A plasma control system comprises: a high frequency power source;a first antenna connected at one end to the high frequency power source;a second antenna connected at one end to another end of the first antenna;a firs...
标准号:
US20210022236(A1)
A plasma control system comprises: a high frequency power source;a first antenna connected at one end to the high frequency power source;a second antenna connected at one end to another end of the first antenna;a first variable reactance element provided between the first antenna and the second antenna;a first drive part for the first variable reactance element;a second variable reactance element connected to another end of the second antenna;a second drive part for the second variable reactance element;a first current detection part detecting the current in the one end of the first antenna;a second current detection part detecting the current between the first antenna and the second antenna;a third current detection part detecting the current in the other end of the second antenna;and a control device controlling the first drive part and the second drive part.
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