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Conference on optical Microlithography XX

作者： Tyminski, Jacek. K. Matsuyama, Tomoyuki Nakashima, Tashiharu Schmoeller, Thomas Lewellen, John Nikon Precis Inc 1399 Shoreway Rd Belmont CA 94002 USA Synopsys Inc D-81737 Munich Germany Nikon Inc Kumagaya Saitama 3608559 Japan Synopsys Inc Mountain View CA 94043 USA

ISBN: (纸本)9780819466396

To meet the imaging resolution requirements, driven by the evolution of IC design rules, leading-edge scanners incorporate projection lenses with hyper-NAs. Moreover, immersion scanners are being introduced into IC manufacture. Both dry and immersion tools explore the lens design regimes of unprecedented complexity. The need to predict, to analyze and to control the IC pattern CDs is met by various photolithography simulators. The continuing demand for simulation accuracy is reflected by the requirement to quantify the scanner projection lens fingerprints, i.e. projection lens infinitesimal excursions from the ideal performance. The scanner engineering community has been relying on photolithography simulators to analyze the impact of the projection lens fingerprints on the imaging characteristics. However small, these excursions are always present in the projection tools and they control important imaging characteristics such as overlay, CD uniformity, across-field exposure latitude, to name but a few. Customarily, phase front aberrations and lens pupil apodization signatures have been used to predict the scanners imaging responses. Of course, the need to design, to manufacture and to deploy scanners of ever improving quality resulted in dramatic reductions of these non-ideal imaging excursions. The evolution of IC designs and imaging tools complexity escalate the requirements for imaging simulation accuracy. Simultaneously, predicting scanner imaging response has become a key mission in the Deign For Manufacture arena. In view of these developments, it necessary to pose a question if the conventional equipment engineering and imaging simulation methodologies predict scanner imaging responses with the accuracy required by the IC design rules. Differently put, the question is: what is necessary to provide simulation accuracy required by the current IC design rules? This report attempts to address these questions.

关键词： projection lens model vectorization wavefront aberrations optical proximity effects

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Proceedings of SPIE - current developments in lens design and optical engineering VII

Proceedings of SPIE - Current Developments in Lens Design an...

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current developments in lens design and optical engineering VII

ISBN: (纸本)0819463671

The proceedings contain 34 papers. The topics discussed include: fundamental and specific steps in Shack-Hartmann wavefront sensor design;a hardware-based simulation platform for optical design and engineering;low profile optic for mobile camera using dual freedom reflective lenses;end-to-end compensation of digital-optical imaging system;optical design for the adaptive secondary setup and instrument stimulator (ASSIST);actual field curvature and isoquals;self-weight distortion of lens elements;influence of striae on the homogeneity of the linear thermal expansion coefficient of ZERODUR;sedimentations on high precision surfaces of advanced materials by magnetorheological finishing;automatic birefringence characterization of single-mode erbium-doped fibers within the amplification band;stabilization of the line of sight of a cryogenic optical system;and design of a thermal imaging diagnostic using 90-degree off-axis parabolic mirrors.

关键词： optical design

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Stabilization of the line of sight of a cryogenic optical system

Stabilization of the line of sight of a cryogenic optical sy...

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Conference on current developments in lens design and optical engineering VII

作者： Ren, Qifeng Shen, Mangzuo Tan, Shuliang Liao, Sheng Chinese Acad Sci Inst Opt & Elect 4-9 Renminnan Rd Chengdu 610041 Peoples R China

ISBN: (纸本)0819463671

Cryogenic optical systems are often mounted in vacuum cryostat. An interesting concern in the mechanical design is how to maintain the stability of the line of sight (LOS) of the cryogenic optical system when it is cooled down to very low temperature. To investigate this problem an experimental cryogenic optical system, its mounting structure, and a cryostat were designed and fabricated. After assembling them together, a test experiment for measuring the LOS drift was carried out. Finally, the test results will be presented in this paper.

