In this paper, a series of polycrystalline ferrite samples were prepared with the composition of Zn0.1Li0.525-xTi0.15MgxFe2.225-0.5xO4 (LiZn) (x=0, 0.05, 0.10, 0.15 and 0.20) using both microwave sintering (MS) and co...
详细信息
In this paper, a series of polycrystalline ferrite samples were prepared with the composition of Zn0.1Li0.525-xTi0.15MgxFe2.225-0.5xO4 (LiZn) (x=0, 0.05, 0.10, 0.15 and 0.20) using both microwave sintering (MS) and conventional sintering (CS) technologies, respectively. The sintering time and temperature were 22 hours and 1000 degrees C for the CS process, and 2 hours and 880 degrees C for the MS process. Experiments showed that the MS treated LiZn ferrites exhibited more excellent magnetic properties and denser, more uniform micro-structures comparing with the ones treated by CS method. For the LiZn ferrite (x=0.1) sintered at 880 degrees C using MS, the saturation magnetic induction (Bs) is 242.3 mT, the coercive force (Hc) is 135 A/m, the square ratio (Br/Bs) is 0.87 and the ferromagnetic resonance line-width (Delta H) is 143.2 Oe. These results represented very good properties for an X-band phase shifter material and indicated that the MS method is a potentially important technique for fabricating low temperature co-fired ceramics (LTCC). (C) 2016 Author(s).
目的:系统评价玉屏风散加减辅助治疗过敏性鼻炎的疗效和安全性,为临床提供循证参考。方法:计算机检索万方数据库、中文科技期刊数据库、中国期刊全文数据库、中国生物医学文献数据库、Cochrane图书馆、EMBase、Pub Med,收集玉屏风散加减联合化学药(试验组)对比单纯化学药(对照组)治疗过敏性鼻炎的随机对照试验,提取资料并按照Cochrane系统评价员手册5.1.0评价纳入研究质量,采用Rev Man 5.2统计软件进行Meta分析。结果:共纳入15项RCT,合计1 366例患者。Meta分析结果显示,试验组患者总有效率[OR=3.95,95%CI(2.80,5.58),P<0.001]显著高于对照组,复发率[OR=0.37,95%CI(0.22,0.63),P<0.001]和不良反应发生率[OR=0.15,95%CI(0.06,0.35),P<0.001]显著低于对照组,差异均有统计学意义。结论:玉屏风散加减辅助治疗过敏性鼻炎疗效较好,可以降低复发率,安全性亦较好。
The influence of transient heat transfer in different condensation condition was investigated experimentally in the present paper. Getting condensation heat and mass transfer regularity and characteristics in space ca...
详细信息
The influence of transient heat transfer in different condensation condition was investigated experimentally in the present paper. Getting condensation heat and mass transfer regularity and characteristics in space can provide theoretical basis for thermodynamic device such as heat pipes, loop heat pipes and capillary pumped loops as well as other fluid management engineering designing. In order to study the condensation process in space, an experimental study has been carried out on the ground for space experiment. The results show that transit heat transfer coefficient of film condensation is related to the condensation film width, the flow condition near the two phase interface and the pressure of the vapor and non-condensable gas in chamber. On the ground, the condensation heat flux on vertical surface is higher than it on horizontal surface. The transit heat flux of film condensation is affected by the temperature of superheated vapor, the temperature of condensation surface and non-condensable gas pressure. Condensation heat flux with vapor forced convection is many times more than it with natural convection. All of heat flux for both vapor forced convection and natural convection condensation in limited chamber declines dramatically over time. The present experiment is preliminary work for our future space experiments of the condensation and heat transfer process onboard the Chinese Spacecraft "TZ-1" to be launched in 2016.
The interest in applying thin films on Si-wafer substrate for microelectromechanical systems devices by using atomic layer deposition (ALD) has raised the demand on reliable mechanical property data of the films. This...
详细信息
The interest in applying thin films on Si-wafer substrate for microelectromechanical systems devices by using atomic layer deposition (ALD) has raised the demand on reliable mechanical property data of the films. This study aims to find a quick method for obtaining nanoindentation hardness of thin films on silicon with improved reliability. This is achieved by ensuring that the film hardness is determined under the condition that no plastic deformation occurs in the substrate. In the study, ALD Al2O3 films having thickness varying from 10 to 600 nm were deposited on a single-side polished silicon wafer at 300 degrees C. A sharp cube-corner indenter was used for the nanoindentation measurements. A thorough study on the Si-wafer reference revealed that at a specific contact depth of about 8 nm the wafer deformation in loading transferred from elastic to elastic-plastic state. Furthermore, the occurrence of this transition was associated with a sharp increase of the power-law exponent, m, when the unloading data were fitted to a power-law relation. Since m is only slightly material dependent and should fall between 1.2 and 1.6 for different indenter geometry having elastic contact to common materials, it is proposed that the high m values are the results from the inelastic events during unloading. This inelasticity is linked to phase transformations during pressure releasing, a unique phenomenon widely observed in single crystal silicon. Therefore, it is concluded that m could be used to monitor the mechanical state of the Si substrate when the whole coating system is loaded. A suggested indentation depth range can then be assigned to each film thickness to provide guidelines for obtaining reliable property data. The results show good consistence for films thicker than 20 nm and the nanoindentation hardness is about 11 GPa independent of film thickness. (C) 2014 American Vacuum Society.
