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Solid State Lasers V Conference

作者： Hoffstadt, A Kolenda, J Ulbricht, M ELIGHT LASER SYST GMBH D-14513 TELTOWGERMANY

ISBN: (纸本)0819420727

The research and current state of the art of flash-lamp-pumped Ti:sapphire lasers are reviewed. Further, an overview of present applications of this type of laser is given, presenting in detail multispectral light detecting and ranging (LIDAR) for aerosol size distribution measurement, efficient laser vaporization and short-pulse amplification to high energies. Finally, recent achievements in the field of Ti:sapphire laser technology are presented. The improved design of discharge circuit and pump cavity resulted in increased laser efficiency, average power capability and reliability. Employing a semiconductor switch instead of a thyratron allows for a more compact, reliable and cost-effective set-up of the discharge circuit, which is supposed to meet the stringent requirements for electro-magnetic compatibility (EMC) of the laser systems more easily.

关键词： tunable solid-state laser Ti:sapphire laser flash-lamp-pumped overview applications new developments laser design pump-cavity design semiconductor switch

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Computational materials design and processing: Perspectives for atomistic approaches

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MATERIALS SCIENCE AND engineering B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY 1996年第1-3期37卷 72-82页

作者： Wimmer, E Biosym MsI Parc Club Orsay Université 20 rue Jean Rostand 91893 Orsay France

Theoretical and computational methods on the atomistic level have now matured to a point where their impact on the design of materials and their processing is becoming evident. This contribution provides an overview and critical assessment of the major current computational approaches with special emphasis on density functional methods. This is illustrated by characteristic examples including the chemisorption of a silane molecule on reconstructed Si(001) surfaces, the adhesion of NH3 to a CuO(111) surface, structural properties of LaNi5, the optical properties of ruby, and the magnetic properties of Co/Cu heterostructures. Immediate opportunities for atomistic approaches can be found in the development of novel functional electronic, optical and magnetic materials whereas the atomistic simulation of dynamic processes including phenomena such as fatigue and corrosion-while undeniably atomistic in origin-may need innovative conceptual and theoretical developments in order to bridge the gaps between atomistic, mesoscopic, and macroscopic length and fine scales.

关键词： materials atomic scale simulations density functional theory

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The influence of chemical composition on the refractive index thermal coefficient of liquids 6

The influence of chemical composition on the refractive inde...

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current developments in optical design and engineering VI 1996

作者： Fuller, Joseph B. C. Robb, Paul N. Sigler, Robert D. Abramov, Alexander P. Petrova, Maria V. Plyukhin, Andrey G. Tolstoy, Michael N. Lockheed Martin Palo Alto Research Labs Palo AltoCA94087 United States Vavilov State Optical Institute St. Petersburg Russia

Liquids have been shown to be very effective in the design of apochromatic lenses. The incorporation of abnormal liquids is complicated by their large thermal coefficients of refractive index (dn/dT). To make a glass-liquid design thermally stable, two liquids with different dn/dT and dispersions are typically used. This paper, which extends previously reported investigations of liquid dn/dT dependencies in the visible spectrum (SPIE Volume 2512,1995), explores the dependence of dn/dT, abnormal dispersion, and composition for a number of liquids. The optical property measurements were made at the Vavilov State optical Institute, St. Petersburg, Russia, in collaboration with the Lockheed Martin Advanced Technology Center, Palo Alto, California. © SPIE.

关键词： Refractive index

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Geometrical library recognition for mask data compression 3

Geometrical library recognition for mask data compression

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Conference on Photomask and X-Ray Mask Technology iii

作者： Veltman, R Ashida, I SONY SEMICOND AMER DESIGN ENGN SAN JOSECA 95134

ISBN: (纸本)0819421790

Recent developments in LSI mask data processing show a tendency towards unpreceded data volume increases. This paper introduces a data compression technique designed to reduce mask data volumes and is based on geometrical library recognition in which a library is defined as a set of patterns that can be referenced as a single object repeated along a 2 dimensional mesh. The data compression technique is referred to as mask data geometrical library recognition compression (MD-GLRC) and includes a newly developed repetition center tracking (RCT) and library inheritance tree (LIT) algorithm. By applying MD-GLRC, a 885 Mbyte 0.25 μm memory device mask data sample was compressed to 7 Mbytes in 3.5 CPU hours on a 135 MIPS workstation.

