Highly c-axis-oriented GaN films were deposited on Ti coated glass substrates using low temperature electron cyclotron resonance plasma enhanced metal organic chemical vapor deposition system(ECR-PEMOCVD)with trimethy...
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Highly c-axis-oriented GaN films were deposited on Ti coated glass substrates using low temperature electron cyclotron resonance plasma enhanced metal organic chemical vapor deposition system(ECR-PEMOCVD)with trimethyl gallium(TMGa)as gallium *** influence of TMGa flux on the properties of GaN films were systematically investigated by reflection high energy electron diffraction(RHEED),X-ray diffraction analysis(XRD),atomic force microscopy(AFM)and Raman *** GaN film with small surface roughness and high c-axis preferred orientation was successfully achieved at the optimized TMGa flux of 1.0 *** ohmic contact characteristic between GaN and Ti layer was clearly demonstrated by the near-linear current-voltage(I-V)*** GaN/Ti/glass structure has great potential to dramatically improve the scalability and reduce the cost of solid-state lighting light emitting diodes.
Highly c-axis oriented GaN films were deposited on Cu coated glass substrates using electron cyclotron resonance plasma enhanced metal organic chemical vapor deposition (ECR-PEMOCVD). In-situ reflection high energy el...
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Highly c-axis oriented GaN films were deposited on Cu coated glass substrates using electron cyclotron resonance plasma enhanced metal organic chemical vapor deposition (ECR-PEMOCVD). In-situ reflection high energy electron diffraction (RHEED), X-ray diffraction (XRD) and atomic force microscopy (AFM) were used to systematically analyze the influence of TMGa flux on the crystalline quality of the GaN films. GaN films with strong c-axis preferred orientation were achieved under the optimal TMGa flux of 1.4 sccm. Moreover, a strong near band edge (NBE) emission peak located at 354 nm was observed in the room temperature PL spectrum for the optimized GaN sample. The GaN/Cu/glass structure shows great potential for application in large area low cost GaN-based LED devices. (C) 2013 Elsevier B.V. All rights reserved.
Prefer-oriented and fine grained polycrystalline InN films are deposited on sapphire substrate using electron cyclotron resonance plasma enhanced metal organic chemical vapor deposition (ECR-PEMOCVD) system at low-tem...
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ISBN:
(纸本)9781632660008
Prefer-oriented and fine grained polycrystalline InN films are deposited on sapphire substrate using electron cyclotron resonance plasma enhanced metal organic chemical vapor deposition (ECR-PEMOCVD) system at low-temperature. Trimethyl indium (TMIn) and N2 are applied as precursors for In and N, respectively. The influence of deposition temperature on the structural, electrical and morphological properties of InN films is systematically investigated by x-ray diffraction analysis (XRD), Hall Effect measurement (HL5500) and atomic force microscopy (AFM). The results show that the as-grown InN films with smooth surface roughness of 4.59nm and preferred orientation are successfully achieved at the optimized deposition temperature of 450°C, which was low temperature here. The InN films reported here will provide various opportunities for the development of high efficiency and high performance semiconductor devices based on InN materials.
Preferred orientation GaN films are deposited on freestanding thick diamond films by electron cyclotron resonance plasma enhanced metal organic chemical vapor deposition (ECR-PEMOCVD). The TMGa and N2 are applied as p...
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ISBN:
(纸本)9781632660008
Preferred orientation GaN films are deposited on freestanding thick diamond films by electron cyclotron resonance plasma enhanced metal organic chemical vapor deposition (ECR-PEMOCVD). The TMGa and N2 are applied as precursors and different N2 flux is used to achieve high quality GaN films. The influence of N2 flux on the properties of GaN films is systematically investigated by x-ray diffraction analysis (XRD), atomic force microscopy (AFM), electron probe microanalysis (EPMA) and Hall Effect Measurement (HL). The results show that the high quality GaN films deposited at the proper N2 flux display a fine structural and electrical property and the Ga/N atomic ratio plays an important role in the electrical property of GaN films.
The panda lineage dates back to the late Miocene(1) and ultimately leads to only one extant species, the giant panda (Ailuropoda melanoleuca). Although global climate change and anthropogenic disturbances are recogniz...
