检索结果-内蒙古大学图书馆

您好，读者！请登录

内蒙古大学图书馆

首页
概况
党建
资源
服务
科研支持
- 论文收录引用证明
- 科技查新
知识产权
档案馆
帮助

咨询与建议

建议与咨询留下您的常用邮箱和电话号码，以便我们向您反馈解决方案和替代方法

您的常用邮箱：*

您的手机号码：*

问题描述：

当前已输入0个字，您还可以输入200个字

全部搜索
期刊论文
图书
学位论文
标准
纸本馆藏
外文资源发现
数据库导航
超星发现

高级检索

时间限定

出版年份：

文献类型

图书期刊文献学位论文多媒体

馆藏选择

电子馆藏纸本馆藏

核心期刊

全部期刊 SCI 收录期刊 SSCI 收录期刊 EI 收录期刊 CSCD 收录期刊 CSSCI 收录期刊

语言

中文英文

文献类型

期刊文献图书学位论文标准纸本馆藏

帮助

文字说明：

T=题名（书名、题名），A=作者（责任者），K=主题词，P=出版物名称，PU=出版社名称，O=机构（作者单位、学位授予单位、专利申请人），L=中图分类号，C=学科分类号，U=全部字段，Y=年（出版发行年、学位年度、标准发布年）

检索规则说明：

AND代表“并且”；OR代表“或者”；NOT代表“不包含”；(注意必须大写,运算符两边需空一格)

检索范例：

范例一：(K=图书馆学 OR K=情报学) AND A=范并思 AND Y=1982-2016
范例二：P=计算机应用与软件 AND (U=C++ OR U=Basic) NOT K=Visual AND Y=2011-2016

分类表

所选分类

>> <<

限定检索结果

文献类型

307 篇 会议
3 篇 期刊文献

馆藏范围

310 篇 电子文献
0 种 纸本馆藏

日期分布

学科分类号

255 篇 工学
- 140 篇 电气工程
- 124 篇 机械工程
- 49 篇 材料科学与工程（可...
- 27 篇 计算机科学与技术...
- 14 篇 软件工程
- 12 篇 电子科学与技术（可...
- 10 篇 控制科学与工程
- 5 篇 力学（可授工学、理...
- 5 篇 信息与通信工程
- 4 篇 化学工程与技术
- 3 篇 土木工程
- 3 篇 轻工技术与工程
- 2 篇 冶金工程
- 2 篇 航空宇航科学与技...
- 2 篇 生物医学工程（可授...
- 1 篇 光学工程
190 篇 理学
- 179 篇 物理学
- 8 篇 数学
- 4 篇 化学
- 3 篇 统计学（可授理学、...
- 2 篇 生物学
- 1 篇 天文学
- 1 篇 系统科学
22 篇 管理学
- 22 篇 管理科学与工程(可...
- 6 篇 工商管理
8 篇 教育学
- 8 篇 教育学
- 1 篇 心理学(可授教育学...
2 篇 医学
- 2 篇 临床医学
1 篇 经济学
- 1 篇 应用经济学
1 篇 法学
- 1 篇 社会学

主题

53 篇 dfm
50 篇 lithography
37 篇 opc
32 篇 design for manuf...
30 篇 manufacturing
27 篇 optical proximit...
25 篇 design for manuf...
19 篇 transistors
19 篇 silicon
17 篇 double patternin...
16 篇 photomasks
15 篇 design for manuf...
13 篇 process window
12 篇 design rule
11 篇 simulation
11 篇 hotspot
11 篇 data modeling
10 篇 yield
10 篇 ret
9 篇 double patternin...

机构

16 篇 cadence design s...
12 篇 mentor graph cor...
5 篇 synopsys inc aus...
5 篇 globalfoundries ...
4 篇 samsung elect co...
4 篇 carnegie mellon ...
4 篇 univ calif berke...
3 篇 ibm corp fishkil...
3 篇 appl mat inc san...
3 篇 mentor graph cor...
3 篇 mentor graphics ...
3 篇 natl univ singap...
3 篇 synopsys inc 700...
3 篇 clear shape tech...
3 篇 univ calif berke...
3 篇 toshiba co ltd s...
3 篇 zhejiang univ in...
3 篇 freescale semico...
3 篇 chartered semico...
3 篇 globalfoundries ...