关键词： EB data processing EB data compression

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FPA design methodologies at Santa Barbara Focalplane

FPA design methodologies at Santa Barbara Focalplane

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Infrared Readout Electronics iii

作者： Goodnough, M.A. Rosner, Brett D. Stineman, John S. Hahn, Larry J. Santa Barbara Focalplane Goleta CA USA

ISBN: (纸本)081942126X

Modern focal plane arrays (FPAs) are being driven to lower cost, higher resolution, and more features. The complexity and requirements of such FPAs overwhelm traditional design approaches. An all encompassing design methodology that includes the requirements process, a tightly integrated test capability, an extensive modeling capability, and a detailed understanding of the foundry and FPA fabrication processes is required. Santa Barbara Focalplane's overall design methodology is presented as an approach to managing current and future FPA complexity.

关键词： Readout systems

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Hardware and software developments for a closed-loop infrared mission simulation test capability

Hardware and software developments for a closed-loop infrare...

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Conference on Targets and Backgrounds - Characterization and Representation II

作者： Fugerer, RH Hervig, DJ Holt, LL SVERDRUP TECHNOL INC AEDC OPERATARNOLD AFBTN 37889

ISBN: (纸本)0819421235

The Arnold engineering Development Center (AEDC) scene generation test capability (SGTC) program has completed the development of a laser based direct write scene generation (DWSG) facility that provides dynamic mission simulation testing for infrared (IR) focal plane arrays (FPAs) and their associated signal processing electronics. The AEDC DWSG focal plane array test capability (FPATC) includes lasers operating at 0.514, 1.06, 5.4, or 10.6 micrometer, and acousto-optic deflectors (AODs) which modulate the laser beam position and amplitude. Complex radio frequency (rf) electronics controls each AOD by providing multi-frequency inputs. These inputs produce a highly accurate and independent multi-beam deflection or 'rake,' that is swept across the FPA sensor under test. Each rf amplitude input to an AOD translates into an accurate and independent beam intensity in the rake. Issues such as scene fidelity, sensor frame rates, scenario length, and real-time laser beam position adjustments require rf control electronics that employs the use of advanced analog and digital signal processing techniques and designs. By implementing flexible system architectures in the electronics, the overall capability of the DWSG to adapt to emerging test requirement is greatly enhanced. Presented in this paper is an overview of the signal processing methodology and designs required to handle the DWSG requirement. Further, the paper summarizes the current status of recent AEDC technology efforts tasked with the implementation of real-time and closed-loop scene manipulation including sensor optical simulation using the DWSG. The paper describes a proof-of-principle (PoP) demonstration which used high speed digital signal processors inherent in the DWSG electronic design to compute the rotation, translation, optical transfer function convolution, and system calibration functions during scene projection.

关键词： scene infrared FPA sensor analog digital RF acousto-optic deflector digital synthesizer frame

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Micro-Hall magnetic sensors with high magnetic sensitivity based on iii-V heterostructures

Micro-Hall magnetic sensors with high magnetic sensitivity b...

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3rd International Conference on Intelligent Materials/3rd European Conference on Smart Structures and Materials

作者： DelMedico, S Benyattou, T Guillot, G Venet, T Gendry, M Tardy, J Chovet, A INST NATL SCI APPL PHYS MAT LABURA CNRS 358F-69621 VILLEURBANNEFRANCE

