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检索条件"任意字段=Conference on Current Developments in Lens Design and Optical Engineering XIV"

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STABILITY OF THE optical-PROPERTIES OF ABNORMALLY DISPERSIVE LIQUIDS 4

STABILITY OF THE OPTICAL-PROPERTIES OF ABNORMALLY DISPERSIVE...

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conference on current developments in optical design and optical engineering IV

作者： PETROVA, MV PLYUKHIN, AG TOLSTOY, MN ROBB, P SIGLER, RD LEARY, DF VAVILOV STATE OPT INST ST PETERSBURGRUSSIA

ISBN: (纸本)0819415871

Abnormal dispersion is found in a large number of optical liquids. These liquids are quite useful in the design of apochromatic lens systems because they are inexpensive and are readily available compared to the expensive abnormal dispersion glasses and crystals more commonly used. Further, there is no practical upper limit on the size of a liquid optical element. However, because the use of these materials as optical elements is quite new, the long term stability of their optical properties after exposure to various environmental conditions must be determined. In this paper, we report on a series of tests performed to determine the optical stability of several abnormal dispersion liquids. The liquids were subjected to: (1) high intensity ultraviolet radiation, (2) high temperatures, and (3) long term exposure to air. Measurements of both optical transmission and refractive index were performed before and after each exposure. The tests were performed on four abnormal dispersion liquids that have been found to be quite useful in the design of apochromatic lenses. The results indicate that long term exposure to either intense ultraviolet radiation or air, produced only negligible changes in the index of refraction. Changes in optical transmission were observed, but they were largely confined to the ultraviolet spectral region. Prolonged exposure to temperatures of 60 degree(s)C did not produce any measurable change in the optical properties. The measurements were performed at the Vavilov State optical Institute, St. Petersburg, Russia, in collaboration with Lockheed Palo Alto Research Laboratory, Palo Alto, California.

关键词： Liquids Ultraviolet radiation Absorption Glasses lens design optical properties Refractive index Visible radiation Lamps optical components

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Contact lens design to third order to compensate the spherical aberration of the eye from Zernike polynomials 20

Contact lens design to third order to compensate the spheric...

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conference on current developments in lens design and optical engineering XX

作者： Garcia-Lievanos, O. Teran-Bobadilla, Emiliano Hernandez-Flores, Luis A. Sanchez-Gonzalez, Leticia Inst Politecn Nacl Ctr Interdisciplinario Ciencias Salud Unidad Santo Tomas Dept Optometry Av Maestros S-N Mexico City 11340 DF Mexico Univ Autonoma Sinaloa Dept Optometry Culiacan Rosales 80040 Sininaloa Mexico

ISBN: (数字)9781510629028

ISBN: (纸本)9781510629028

To compensate the spherical aberration of the eye using the conic constant of the first surface of a contact lens for different refractive errors. Refractive errors were simulated by modifying only the first curvature of the cornea. For every refractive error was calculating Zernike polynomials using Optics Software for Layout and Optimization (OSLO) EDU edition with and without contact lens. To calculate the conic constant of the contact lens we use the Seidel sums for thin lenses from the longitudinal spherical aberration as it proposes V. Mahajan. The value of Zernike spherical aberration coefficient for the eye with farsightedness (+ 5.00 D) + spherical contact lens was 0.142691 mu m. The conic constant value to compensate the spherical aberration was -0.222995 and the value of Zernike spherical aberration coefficient of the eye + aspherical contact lens was 0.004354 mu m. The value of Zernike spherical aberration coefficient for the eye with myopia (- 5.00 D) + spherical contact lens was 0.144505 mu m. The conic constant value to compensate the spherical aberration was -0.101424 and the value of Zernike spherical aberration coefficient of the eye + aspherical contact lens was 0.072820 mu m. The proposed method allows us to design contact lenses that compensate for the spherical aberration of the eye from the Zernike polynomials. Although the design of contact lenses is to third order, we obtain a smaller spherical aberration than the chromatic aberration on the axis without use optimization routine.

