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Conference on current developments in lens design and optical engineering XI - and Advances in Thin Film Coatings vI

作者： Filatov, Yuriy D. Filatov, Olexandr Yu Monteil, Guy Heisel, Uwe Storchak, Michael Natl Acad Sci Ukraine Bakul Inst Superhard Mat 2 Avtozavodskaya UA-04074 Kiev Ukraine Natick Res Dev & Engn Ctr F-25000 Besancon France Univ Stuttgart D-70174 Stuttgart Germany

ISBN: (纸本)9780819482822

Problems of improving efficiency and quality of diamond-abrasive finishing of optical materials by tools with bounded polishing powders, including diamond powder, by means of the improvement of the machining technology and application of new tools with functionally oriented designs and characteristics of working layer are considered. A model has been proposed of the slime particle formation and directional removal as well as of the generation of a high-quality surface in diamond-abrasive finishing of optical materials taking into account the peculiarities of the mass transfer in the contact zone and statistic character of the distribution of slime particles by size. The dependences of the particle number on the diffusion angle and coordinate of the contact have been derived in the studies of the dynamics of collision and diffusion of slime particles. The coordinate dependence of the flat surface roughness of glass K8 optics in fine diamond grinding has been described. Interaction and dispersion of deterioration particles in a contact zone of the tool and a processed sample in the course of polishing is described and the dispersion structure of deterioration particles of the tool on slime particles and on deterioration particles is explained oscillatory. It is shown, that differential dispersion section of deterioration particles on slime particles no less than on deterioration particles as much as possible at corners of dispersion close to 0 and 180o on the central sites of a contact zone. Coordinate dependence of full dispersion section of deterioration particles of the tool and dependence of microprofile height of the processed surface on circular zones radius are calculated. Conformity of experimental and theoretical microroughness profiles of a polished surface on a quartz sample is shown.

关键词： Grinding Polishing optical materials Slime particles Collision Diffusion Roughness

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Investigation of field-emitted electron beam behaviors using a line collector in a triode electron gun system

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MICROELECTRONIC engineering 2010年第11期87卷 2190-2195页

作者： Kim, Chung-Soo Kim, Dong Hwan Kim, Il-Hae Jang, Dong-Young Yim, Choong-Hyuk Ahn, Sung-Hoon Han, Dong-Chul Seoul Natl Univ Technol Sch Mech Design & Automat Seoul South Korea Seoul Natl Univ Sch Mech & Aerosp Engn Seoul 151742 South Korea CAMSYS Inc Venture Incubat Ctr Seoul South Korea Seoul Natl Univ Technol Sch Ind & Informat Syst Engn Seoul South Korea

The performance of a field-emission scanning electron microscope (SEM) is primarily dependent on the characteristics of the electron source. Field-emission electron sources provide a high current density, which can be used to produce a beam that can be focused through an electrostatic lens. Using a single < 1 1 1 > crystalline tungsten tip, we fabricated and tested a field emitter having a 91 nm radius and a stability under 14%. In this electron source, two electrostatic lenses consisting of 1st and 2nd anodes were designed and implemented and their performance dependence on variations in electrode shape, position, and applied voltage was investigated using a first-order finite-element method simulation. We also developed a line collector capable of measuring beam distribution and quantifying shifts in the electrical optical axis to characterize the behavior of a field-emitted electron beam as focused by an electrostatic optical system. (C) 2010 Elsevier B.v. All rights reserved.

关键词： Field emission Field emitter Electron gun Electrostatic lens Scanning electron microscopy

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Throughput enhancement technique for MAPPER maskless lithography

Throughput enhancement technique for MAPPER maskless lithogr...