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The panda lineage dates back to the late Miocene(1) and ultimately leads to only one extant species, the giant panda (Ailuropoda melanoleuca). Although global climate change and anthropogenic disturbances are recognized to shape animal population demography(2,3) their contribution to panda population dynamics remains largely unknown. We sequenced the whole genomes of 34 pandas at an average 4.7-fold coverage and used this data set together with the previously deep-sequenced panda genome(4) to reconstruct a continuous demographic history of pandas from their origin to the present. We identify two population expansions, two bottlenecks and two divergences. Evidence indicated that, whereas global changes in climate were the primary drivers of population fluctuation for millions of years, human activities likely underlie recent population divergence and serious decline. We identified three distinct panda populations that show genetic adaptation to their environments. However, in all three populations, anthropogenic activities have negatively affected pandas for 3,000 years.
beta-SiC thin films were synthesized directly on graphite by hot filament chemical vapor deposition at low temperature. SiH4 diluted in hydrogen was employed as the silicon source, while graphite was functioned as bot...
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beta-SiC thin films were synthesized directly on graphite by hot filament chemical vapor deposition at low temperature. SiH4 diluted in hydrogen was employed as the silicon source, while graphite was functioned as both substrate and carbon source for the as-grown beta-SiC films. X-ray diffraction and Fourier transform infrared analysis indicate that SiO2/beta-SiC/graphite hybrid composite was formed after post annealing treatment, and its crystalline quality can be remarkably improved under optimized annealing conditions. The possible growth mechanism was proposed based on in situ etching of graphite by reactive hydrogen radicals at the atomic level. (C) 2013 AIP Publishing LLC.
This paper is concerned with the problem of designing distributed event-triggered H_∞ filters over sensor networks subject to heterogeneous coupling intercommunication delays. A new distributed event-triggered scheme...
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ISBN:
(纸本)9781479902255
This paper is concerned with the problem of designing distributed event-triggered H_∞ filters over sensor networks subject to heterogeneous coupling intercommunication delays. A new distributed event-triggered scheme is proposed to determine whether or not each sensor's current sampled data should be broadcasted and transmitted to its underlying neighboring nodes through the communication network. In this scheme, each sensor node is able to make its own decisions to broadcast and transmit only when its local measurement output error exceeds a designed threshold. Heterogeneous coupling delays are incorporated in the intercommunication between the specific sensor node and its interacting neighbors. A refined technique is proposed to realize the complicated decoupling among the exchanged measurement outputs in the presence of coupling intercommunication delays. Then the resulting filter error system is modeled by a new delay system subject to finite time-varying "state" delays. Based on the Lyapunov-Krasovskii functional method, a sufficient condition for distributed event-triggered H_∞ filter design is established, from which the desired filter parameters and the triggering parameter in the event condition can be co-designed. The filter design problem is posed in terms of linear matrix inequalities. A quarter-car suspension model is finally presented to show the effectiveness and feasibility of the developed theoretical results.
Gallium nitride (GaN) films were deposited on stainless steel substrates by electron cyclotron resonance plasma enhanced metal organic chemical vapor deposition system (ECR-PEMOCVD), with trimethyl gallium (TMGa) and ...
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ISBN:
(纸本)9781632660008
Gallium nitride (GaN) films were deposited on stainless steel substrates by electron cyclotron resonance plasma enhanced metal organic chemical vapor deposition system (ECR-PEMOCVD), with trimethyl gallium (TMGa) and N2 applied as the precursors of Ga and N, respectively. The effect of growth temperature on the characteristics of GaN films is systematically investigated by reflection high energy electron diffraction (RHEED), X-ray diffraction analysis (XRD), room temperature photoluminescence (PL), and scanning electron microscope (SEM). The results show that the dense and uniformed GaN films with highly c-axis preferred orientation are successfully achieved on stainless substrates under optimized deposition temperature of 400°C. In addition, the approximate Ohmic contact behavior between GaN film and stainless steel substrate was clearly demonstrated by the current-voltage (I-V) dependence.
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