关键词： cryogenic optical system line of sight optomechanical design optical test

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End-to-end compensation of digital-optical imaging systems

End-to-end compensation of digital-optical imaging systems

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Conference on current developments in lens design and optical engineering VII

作者： Robinson, M. Dirk Stork, David G. Ricoh Innovat 2882 Sand Hill RdSuite 115 Menlo Pk CA 94025 USA

ISBN: (纸本)0819463671

Reliable fabrication and assembly of high-quality electro-optical imaging systems is a critical challenge facing electro-optical imaging system manufacturers. optical compensation is one standard approach for minimizing the effects of errors introduced during the manufacture and construction of the optical subsystems. We describe how digital image processing should be considered as a form of compensation when evaluating a complete imaging system. We describe a novel method for digital-optical compensation which jointly adjusts both optical parameters and image processing parameters to maximize end-to-end imaging performance. We verify the superiority of this joint compensation strategy over the traditional sequential compensation through several example imaging systems.

关键词： digital imaging optical design image processing lens testing compensation

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An easy way to relate optical element motion to system pointing stability - art. no. 62880I

An easy way to relate optical element motion to system point...

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Conference on current developments in lens design and optical engineering VII

作者： Burge, J. H. Univ Arizona Coll Opt Sci Tucson AZ 85721 USA

ISBN: (纸本)0819463671

The optomechanical engineering for mounting lenses and mirrors in imaging systems is frequently driven by the pointing or jitter requirements for the system. A simple set of rules was developed that allow the engineer to quickly determine the coupling between motion of an optical element and a change in the system line of sight. Examples are shown for cases of lenses, mirrors, and optical subsystems. The derivation of the stationary point for rotation is also provided. Small rotation of the system about this point does not cause image motion.

关键词： optical alignment optomechanics pointing stability geometrical optics

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Analysis and design of an adaptive lens

Analysis and design of an adaptive lens

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Conference on current developments in lens design and optical engineering VII

作者： Santiago-Alvarado, A. Vazquez-Montiel, S. Gonzalez-Garcia, J. Garcia-Luna, V. M. Fernandez-Morena, A. Vera-Diaz, E. UTM Inst Fis & Matemat Huajuapan Leon Oaxaca 6900 Mexico INAOE Inst Opt Puebla Mexico

ISBN: (纸本)0819463671

This study presents the design and analysis of a lens with a variable focal length, which we will call an adaptive lens. This lens is formed of two transparent elastic surfaces with a transparent liquid medium between them. The mechanical design of the lens considers the variation of liquid pressure between the surfaces. This causes changes in curvature radii and in the axial thickness, generating variations in the focal length of the lens. An analysis is given of changes in lens power with respect to changes in pressure. Finally, a model of the human eye is presented using this adaptive lens as crystalline.

关键词： adaptive elastic surfaces liquid lens model human eyes

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Balancing detector effects with aberrations in the design of wide-field grazing incidence x-ray telescopes

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optical engineering 2006年第6期45卷 063003-1-063003页

作者： Harvey, James E. Atanassova, Martina Krywonos, Andrey Univ Cent Florida CREOL Orlando FL 32826 USA

Most imaging systems today include a mosaic detector array in the focal plane. optical designers of astronomical telescopes typically produce a design that yields a superb on-axis aerial image in the focal plane, and detector effects are included only in the analysis of the final system performance. Aplanatic optical designs (corrected for spherical aberration and coma) are widely considered to be superior to nonaplanatic designs. However, there is little merit in an aplanatic design for wide-field applications because one needs to optimize some field-weighted-average measure of resolution over the desired operational field of view (OFOV). Furthermore, when used with a mosaic detector array in the focal plane, detector effects eliminate the advantage of the aplanatic design even at small field angles. For wide fields of view, the focal plane is frequently despaced to balance field curvature with defocus thus obtaining better overall performance. We will demonstrate that including detector effects in the optical design process results in a different optimal (nonaplanatic) design for each OFOV that is even superior to an optimally despaced aplanatic design. (c) 2006 Society of Photo-optical Instrumentation Engineers.

关键词： detector effects wide-field imaging systems grazing incidence x-ray telescopes

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A hardware-based simulation platform for optical design and engineering

A hardware-based simulation platform for optical design and ...