关键词： Contact lens spherical aberration aberration of the eye and Zernike polynomials

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Macro optical system for biological application

Macro optical system for biological application

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conference on current developments in lens design and optical Systems engineering

作者： Kawano, Y Abe, C Abe, K Hayashi, K Hatta, Y Tamura, K Olympus Amer Inc Sci Equipment Grp Melville NY 11747 USA

ISBN: (纸本)0819437387

currently, the requirement of wide field view fluorescence observation is increasing in the biological field, but the existing microscopes have difficulty in imaging lower magnification fluorescence images. It is very easy to image in higher magnification with higher resolution and brightness using existing microscopes, but it is very difficult to image in lower magnification that are also bright. We focused on two applications in which a macro lens would be useful. The first application is DNA array reading. The second application is In Vivo imaging. Both applications require wide observation areas and bright images which are needed to lower magnification and fluorescence capability. The macro lens needs to have high numerical aperture (N..) and low magnification. We also believe if the macro lens can be attached to the existing microscopes, it will be quite useful to various applications because the scientists can then observe fluorescence images from low magnification to high magnification. To fulfill these needs, we designed macro objective lenses. Listed bellows are our macro lens' unique features. 1. Specification for the macro objective lenses are 2X, N. A. 0.14 and 4X, N. A. 0.28. These N. A. is higher than the existing microscope objective lenses of equal magnifications. 2. The 4X and 2X macro lens can be attached to existing microscopes. 3. These macro lenses can be used with the video lens such as 0.5X.

关键词： macro objective lens 4X 2X fluorescence

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optical PCB using waveguide-embedded backplane

Optical PCB using waveguide-embedded backplane

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conference on current developments in lens design and optical engineering V

作者： Yoon, KY Cho, IK Ahn, SH Kim, JT Elect & Telecommun Res Inst Taejon 305350 South Korea

ISBN: (纸本)0819454613

A practical optical printed circuit board (PCB) was demonstrated, using a waveguide-embedded optical backplane and processing boards. The polymeric waveguide was produced by means of a hot embossing technique then embedded following a conventional lamination processes. The core size of waveguide was 100 x 60 mum(2) (input section), 60 X 60 mum(2) (output section), and the propagation loss of tapered polymeric waveguide was approximately 0.1 dB/cm at 850 nm. We prepared a optical backplane with polymeric waveguide by using conventional multilayer board lamination processes. The transmission power and dimension of the optical backplane was same as those of waveguide before lamination. A metal optical bench was used as a packaging die for the optical devices and the integrated circuit chips in both the transmitter and the receiver processing boards. We used a 1 x 4 850 nm VCSEL array with 2 dBm of output power for the transmitter and a PIN photodiode array for the receiver. We successfully demonstrated 8 Gb/s of data transmission between the transmitter processing board and the optical backplane board.

关键词： polymeric waveguide hot embossing technique optical backplane optical printed circuit board waveguide-embedded backplane metal optical bench multilayer board lamination board-to-board interconnection

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optical-SYSTEMS design FOR FOCAL-PLANE TESTING USING DIRECT WRITE SCENE GENERATION 4

OPTICAL-SYSTEMS DESIGN FOR FOCAL-PLANE TESTING USING DIRECT ...

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conference on current developments in optical design and optical engineering IV

作者： DOUB, CA CALSPAN CORP AEDC OPERATARNOLD AFBTN 37389

ISBN: (纸本)0819415871

Infrared Focal Plane Array (FPA) sensors are commonly tested using various means of scene generation. At the Arnold engineering Development Center a Direct Write Scene Generator (DWSG) is being developed. The DWSG projects the scene onto the focal plane array by scanning a rake of beams across the sensor. The rake consists of up to 256 synchronous beams generated by passing a single laser beam through an acousto-optic deflector (AOD). A complex radio frequency signal input into the AOD diffracts the laser beam into multiple beams. Each pixel of the focal plane is illuminated by one of the beams in the rake. The Direct Write Scene Generator is being designed to test a focal plane area as large as a 512 X 512 pixel array. Scan optics focus an expanded laser beam to a spot smaller than the focal plane pixel pitch over the entire test area. Several optical configurations and multiple AODs are needed to achieve the test requirements at various wavelengths. Some important considerations in the optical design are spot size, crosstalk, and background radiation.

