在843 K LiCl-KCl-CeCl_3熔盐中活性铝电极上,研究了Ce(Ⅲ)离子的电化学行为和欠电位沉积Al-Ce合金。对比循环伏安曲线发现,在Al电极上Ce(Ⅲ)/Ce反应的氧化还原电势比在Mo惰性电极上更正;开路计时电位在金属铝和铈的沉积平台之间出现2...
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在843 K LiCl-KCl-CeCl_3熔盐中活性铝电极上,研究了Ce(Ⅲ)离子的电化学行为和欠电位沉积Al-Ce合金。对比循环伏安曲线发现,在Al电极上Ce(Ⅲ)/Ce反应的氧化还原电势比在Mo惰性电极上更正;开路计时电位在金属铝和铈的沉积平台之间出现2个平台,这表明Ce(Ⅲ)在A1活性电极上可以生成两种金属间化合物。以上结果在电化学机理上说明Ce(Ⅲ)离子可以在Al电极上欠电位沉积形成金属间化合物。在该实验条件下通过恒电位电解,在Al电极上得到了Al-Ce合金,验证了电化学分析的结果。经XRD表征,证实形成了AlCe和AlCe_3两种合金,结合Al-Ce合金相图分析了只产生这两种合金的原因;结合开路电位计算了生成这两种合金的标准吉布斯自由能变值。经SEM和EDS表征,证明了铈在Al电极表面分布,并形成厚度均一约28μm的Al-Ce合金镀层。
An integrated low-temperature nitriding process was carried out for Ti6Al4V to investigateitseffect on microstructure and *** process was designed to enhance the nitriding kinetics in low-temperature（500℃） nitridin...
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An integrated low-temperature nitriding process was carried out for Ti6Al4V to investigateitseffect on microstructure and *** process was designed to enhance the nitriding kinetics in low-temperature（500℃） nitriding by deformation, and to strengthen Ti6Al4V alloybydispersionat the same time. Specimens of Ti6Al4V alloyweretreated through the process of solid solutionstrengthening-cold deformation-nitriding at 500℃. The white nitriding layeris formed after some time and then kept stable, changing little withthedeformationdegreeand time. The effect of aging on substrate is significant. Surface hardness and substrate hardnessincrease with deformation increasing. The construction was investigated by *** surface nitridesare TiN, Ti2N, Ti4N3-Xand Ti3N1.29,and thenitridesin cross-section are Ti3N1.29and TiN0.3. The wear tests of specimens after nitriding, aging and deformation were carried out,andthetest data show that the nitrided pieces have the best wear resistance.
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