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Conference on current developments in lens design and optical engineering VII

作者： Ortiz, Fernando E. Durbano, James P. Sharkawy, Ahmed S. Shi, Shouyuan Curt, Petersen F. EM Photon 51 E Main StSuite 203 Newark DE 19711 USA

ISBN: (纸本)0819463671

optical lenses and systems have historically been of interest to the design and simulation community due to their extensive use in a variety of applications, including telecommunications and imaging. To simulate these systems, it is often possible to take advantage of symmetry or apply physical approximations, such as ray tracing and/or beam propagation, in order to avoid a rigorous solution of Maxwell's equations. However, in cases where these techniques are not applicable, such as when feature sizes become comparable to the wavelength of interest, full-wave electromagnetic simulations are required. Unfortunately, the time constraints and simulation sizes associated with many designs render this analysis infeasible or impractical, a problem that is aggravated by iterative design flows. Hence, a numerical platform capable of handling such computationally intense problems is necessary. In this paper, we present a hardware-based, full-wave simulation platform and demonstrate the advantages of hardware acceleration for the simulation of optical applications. Specifically, we will present a diffractive optical element (DOE) lens simulation, comparing results with previously published analytic and experimental data. We then modify the basic lens arrangement to produce an optical beam splitter. Because such a device cannot be analytically described using symmetry, this example will demonstrate the unique advantages of powerful hardware solvers for the analysis of DOE applications. Finally, we discuss how hardware-based solvers are critical for iterative designs by means of a 1-to-3 beam splitter example. This simulation system represents a new era in optical engineering, enabling the design of next-generation devices today.

关键词： optics lens DOE splitter design hardware simulation FDTD FPGA acceleration

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Plane development of lateral surfaces for inspection systems

Plane development of lateral surfaces for inspection systems

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Conference on current developments in lens design and optical engineering VII

作者： Francini, F. Fontani, D. Jafrancesco, D. Mercatelli, L. Sansoni, P. Ist Nazl Ott Appl L Go E Fermi 6 I-50125 Florence Italy

ISBN: (纸本)0819463671

The problem of developing the lateral surfaces of a 3D object can arise in item inspection using automated imaging systems. In an industrial environment, these control systems typically work at high rate and they have to assure a reliable inspection of the single item. For compactness requirements it is not convenient to utilise three or four CCD cameras to control all the lateral surfaces of an object. Moreover it is impossible to mount optical components near the object if it is placed on a conveyor belt. The paper presents a system that integrates on a single CCD picture the images of both the frontal surface and the lateral surface of an object. It consists of a freeform, lens mounted in front of a CCD camera with a commercial lens. The aim is to have a good magnification of the lateral surface, maintaining a low aberration level for exploiting the pictures in an image processing software. The freeform lens, made in plastics, redirects the light coming from the object to the camera lens. The final result is to obtain on the CCD: - the frontal and lateral surface images, with a selected magnification (even with two different values for the two images);- a gap between these two images, so an automatic method to analyse the images can be easily applied. A simple method to design the freeform lens is illustrated. The procedure also allows to obtain the imaging system modifying a current inspection system reducing the cost.

关键词： optical design freeform optics industrial control optical component

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Fundamental and specific steps in Shack-Hartmann wavefront sensor design

Fundamental and specific steps in Shack-Hartmann wavefront s...

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Conference on current developments in lens design and optical engineering VII

作者： Curatu, Costin Curatu, George Rolland, Jannick Univ Cent Florida CREOL FPCE Coll Opt & Photon Orlando FL 32816 USA

ISBN: (纸本)0819463671

Shack-Hartmann sensors are widely used to measure wavefront aberrations. We present the fundamental and specific engineering steps in the design of Shack-Hartmann wavefront sensors. Typical performance requirements such as sensor dynamic range, sensitivity and accuracy are defined and discussed. We investigate the trade-offs between these performance metrics and the factors affecting the trade-offs. A first order approach for selecting the optimal parameters of the sensor central piece, the lenslet array, is presented. We also propose a quick tolerance analysis method that can predict the wavefront measurement error due to misalignments, using only the ray-tracing software.

关键词： wavefront sensing Shack-Hartmann sensor tolerance analysis

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