关键词： Staring arrays lens design Acousto-optics Distortion Scanners Sensors optical design Beam steering Diagnostics Laser sources

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optical design of an ultrashort throw ratio projector with two freeform mirrors 17

Optical design of an ultrashort throw ratio projector with t...

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conference on current developments in lens design and optical engineering XVII

作者： Nie, Yunfeng Mohedano, Ruben Benitez, Pablo Chaves, Julio Minano, Juan C. Thienpont, Hugo Duerr, Fabian Vrije Univ Brussel Dept Appl Phys & Photon Brussels Photon Team Pleinlaan 2 B-1050 Brussels Belgium Light Prescript Innovators Madrid 28223 Spain Light Prescript Innovators Altadena CA 91001 USA Univ Politecn Madrid CeDint Campus Montegancedo Pozuelo Madrid 28223 Spain

ISBN: (数字)9781510602861

ISBN: (纸本)9781510602854;9781510602861

In this work, an optical design approach is presented to design an ultrashort throw distance projection system by combination of an off-the-shelf refractive lens and two off-axis freeform mirrors. These two freeform mirrors are used to greatly shorten the projection distance by more than three times compared to conventional (rotationally symmetric) systems, while still maintaining a good imaging quality. Firstly, a direct design method that enables the simultaneous calculation of two off-axis freeform-profile mirrors by partially coupling more than three fields is introduced. The specifications of the conventional refractive lens are taken into account during this procedure. The pupil matching principle is applied to ensure good performance between the two sub-systems. The calculated mirrors then serve as a good starting point for optimization using commercial optical design software. To step from freeform profiles to freeform surfaces, the calculated two profiles are fitted into odd polynomials to evaluate the image quality and then re-fitted into XY polynomials for further optimization. Finally, the polynomial coefficients of the two freeform mirrors are imported into the optical design program. The merit function is built from RMS spot radii over the full field, and additional constraints are made for correcting distortion. After optimization, the calculated initial design quickly converges to a well performing imaging system. As an example, an ultrashort throw distance projection lens with a large 80-inch diagonal image at 400mm throw distance is designed, analyzed and compared with literature data. The values of MTF are over 0.6 at 0.5 lp/mm and the distortion is less than 1.5%: showing a very good and well balanced imaging performance over the entire field of view.

关键词： geometric optics ultrashort throw ratio projector optical design aspheric mirrors freeform optics

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Fast robust non-sequential optical ray-tracing with implicit algebraic surfaces 16

Fast robust non-sequential optical ray-tracing with implicit...

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conference on current developments in lens design and optical engineering XVI

作者： Greynolds, Alan W. 10741 E Placita Metate Tucson AZ 85749 USA

ISBN: (纸本)9781628417449

The fastest, most robust, general technique for non-sequentially ray-tracing a large class of imaging and non-imaging optical systems is by geometric modeling with algebraic (i.e. polynomial) implicit surfaces. The basic theory of these surfaces with special attention to optimizing their precise intersection with a ray (even at grazing incidence) is outlined for an admittedly limited software implementation. On a couple of "tame" examples, a 64-bit Windows 7 version is significantly faster than the fastest commercial design software (all multi-threaded). Non-sequential ray-surface interactions approaching 30M/sec are achieved on a 12-core 2.67 GHz Mac Pro desktop computer. For a more exotic example of a 6th degree Wood's horn beam dump (light trap), a 32-bit Windows single thread version traces rays nearly 4 times faster than the commercial ASAP software's implicit algebraic surface and over 13 times faster than its equivalent NURBS surface. However, implicit surfaces are foreign to most CAD systems and thus unfortunately, don't easily fit into a modern workflow.

关键词： Ray tracing software surface modeling

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design considerations for an unconventional infrared prism with a 90 degree ray deviation 16

Design considerations for an unconventional infrared prism w...

