Low pressure chemical vapor deposition(lpcvd)is one of the most important processes during semiconductor ***,experience based control is often used to design this *** few data of thin film thickness on wafers can be a...
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Low pressure chemical vapor deposition(lpcvd)is one of the most important processes during semiconductor ***,experience based control is often used to design this *** few data of thin film thickness on wafers can be available after a long-depositing-time ***,the spatial distribution of temperature makes it hard to control product quality on the multiple *** this work,an optimal design strategy based on the gaussian process model(GPM)is proposed to control this kind of spatial batch *** the conventional model based design,GPM built up from the data of wafer thicknesses in previous *** it will be employed to predict the thickness of all the wafers on different spatial ***,the predictive uncertainties provided by GPM are also taken into consideration to guide the optimal design of manipulated variables so that the controlling can be more *** effectiveness of the proposed strategy is successfully demonstrated in an lpcvdprocess.
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