作者

20 篇 hurat philippe
12 篇 capodieci luigi
10 篇 liebmann lars
8 篇 lucas kevin
8 篇 pileggi larry
8 篇 verghese nishath
6 篇 jhaveri tejas
5 篇 maeda shimon
5 篇 kye jongwook
5 篇 kim kee sup
5 篇 spanos costas j.
5 篇 kyoh suigen
5 篇 pan david z.
5 篇 inoue soichi
5 篇 ha naya
4 篇 strojwas andrzej
4 篇 mansfield scott
4 篇 neureuther andre...
4 篇 chao kai-yuan
4 篇 torres j. andres

语言

308 篇 英文
2 篇 其他

检索条件"任意字段=Conference on Design for Manufacturability through Design-Process Integration IV"

共 310 条记录，以下是41-50 订阅

全选清除本页清除全部题录导出标记到"检索档案"

详细简洁

排序：

Data Acquisition and Quality Assurance integration Platform Based on DPM

Data Acquisition and Quality Assurance Integration Platform ...

引用

4th International conference on Frontiers of Manufacturing and design Science (ICFMD 2013)

作者： Wang, Jian He, Weiping He, Yanli Li, Xiashuang Guo, Gaifang Northwestern Polytech Univ Key Lab Contemporary Design & Integrated Mfg Tech Minist Educ Xian 710072 Peoples R China

ISBN: (纸本)9783037859926

Direct Part Marking (DPM) is used for part identification and tracking. In order to avoid discrete information caused by quality data incompleteness or disorder in each stage of a product life cycle, especially for a large and complex product information, DPM is an effective method to ensure the security and traceability of the process quality status. Here describes a platform based on DPM data acquisition and quality assurance integration. The platform consists of data acquisition module and basic business functions;It builds semantic resource flexible service configuration framework, analyzes the discrete manufacturing resources meta-model relationship, defines semantic restful resource meta-model and uses the multi-view, multi-level, scalable manufacturing resource library. All of these are integrated in this platform. through an experience of an enterprise, it is proved that the platform is feasible and configurable.

关键词： Direct Part Marking 2-D Barcode Data Acquisition Quality Assurance integration Platform

来源：评论

学校读者我要写书评

暂无评论

Development of a model for evaluating the NPD process in SMEs: A Latin American experience 24

Development of a model for evaluating the NPD process in SME...

引用

24th CIRP design conference 2014: Mass Customization and Personalization

作者： Hernandez, María Cristina Montoya, Marcela Velásquez Martínez, Jose F. Design Engineering Research Group Universidad EAFIT Medellín Colombia

This article presents the findings resulting from a research project carried out in Medellin, Colombia, that was aimed at developing a model of diagnosis for the NPD process in manufacturing SMEs, adapted to the Latin American context. Four aspects were considered to develop the model: (i) Rational logic for problem solving based on the paradigm that a problem can be solved through systematic application of general principles and standardized knowledge, (ii) The Grounded Theory research approach, (iii) integration of learning processes based on reflective and, (iv) Kolb's learning cycle as basic premises for the generation of a prescriptive model considering that the diagnosis process involves a learning process. Results obtained from the four companies selected for the study helped to validate an initial version. The model has proven to have great potential to improve the NPD process, as well as an opportunity to develop future comparative studies. Findings in the discussion and further reflection generated by the application of the four tools that encompasses the model within the companies, proved to be appropriated as a reflective practice and also a continuing learning process for SMEs. © 2014 Published by Elsevier B.V.

关键词： Product development

来源：评论

学校读者我要写书评

暂无评论

design for manufacturability: a fabless perspective

Design for manufacturability: a fabless perspective

引用

conference on design for manufacturability through design-process integration VII

作者： Cain, Jason P. Adv Micro Devices Inc Austin TX 78739 USA

design for manufacturability (DFM) has become a key enabler of integrated circuit (IC) production over the past decade. In this paper a comprehensive DFM program for IC designs at the 28nm node and beyond is described... 详细信息

ISBN: (纸本)9780819494665

关键词： integrated circuit (IC) design for manufacturability (DFM) lithography

来源：评论

学校读者我要写书评

暂无评论

Rethinking ASIC design with Next Generation Lithography and process integration

Rethinking ASIC Design with Next Generation Lithography and ...

引用

conference on design for manufacturability through design-process integration VII

作者： Vaidyanathan, Kaushik Liu, Renzhi Liebmann, Lars Lai, Kafai Strojwas, Andrzej Pileggi, Larry Carnegie Mellon Univ Pittsburgh PA 15213 USA

ISBN: (纸本)9780819494665

Given the deployment delays for EUV, several next generation lithography (NGL) options are being actively researched. Several cost-effective NGL solutions, such as self-aligned double patterning through sidewall image transfer (SIT) and directed self-assembly (DSA), in conjunction with process integration challenges, mandate grating-like pattern design. As part of the GRATEdd project, we have evaluated the design cost of grating-based design for ASICs (application specific ICs). Based on our observations we have engineered fundamental changes to the primary ASIC design components to make scaling affordable and useful in deeply scaled sub-20 nm technologies: unidirectional-M1 based standard cells, application-specific smart SRAM synthesis, and statistical and self-healing analog design.