ISBN: (纸本)0819421650

In this work, we propose solutions based on engineering of iii-V heterostructures to develop new types of semiconductor magnetic sensors. These micro-Hall sensors use the properties of a 2D electron gas and the benefit of pseudomorphic material, in which both the alloy composition and the built-in strain offer additional degrees of freedom for band structure tailoring, to exhibit high magnetic sensitivity, good linearity, low temperature coefficient and high resolution. With the growth optimization which is described, two pseudomorphic In_0.75Ga_0.25As/In_0.52Al_0.48As heterostructures were grown on a semi- insulating InP substrate by molecular beam epitaxy. To understand better the influence of the heterostructure design on its electronic properties, a model involving the self-consistent solution of the Poisson and Schrodinger equations using the Fermi-Dirac statistics has been developed. These results have been used to optimize the structure design. A magnetic sensitivity of 346 V/AT with a temperature coefficient of -230 ppm/ degree(s)C between -80 degree(s)C and 85 degree(s)C has been obtained. The device show good linearity against magnetic field and also against the supply current. High signal-to-noise ratios corresponding to minimal magnetic field of 350 nT/Hz^1/2 at 100 Hz and 120 nT/Hz^1/2 at 1 kHz have been measured.

关键词： Magnetism Magnetic sensors Heterojunctions Sensors Doping Indium gallium arsenide Information operations Magnetic semiconductors Semiconductors Statistical modeling

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current status of x-ray mask manufacturing at the microlithographic mask development center 3

Current status of x-ray mask manufacturing at the microlitho...

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Conference on Photomask and X-Ray Mask Technology iii

作者： Kimmel, KR Hughes, PJ IBM CORP MICROELECT DIVLORAL FED SYSTESSEX JCTVT

ISBN: (纸本)0819421790

The Microlithographic Mask Development Center (MMD) has been the focal point of X-ray mask development efforts in the United States since its inception in 1993. Funded by the Advanced Research Projects Agency (ARPA), and with technical support from the Proximity X-ray Lithography Association (AT&T, IBM, Loral Federal Systems, and Motorola) the MMD has recently made dramatic advances in mask fabrication. Numerous defect-free 64Mb and 256Mb DRAM masks have been made on both boron-doped silicon and silicon carbide substrates. Image-placement error of less than 35nm 3 sigma is achieved with high yield. Image-size (critical dimension) control of 25nm 3 sigma on 250nm nominal images is representative performance. This progress is being made in a manufacturing environment with significant volumes, multiple customers, multiple substrate configurations, and fast turnaround-time (TAT) requirements. The MMD state-of-the-art equipment infrastructure has made much of this progress possible. This year the MMD qualified the EL-4, an IBM-designed-and-built variable-shaped-spot e-beam system. The fundamental performance parameters of this system will be described. Operational techniques of multiple partial exposure writing and product specific emulation (PSE) have been implemented to improve image-placement accuracy with remarkable success. Image-size control was studied in detail with contributory components separated. Defect density was systematically reduced to yield defect-free masks while simultaneously tightening inspection criteria. Information about these and other recent engineering highlights will be reported. An outline of the primary engineering challenges and goals for 1996 and status of progress toward 100 nm design rule capability will also be given.

关键词： X-ray mask X-ray lithography MMD Microlithographic Mask Development Center

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current developments in optical design and engineering V

Current Developments in Optical Design and Engineering V

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current developments in optical design and engineering V

ISBN: (纸本)0819418994

This conference proceedings contains 31 papers on optical systems, devices and materials. The main topics are: design of anastigmat microscopes;abnormal dispersion liquids;optical imaging systems;telescopes;speckle cameras;spaceborne optical instruments;polymeric optical components;lidar;optical design and analysis;optical waveguides;infrared cameras;etc.

关键词： optical systems

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DEMOS iii: new possibilities

DEMOS III: new possibilities

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current developments in optical design and engineering V

作者： Gan, Michael A. Zhdanov, Dmitriy D. Novoselskiy, Vadim V. Fedorov, Alexander O. Potyemin, Igor S. Ustinov, Sergey I. Starkov, A.A. Smirnov, S.E. S.I. Vavilov State Optical Inst. St. Petersburg Russia

ISBN: (纸本)0819418994

DEMOS software was developed in 1973 - 1975 for design of optical systems (OS) with conventional and holographic elements. It was constantly improved because of the necessity to solve a wide range of tasks dealing with display systems, lenses, multispectral systems for optical electronic units, and IR systems. A new version of DEMOS iii was developed in 1994, and is an integrated dialogue system for simulation and design of a wide range of OS on personal computers compatible with IBM-PC. This article deals with the new possibilities of DEMOS-PC, version 3.

关键词： optical systems

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