Use of atomic layer deposition (ALD) in microelectromechanical systems (MEMS) has increased as ALD enables conformal growth on 3-dimensional structures at relatively low temperatures. For MEMS device design and fabric...
详细信息
Use of atomic layer deposition (ALD) in microelectromechanical systems (MEMS) has increased as ALD enables conformal growth on 3-dimensional structures at relatively low temperatures. For MEMS device design and fabrication, the understanding of stress and mechanical properties such as elastic modulus, hardness and adhesion of thin film is crucial. In this work a comprehensive characterization of the stress, elasticmodulus, hardness and adhesion of ALD aluminum oxide (Al2O3) films grown at 110-300 degrees C from trimethylaluminum and water is presented. Film stress was analyzed by wafer curvature measurements, elastic modulus by nanoindentation and surface-acoustic wave measurements, hardness by nanoindentation and adhesion by microscratch test and scanning nanowear. The films were also analyzed by ellipsometry, optical reflectometry, X-ray reflectivity and time-of-flight elastic recoil detection for refractive index, thickness, density and impurities. The ALD Al2O3 films were under tensile stress in the scale of hundreds of MPa. The magnitude of the stress decreased strongly with increasing ALD temperature. The stress was stable during storage in air. Elastic modulus and hardness of ALD Al2O3 saturated to a fairly constant value for growth at 150 to 300 degrees C, while ALD at 110 degrees C gave softer films with lower modulus. ALD Al2O3 films adhered strongly on cleaned silicon with SiOx termination. (C) 2013 Elsevier B.V. All rights reserved.
Favorable facility layouts could effectively improve production efficiency, reduce production cost, and improve comprehensive competitiveness. Take the inefficient workshop facility layout of the H Company as an examp...
详细信息
Favorable facility layouts could effectively improve production efficiency, reduce production cost, and improve comprehensive competitiveness. Take the inefficient workshop facility layout of the H Company as an example, the paper studies both transportation and processing cycle for raw materials of its main products, records statistically transport distances and transport weights for each raw material in each processing workshop, and discovers principal issues in the transportation and processing cycle for the H Company. This paper adopts the Systematic Layout Planning(SLP) approach to optimize the layout design of the H Company, and compares non-optimized layout scheme with optimized one from qualitative and quantitative analysis aspect by using the analytic hierarchy process approach. The results show that the application of SLP approach in the H Company could enhance obviously the performance of its workshop facility layout.
In this paper, we report ALD deposition of silicon dioxide using either thermal or plasma enhanced atomic layer deposition (PEALD). Several aminosilanes with differing structures and reactivity were used as silicon pr...
详细信息
In this paper, we report ALD deposition of silicon dioxide using either thermal or plasma enhanced atomic layer deposition (PEALD). Several aminosilanes with differing structures and reactivity were used as silicon precursors in R&D single wafer ALD tools. One of the precursors was also tested on pilot scale batch ALD using O-3 as oxidant and with substrates measuring 150 x 400 mm. The SiO2 film deposition rate was greatly dependent on the precursors used, highest values being 1.5-2.0 angstrom/cycle at 30-200 degrees C for one precursor with an O-2 plasma. According to time-of-flight-elastic recoil detection analysis measurements carbon and nitrogen impurities were relatively low, but hydrogen content increased at low deposition temperatures. (C) 2014 Elsevier B.V. All rights reserved.
Background: Internal carotid artery fenestration is a rare congenital cerebrovascular condition and can be misdiagnosed as carotid artery dissection. Case Report: A patient was initially misdiagnosed with carotid arte...
Background: Internal carotid artery fenestration is a rare congenital cerebrovascular condition and can be misdiagnosed as carotid artery dissection. Case Report: A patient was initially misdiagnosed with carotid artery dissection. This initial diagnosis was made using a carotid vascular computed angiography and magnetic resonance angiography. A digital subtraction angiography examination revealed a fenestration in the terminal C1 segment of the right internal carotid artery. Previous literature related to carotid artery fenestration was reviewed and analyzed. Conclusions: Fenestration of the carotid artery combined with aneurysm at the external segment of the internal carotid artery or from the starting position of the carotid artery remains rare in elderly patients, can be misdiagnosed as artery dissection.
暂无评论