关键词： Standard Cell Library Application-specific SRAM synthesis design for manufacturability design Technology Co-Optimization 14 nm Grating-based design Self-healing design Statistical element selection

来源：评论

学校读者我要写书评

暂无评论

self-aligned Double Patterning Friendly Configuration for Standard Cell Library Considering Placement Impact

self-aligned Double Patterning Friendly Configuration for St...

引用

conference on design for manufacturability through design-process integration VII

作者： Gao, Jhih-Rong Yu, Bei Huang, Ru Pan, David Z. Univ Texas Austin ECE Dept Austin TX 78712 USA

ISBN: (纸本)9780819494665

self-aligned double patterning (SADP) has become a promising technique to push pattern resolution limit to sub-22nm technology node. Although SADP provides good overlay controllability, it encounters many challenges in physical design stages to obtain conflict-free layout decomposition. In this paper, we study the impact on placement by different standard cell layout decomposition strategies. We propose a SADP friendly standard cell configuration which provides pre-coloring results for standard cells. These configurations are brought into the placement stage to help ensure layout decomposability and save the extra effort for solving conflicts in later stages.

关键词： Double patterning technology Manufacturing Photomasks Standards development Computer aided design Antimony design for manufacturability Lithography Overlay metrology process control

来源：评论

学校读者我要写书评

暂无评论

Self-aligned Double Patterning Compliant Routing with In-design Physical Verification Flow

Self-aligned Double Patterning Compliant Routing with In-Des...

引用

conference on design for manufacturability through design-process integration VII

作者： Gao, Jhih-Rong Jawandha, Harshdeep Atkar, Prasad Walimbe, Atul Baidya, Bikram Rizzo, Olivier Pan, David Z. Univ Texas Austin ECE Dept Austin TX 78712 USA

ISBN: (纸本)9780819494665

Among double patterning techniques, Self-aligned double patterning (SADP) has the advantage of good mask overlay control, which has made SADP a popular double patterning method for sub-32nm technology nodes. However, SADP process places several limitations on design flexibility. This work exploits an alternative post routing approach that has the flexibility to resolve lithography violations without the overhead of repeated rule checking. In addition, it allows for successive refinement in the definition of lithographic violations as the process node matures, and implementation of fixes as localized ECO (Engineering Change Order) operations without needing to reroute the complete design.

关键词： Lithography Double patterning technology Photomasks Manufacturing Overlay metrology 193nm lithography Metals design for manufacturability design for manufacturing Detection and tracking algorithms

来源：评论

学校读者我要写书评

暂无评论

process Characteristics and Layout Decomposition of Self-aligned Sextuple Patterning

Process Characteristics and Layout Decomposition of Self-ali...

引用

conference on design for manufacturability through design-process integration VII

作者： Kang, Weiling Chen, Yijian Peking Univ Sch Elect & Comp Engn Shenzhen Grad Sch Shenzhen 518055 Guangdong Peoples R China

ISBN: (纸本)9780819494665

Self-aligned sextuple patterning (SASP) is a promising technique to scale down the half pitch of IC features to sub-10nm region. In this paper, the process characteristics and decomposition methods of both positive-tone (pSASP) and negative-tone SASP (nSASP) techniques are discussed, and a variety of decomposition rules are studied. By using a node-grouping method, nSASP layout conflicting graph can be significantly simplified. Graph searching and coloring algorithm is developed for feature/color assignment. We demonstrate that by generating assisting mandrels, nSASP layout decomposition can be degenerated into an nSADP decomposition problem. The proposed decomposition algorithm is successfully verified with several commonly used 2-D layout examples.

关键词： Self-aligned sextuple patterning (SASP) conflicting graph assisting mandrels layout decomposition

来源：评论

学校读者我要写书评

暂无评论

A novel methodology for building robust design rules by using design Based Metrology (DBM)

A novel methodology for building robust design rules by usin...

引用

conference on design for manufacturability through design-process integration VII

作者： Lee, Myeongdong Choi, Seiryung Choi, Jinwoo Kim, Jeahyun Sung, Hyunju Yeo, Hyunyoung Shim, Myoungseob Jin, Gyoyoung Chung, Eunseung Roh, Yonghan Sungkyunkwan Univ Sch Informat & Commun Engn Suwon 440746 South Korea

ISBN: (纸本)9780819494665

This paper addresses a methodology for building robust design rules by using design based metrology (DBM). Conventional method for building design rules has been using a simulation tool and a simple pattern spider mask. At the early stage of the device, the estimation of simulation tool is poor. And the evaluation of the simple pattern spider mask is rather subjective because it depends on the experiential judgment of an engineer. In this work, we designed a huge number of pattern situations including various 1D and 2D design structures. In order to overcome the difficulties of inspecting many types of patterns, we introduced design Based Metrology (DBM) of Nano Geometry Research, Inc. And those mass patterns could be inspected at a fast speed with DBM. We also carried out quantitative analysis on PWQ silicon data to estimate process variability. Our methodology demonstrates high speed and accuracy for building design rules. All of test patterns were inspected within a few hours. Mass silicon data were handled with not personal decision but statistical processing. From the results, robust design rules are successfully verified and extracted. Finally we found out that our methodology is appropriate for building robust design rules.