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Conference on Alternative Lithographic Technologies II

作者： Wieland, M. J. Derks, H. Gupta, H. van de Peut, T. Postma, F. M. van veen, A. H. v. Zhang, Y. MAPPER Lithog BV NL-2628 XK Delft Netherlands

ISBN: (纸本)9780819480514

MAPPER Lithography is developing a maskless lithography technology based on massively-parallel electron-beam writing in combination with high speed optical data transport for switching the electron beams. With 13,000 electron beams each delivering a current of 13nA on the wafer, a throughput of 10 wph is realized for 22nm node lithography([1]). By clustering several of these systems together high throughputs can be realized in a small footprint. This enables a highly cost-competitive alternative to double patterning and EUv. The most mature and reliable electron source currently available that combines a high brightness, a high emission current and uniform emission is the dispenser cathode. For this electron source a reduced brightness of 10(6) A/m(2)Srv has been measured, with no restrictions on emission current([2]). With this brightness however it is possible to realize a beam current of 0.3nA (@ 25nm spotsize), which is almost a factor 50 lower than the 13nA that is required for 10 wph. Three methods can be distinguished to increase the throughput: 1. Use an electron source with a 50x higher brightness 2. Increase the number of beams and lenses 50x 3. Patterned beams: Image multiple sub-beams with each projection lens MAPPER has selected option 3) 'Patterned beams' as the method to increase the beam current to 13nA. This because an electron source with a 50x higher brightness is simply not available at this time, and increasing the number of beams and lenses 50x leads to undesirable engineering issues. During the past years MAPPER has been developing the concept of 'Patterned beams'. By imaging 7x7 sub-beams per projection lens the beam current is increased to the required 13nA level. This technique will also be used to maintain throughput at 10 wph for smaller technology nodes by further increasing the number of sub-beams per projection lens. In this paper we will describe the electron optical design used to image these multiple sub-beams per lens, as well as e

关键词： MAPPER maskless electron beam lithography throughput parallel

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Proceedings of SPIE - The International Society for optical engineering: Introduction

Proceedings of SPIE - The International Society for Optical ...

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Proceedings of SPIE - The International Society for optical engineering 2010年 7786卷 ix-xii页

作者： Johnson, R. Barry Mahajan, virendra N. Thibault, Simon

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The science calibration system for the TMT NFIRAOS and client instruments: Requirements and design studies

The science calibration system for the TMT NFIRAOS and clien...

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SPIE Astronomical Telescopes + Instrumentation

作者： Moon, Dae-Sik Simard, Luc Sussman, Dafna Crampton, David Millar-Blanchaer, Max Carlberg, Raymond G. Kulkarni, vainatey Khan, Muhammad O. Gorelik, Evgeny Kim, Andy Roxas, Mark A. Osborne, Jeffrey Herriot, Glen Larkin, James E. Lafrenière, David Dept. of Astronomy and Astrophysics University of Toronto Toronto ON M5S 3H4 Canada National Research Council Herzberg Institute of Astrophysics Victoria BC V9E 2E7 Canada Dept. of Physics and Astronomy University of California Los Angeles CA 90095 United States

ISBN: (纸本)9780819482259

We present the results of the design studies of the science calibration system for the adaptive optics and infrared instruments of the Thirty Meter Telescope. The two major requirements of the science calibration system are to provide pupil-simulated telescope beams to the adaptive optics system for calibration of the telescope pupil and to provide flatfielding and wavelength-calibration illuminations to client instruments of the adaptive optics system. Our current system is composed an integrating sphere with calibration light sources, a retractable pupil-mask system, a lens assembly consisting of a pair of achromatic triplets, and fold mirrors. This system appears to be capable of producing highlyuniform of f/15 beams at the telescope focal plane and pupil simulation at a pupil location within the adaptive optics system. We describe the present design and development of the calibration system along with relevant analyses. © 2010 Copyright SPIE - The International Society for optical engineering.

关键词： Calibration

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current developments in lens design and optical engineering X

Current Developments in Lens Design and Optical Engineering ...

