Highly-quality GaN films were deposited on graphite substrates using electron cyclotron resonance plasma enhanced metal organic chemical vapor deposition system (ECR-PEMOCVD) at low temperature. The influence of tempe...
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Highly-quality GaN films were deposited on graphite substrates using electron cyclotron resonance plasma enhanced metal organic chemical vapor deposition system (ECR-PEMOCVD) at low temperature. The influence of temperature on the properties of GaN films was investigated systematically by X-ray diffraction analysis (XRD), scanning electron microscope (SEM), and room temperature photoluminescence (PL), respectively. Results indicated that the dense and uniformed GaN films with highly c-axis preferred orientation were successfully achieved on graphite substrates under optimized deposition temperature of 450 degrees C. In addition, the relatively good ohmic contact between GaN and graphite was demonstrated by current-voltage (I-V) characteristics measurement. (C) 2013 Elsevier B.V. All rights reserved.
The heterojunction diodes with n-ZnO/ZnMgO/p-GaN structure have been deposited on the commercially available p-GaN/sapphire substrates by a simple process of ultrasonic spray pyrolysis. To demonstrate the effect of Zn...
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The heterojunction diodes with n-ZnO/ZnMgO/p-GaN structure have been deposited on the commercially available p-GaN/sapphire substrates by a simple process of ultrasonic spray pyrolysis. To demonstrate the effect of ZnMgO layer as electron blocking layer, the carrier transport mechanisms of both n-ZnO/p-GaN and n-ZnO/ZnMgO/p-GaN heterojunctions were systemically investigated by temperature-dependent current voltage measurements. The results revealed that the multistep tunneling is the dominant carrier transport mechanism in n-ZnO/ZnMgO/p-GaN heterojunctions under forward current, accurately controlled ZnMgO layer thickness can effectively block electron injection from ZnO to GaN and promote hole injection from GaN to ZnO. Therefore, the design and application of ZnO based heterostructure devices will benefit significantly from these achievements. (C) 2013 Elsevier Ltd. All rights reserved.
This paper is concerned with the problem of designing distributed event-triggered H-infinity filters over sensor networks subject to heterogeneous coupling intercommunication delays. A new distributed event-triggered ...
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ISBN:
(纸本)9781479902248
This paper is concerned with the problem of designing distributed event-triggered H-infinity filters over sensor networks subject to heterogeneous coupling intercommunication delays. A new distributed event-triggered scheme is proposed to determine whether or not each sensor's current sampled data should be broadcasted and transmitted to its underlying neighboring nodes through the communication network. In this scheme, each sensor node is able to make its own decisions to broadcast and transmit only when its local measurement output error exceeds a designed threshold. Heterogeneous coupling delays are incorporated in the intercommunication between the specific sensor node and its interacting neighbors. A refined technique is proposed to realize the complicated decoupling among the exchanged measurement outputs in the presence of coupling intercommunication delays. Then the resulting filter error system is modeled by a new delay system subject to finite time-varying "state" delays. Based on the Lyapunov-Krasovskii functional method, a sufficient condition for distributed event-triggered H-infinity filter design is established, from which the desired filter parameters and the triggering parameter in the event condition can be co-designed. The filter design problem is posed in terms of linear matrix inequalities. A quarter-car suspension model is finally presented to show the effectiveness and feasibility of the developed theoretical results.
Gallium nitride (GaN) films were deposited on Ni metal substrate using electron cyclotron resonance plasma-enhanced metal organic chemical vapor deposition system. With this approach, highly c-oriented GaN films with ...
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Gallium nitride (GaN) films were deposited on Ni metal substrate using electron cyclotron resonance plasma-enhanced metal organic chemical vapor deposition system. With this approach, highly c-oriented GaN films with smooth surface were obtained at an extremely low temperature of similar to 480 A degrees C. The trimethyl gallium (TMGa) flux dependent structural, morphological, and optical characteristics of GaN films were investigated by X-ray diffraction analysis, reflection high energy electron diffraction, atomic force microscopy and photoluminescence analysis. The results indicate that it is feasible to deposit GaN films on Ni metal substrate under the proper deposition procedures. The high quality GaN films with high c-axis orientation and strong ultraviolet emission peak are successfully achieved under the optimized TMGa flux of 1.2 sccm. The GaN/Ni structure has great potential for the development of high power devices with excellent heat dissipation.