关键词： design rule design for manufacturability DFM design based metrology DBM

来源：评论

学校读者我要写书评

暂无评论

Pattern matching for identifying and resolving non-decomposition-friendly designs for Double Patterning Technology (DPT)

Pattern matching for identifying and resolving non-decomposi...

引用

conference on design for manufacturability through design-process integration VII

作者： Wang, Lynn T. -N. Dai, Vito Capodieci, Luigi GLOBALFOUNDRIES Milpitas CA 95035 USA

ISBN: (纸本)9780819494665

A pattern matching methodology that identifies non-decomposition-friendly designs and provides localized guidance for layout-fixing is presented for double patterning lithography. This methodology uses a library of patterns in which each pattern has been pre-characterized as impossible-to-decompose and annotated with a design rule for guiding the layout fixes. A pattern matching engine identifies these problematic patterns in design, which allows the layout designers to anticipate and prevent decomposition errors, prior to layout decomposition. The methodology has been demonstrated on a 180 um(2) layout migrated from the previous 28nm technology node for the metal 1 layer. Using a small library of just 18 patterns, the pattern matching engine identified 119 out of 400 decomposition errors, which constituted coverage of 29.8%.

关键词： Pattern matching odd-cycles coloring conflicts double patterning decomposition design flow design rule DRC Plus automated decomposition algorithm DPT

来源：评论

学校读者我要写书评

暂无评论

Model Based Hint for Litho Hotspot Fixing beyond 20nm node

Model Based Hint for Litho Hotspot Fixing beyond 20nm node

引用

conference on design for manufacturability through design-process integration VII

作者： Kang, Jae-hyun Kim, Byung-Moo Ha, Naya Choi, Hung Bok Kim, Kee Sup Mohamed, Sarah Madkour, Kareem ElManhawy, Wael Lee, Evan Brunet, Jean-Marie Kwan, Joe SAMSUNG Elect Co Ltd Yongin Gyeonggi Do 446711 South Korea

ISBN: (纸本)9780819494665

As technology nodes scale beyond 20nm node, design complexity increases and printability issues become more critical and hard for RET techniques to fix. It is now mandatory for designers to run lithography checks prior to tape out and acceptance by the foundry. As lithography compliance became a sign-off criterion, lithography hotspots are increasingly treated like DRC violations. In the case of lithography hotspot, layout edges that should be moved to fix the hotspot are not necessarily the edges directly touching it. As a result of that, providing the designer with a suggested layout movements to fix the lithography hotspot is becoming a necessity. Software solutions generating hints should be accurate and fast. In this paper we are presenting a methodology for providing hints to the designers to fix Litho-hotspots in the 20nm and beyond.

关键词： design for manufacturing lithography hotspots litho hotspot repair hint double patterning

来源：评论

学校读者我要写书评

暂无评论

没有更多数据了...

全选清除本页清除全部题录导出标记到“检索档案”

共31页 << < 1 2 3 4 5 6 7 8 9 10 > >>

检索报告对象比较合并检索0

隐藏清空

合并搜索

回到顶部

执行限定条件

内容：

评分：

请选择保存的检索档案：

请选择收藏分类：

订阅名称：

通借通还

温馨提示：

图书名称：

借书校区：

取书校区：

手机号码：

邮箱地址：

一卡通帐号：

电话和邮箱必须正确填写，我们会与您联系确认。

联系人：

所在院系：

联系邮箱：

联系电话：

内蒙古自治区呼和浩特市赛罕区大学西街235号邮编: 010021

建议与咨询 留下您的常用邮箱和电话号码，以便我们向您反馈解决方案和替代方法

时间限定

文献类型

馆藏选择

核心期刊

语言

文献类型

帮助

文字说明：

检索规则说明：

检索范例：

分类表

所选分类

限定检索结果

文献类型

馆藏范围

日期分布

学科分类号

主题

机构

作者

语言

请选择保存的检索档案： 新增检索档案 确定 取消

请选择收藏分类： 新增自定义分类 确定 取消

通借通还

建议与咨询留下您的常用邮箱和电话号码，以便我们向您反馈解决方案和替代方法

请选择保存的检索档案：

请选择收藏分类：