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current developments in lens design and optical engineering X

ISBN: (纸本)9780819477187

The proceedings contain 22 papers. The topics discussed include: optical design dependence on technology development;practical design considerations for modern photographic optics;display systems and registration methods for mixed reality applications;efficient design process for the evaluation and control of flare in opto-mechanical systems;finding order in the design landscape of simple optical systems;design and optimization of a collimating optical system for high divergence LED light sources;point symmetric design approach to a wide-field wide-wavelength cat's eye retro-reflector anastigmat;fast catadioptric optics with large field of view;thinking outside the barrel: what really matters in modern photographic lens design;calculation of optical forces on a dielectric bead in a geometrically aberrated trap;and relationships between lens performance and different sensor sizes in professional photographic still SLR cameras.

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Photometrically corrected holographic lens

Photometrically corrected holographic lens

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SPIE optical engineering + Applications

作者： Suarez-Romero, J.G. Salas-Zuñiga, R. Instituto Tecnologico de Queretaro Tecnologico Y Escobedo Queretaro Qro 76000 Mexico Centro de Ingenieria YTecnologia S. C. Retablo 118B La Era Queretaro Qro 76150 Mexico

ISBN: (纸本)9780819477187

optical detectors for illumination measurements have the known photopic response v(λ), which is implemented with the help of colored glass filters attached to silicon detectors. In the case of high precision photometry the filter of each detector is hand prepared and the spectral response measured until it is matched to the function v(λ). This method takes a long time and the precision is limited. In this work we propose an optical method to implement holographic lens with predefined spectral selection, this method permits to make the optical design of the hologram when the spectral response of the silicon detector is known. © 2009 Copyright SPIE - The International Society for optical engineering.

关键词： optical design

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Thinking outside the barrel: What really matters in modern photographic lens design

Thinking outside the barrel: What really matters in modern p...

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SPIE optical engineering + Applications

作者： Rockwell, Ken *** Post Office Box 8778 San Diego CA 92038-8778 United States

ISBN: (纸本)9780819477187

Because optical performance has increased so far with modern design software and aspherical manufacturing processes, optical performance is now the least important factor in modern photographic lens design. Far more important are ergonomic (usability) and systems-integration factors which determine a lens' acceptance by photographers, and ultimately, its commercial success. Common SLR cameras tend to have the most advanced systems and features, so they tend to be the focus of this paper simply because they offer the most to discuss. Inside-the-barrel optics and other design considerations have been covered in SPIE paper 7428-3. © 2009 Copyright SPIE - The International Society for optical engineering.

关键词： Bandpass filters

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optical design dependence on technology development

Optical design dependence on technology development

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Time and Frequency Metrology II

作者： Neil, Iain A. ScotOptix Via Miravalle 25A CH-6900 Massagno TI Switzerland

ISBN: (纸本)9780819477217

Specific developments in optical technology over the past thirty years including refractive materials, thin film coatings and surface profiles will be discussed. A large variety of optical designs which depend on some of these developments will be described. The optical design examples presented will cover the infrared, visible, ultraviolet and combinations of these wavebands. A novel multi-waveband optical system that utilizes many of these developments will be illustrated in several possible configurations to meet different application requirements. A summary of the technologies employed in all of the optical design examples will indicate whether or not there may be trends in optical technology development. The optical design examples will be taken from issued Patents or published Patent applications and hence their optical prescriptions will be available for detailed analysis. © 2009 SPIE.

关键词： Coatings

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Practical design considerations for modern photographic optics

Practical design considerations for modern photographic opti...

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SPIE optical engineering + Applications

作者： Rockwell, Ken *** Post Office Box 8778 San Diego CA 92038-8778 United States

ISBN: (纸本)9780819477187

In the 1950s, cameras and lenses didn't communicate. optical bench tests were sufficient to characterize lens performance completely. Today, optics are only one small factor in the much larger electro-optical systems which are today's cameras. Bench performance alone isn't enough. For a lens to be useful it must work in concert with modern cameras' focus, exposure and data systems. This paper explores these numerous issues and their influences on lens design. Outside-the-barrel ergonomic and systems issues are covered in SPIE paper 7428-19. © 2009 Copyright SPIE - The International Society for optical engineering.

关键词： Cameras

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