Most modern tobacco industries have chambers to evaluate the quality of tobacco samples. In the academe, this chamber should also produce a low pressure likely to the atmospheric pressure in high altitude area. A vent...
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GaN films were deposited on indium tin oxide (ITO) coated glass substrates at various deposition temperatures using an electron cyclotron resonance plasma enhanced metal organic chemical vapor deposition (ECR-PEMOCVD)...
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GaN films were deposited on indium tin oxide (ITO) coated glass substrates at various deposition temperatures using an electron cyclotron resonance plasma enhanced metal organic chemical vapor deposition (ECR-PEMOCVD). The TMGa and N-2 are applied as precursors of Ga and N, respectively. The crystalline quality and photoluminescence properties of as-grown GaN films are systematically investigated as a function of deposition temperature by means of X-ray diffraction analysis (XRD), reflection high energy electron diffraction (RHEED), atomic force microscopy (AFM), and room temperature photoluminescence (PL). The results show that the dense and uniformed GaN films with highly c-axis preferred orientation are successfully achieved on ITO glass substrates under optimized deposition temperature of 430 degrees C, and the room temperature PL spectra of the optimized GaN film show an intense near-band-edge luminescence located at 360 nm. The obtained GaN/ITO/glass structure was especially attractive for transparent optoelectronics applications with inexpensive ITO/glass substrate. (C) 2012 Elsevier Ltd. All rights reserved.
The effects of phosphorous on the anti-oxidation of SnPb solder and the mechanism were investigated. The surface oxidation behavior of Sn63Pb37 solder in the liquid state was observed by comparing the color of the mol...
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ISBN:
(纸本)9783037851692
The effects of phosphorous on the anti-oxidation of SnPb solder and the mechanism were investigated. The surface oxidation behavior of Sn63Pb37 solder in the liquid state was observed by comparing the color of the molten solder and the effects of the temperature on the oxidation resistance of solder Sn63Pb37-P is conduced by skimming and weighting the oxidation dross. OM, SEM and EDS were used to analyze the anti-oxidation performance and mechanism. The results show that Sn63Pb37 solder with 0.019wt.% P can maintain smooth and brightly longer under 260 degrees C, and produce less oxide slag. It is found that phosphorous is needle-like and concentrate on the surface of the solder and oxide film. At 260 degrees C, the additional element P suppresses impurity element Fe forming oxide. The additional element P will engage in the forming of oxide film, and improve the structure and mechanical property of oxide film to achieve the antioxidant effect. If heated to 380 degrees C, the oxidation resistance of molten Sn63Pb37-P alloy was greatly worsen, instead.
Highly c-axis-oriented GaN films were deposited on Ti coated glass substrates using low temperature electron cyclotron resonance plasma enhanced metal organic chemical vapor deposition system(ECR-PEMOCVD)with trimethy...
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Highly c-axis-oriented GaN films were deposited on Ti coated glass substrates using low temperature electron cyclotron resonance plasma enhanced metal organic chemical vapor deposition system(ECR-PEMOCVD)with trimethyl gallium(TMGa)as gallium *** influence of TMGa flux on the properties of GaN films were systematically investigated by reflection high energy electron diffraction(RHEED),X-ray diffraction analysis(XRD),atomic force microscopy(AFM)and Raman *** GaN film with small surface roughness and high c-axis preferred orientation was successfully achieved at the optimized TMGa flux of 1.0 *** ohmic contact characteristic between GaN and Ti layer was clearly demonstrated by the near-linear current-voltage(I-V)*** GaN/Ti/glass structure has great potential to dramatically improve the scalability and reduce the cost of solid-state lighting light emitting diodes.
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