a process-centered approach to address these problems. Specifically, the paper describes the theoretical foundations and concept of operation of an integrated architecture for process management, the Adaptive process Management System (APMS). APMS facilitates information-integrated management of the Product Realization process (PRP) using a lifecycle perspective.

关键词： knowledge sharing integration architectures enterprise integration process management

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Triboelectric Nanogenerator and integration with Electrochemical Microsupercapacitor 4

Triboelectric Nanogenerator and Integration with Electrochem...

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4th International conference on Control, Robotics and Cybernetics (CRC)

作者： Feng, Xiao Wang, Kai Li, Shuo Qingdao Univ Sch Elect Engn Qingdao Peoples R China

ISBN: (纸本)9781728146201

With the rapid development of economy and society, microelectronic devices play a more and more important role in our daily life. An important challenge for electronic devices is that the energy storage device is not capable of providing reliable energy for the operation of the electronic device for a long time, resulting in frequent charging or battery replacement. In order to meet the need of the sustainable operation of the next generation electronic equipment, the development of the self-charging energy storage device based on the nanogenerator has made remarkable progress. this paper reviews the device design, working principle, self-charging performance and the potential application prospect of the self-charging memory device. In addition, the challenges facing the self-charging energy storage device are also discussed.

关键词： microelectronic devices frequent charging battery replacement nanogenerator self-charging memory

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Self-compensating design for reduction of timing and leakage sensitivity to systematic pattern dependent variation

Self-compensating design for reduction of timing and leakage...

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4th conference on design and process integration for microelectronic manufacturing

作者： Gupta, Puneet Kahng, Andrew B. B. Kim, Youngmin Sylvester, Dennis Blaze DFM Inc Sunnyvale CA USA

ISBN: (纸本)0819461997

Focus is one of the major sources of linewidth variation. CD variation caused by defocus is largely systematic after the layout is finished. In particular, dense lines "smile" through focus while isolated lines "frown" in typical Bossung plots. this well-defined systematic behavior of focus-dependent CD variation allows us to develop a self-compensating design methodology. In this work, we propose a novel design methodology that allows explicit compensation of focus-dependent CD variation, either within a cell (self-compensated cells) or across cells in a critical path (self-compensated design). By creating iso and dense variants for each library cell, we can achieve designs that are more robust to focus variation. Optimization with a mixture of iso and dense cell variants is possible both for area and leakage power, with the latter providing an interesting complement to existing leakage reduction techniques such as dual-Vth. We implement both heuristic and Mixed-Integer Linear Programming (MILP) solution methods to address this optimization, and experimentally compare their results. Our results indicate that designing with a self-compensated cell library incurs similar to 12% area penalty and similar to 6% leakage increase over original layouts while compensating for focus-dependent CD variation (i.e., the design meets timing constraints across a large range of focus variation). We observe similar to 27% area penalty and similar to 7% leakage increase at the worst-case defocus condition using only single-pitch cells. the area penalty of circuits after using either the heuristic or MILP optimization approach is reduced to similar to 3% while maintaining timing. We also apply our optimizations to leakage, which traditionally shows very large variability due to its exponential relationship with gate CD. We conclude that a mixed iso/dense library combined with a sensitivity-based optimization approach yields much better. area/timing/leakage tradeoffs than using a self-

关键词： ACLV focus leakage manufacturability self-compensating variation systematic

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Machine vision for the quality assessment of emulsions in pharmaceutical processing 4

Machine vision for the quality assessment of emulsions in ph...

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4th International conference on Universal Village (UV) - Humankind in Harmony with Nature through Wise Use of Technology

作者： Unnikrishnan, Saritha Donovan, John Macpherson, Russell Tormey, David Inst Technol Sligo Sch Engn & Design Sligo Ireland Ctr Precis Engn Mat & Mfg Res Sligo Ireland GlaxoSmithKline Ltd Sligo Ireland

ISBN: (纸本)9781538651971

Emulsion quality evaluation using machine vision techniques depends on the efficiency of the image segmentation algorithms. Two different machine vision techniques are investigated to determine their competency in detecting droplets from in-process microscopic images of a cream emulsion. Histogram-based segmentation shows promising potential compared to edge and symmetry detection. A statistical study of the droplet characteristics was conducted. the results demonstrate that the histogram-based approach is more proficient in the progressive analysis of droplet evolution during emulsification. A real-time integration of the technique is proposed, as a soft sensor, to predict the optimum process time and to increase manufacturing efficiency in chemical industries.

关键词： automated image analysis droplet characteristics emulsion machine vision quality evaluation sustainable manufacturing

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