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conference on current developments in lens design and optical engineering XVI

作者： Akarca, Beyza Artan, Goktug Gencehan TUBITAK SAGE Ankara Turkey

ISBN: (纸本)9781628417449

In this study, the optical performance of a 90 degree prism working in the mid-wave infrared region with the purpose of carrying a beam of light from one optical system to another in an unconventional way is discussed. First, a group of mirrors is considered as a design alternative to lower the overall cost of the system. However, using mirrors greatly increases the diameter of the beam due to the rays coming from wide field of view angles. Another drawback of mirrors is that having separate mirrors requires precise alignment for the system to work at full performance which is difficult for the given application. However, these alignment issues are not valid for a single piece prism. Therefore, a single piece prism is the preferred option and has been taken into account in this study. Material selection is important, especially in the mid-wave infrared region where the index of refraction differs greatly from material to material. Silicon and Germanium are the materials preferred because of their high index of refraction and transmission characteristics. Aside from optical properties, these materials are also considered in terms of manufacturability. Also, options for the coatings to be applied to reflecting surfaces of the prism are discussed with regard to the transmission loss within the system. In order to have total internal reflection within a prism, coatings must be chosen carefully to handle transmission loss at the reflecting surfaces. All of the system parameters are examined using sequential and non-sequential modes of ZEMAX OpticStudio software.

关键词： 90 degree prism infrared prism optical design infrared prism

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Novel technique for measurement of centration errors of complex, completely mounted multi--element objective lenses

Novel technique for measurement of centration errors of comp...

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conference on current developments in lens design and optical engineering VII

作者： Heinisch, J. Dumitrescu, E. Krey, S. Triopt GmbH Hafenstr 39 D-22880 Wedel Germany

ISBN: (纸本)0819463671

The size and the focal length of camera objectives (e.g. cell phones or digital cameras) are becoming smaller and smaller. At the same time the quality requirements are increasing. Besides surface accuracy, the imaging quality of the complete optics is mainly influenced by the alignment errors of the single elements. TRIOPTICS has developed a new technology called Multilens((R)) in order to measure the centering errors of all single surfaces within an objective lens with up to 40 surfaces or more. We achieve accuracies in the range of an arc second. During the measurement the deviation of each center or curvature with respect to a reference axis is measured. These data are further processed in order to provide the shift and tilt of an individual lens or group of lenses in respect to a given reference axis (Patent pending Ref. 1). Applications mainly include the measurement of cell phone and digital camera lenses. However, any type of objective lens from endoscope up to very complex objective lenses used in microlithography can be measured with highest accuracy. The method has been extended to measure also the aspherical axis of lenses.

关键词： centering centration lens optical surface objective aspherical axis digital camera cell phone camera tilt shift

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Avoiding unstable regions in the design space of EUV mirror systems comprising high-order aspheric surfaces

Avoiding unstable regions in the design space of EUV mirror ...

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conference on current developments in lens design and optical engineering V

作者： Marinescu, O Bociort, F Braat, J Delft Univ Technol Opt Res Grp NL-2628 CJ Delft Netherlands

ISBN: (纸本)0819454613

When Extreme Ultraviolet mirror systems having several high-order aspheric surfaces are optimized, the configurations often enter into highly unstable regions of the parameter space. Small changes of system parameters lead then to large changes in ray paths, and therefore optimization algorithms crash because certain assumptions upon which they are based become invalid. We describe a technique that keeps the configuration away from the unstable regions. The central component of our technique is a finite-aberration quantity, the so-called quasi-invariant, which has been originally introduced by H. A. Buchdahl. The quasi-invariant is computed for several rays in the system, and its average change per surface is determined for all surfaces. Small values of these average changes indicate stability. The stabilization technique consists of two steps: First, we obtain a stable initial configuration for subsequent optimization by choosing the system parameters such that the quasi-invariant change per surface is minimal. Then, if the average changes per surfaces of the quasi-invariant remain small during optimization, the configuration is kept in the safe region of the parameter space. This technique is applicable for arbitrary rotationally symmetric optical systems. Examples from the design of aspheric mirror systems for EUV lithography will be given.

关键词： mirror systems aspheres EUV lithography optimization relaxation

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