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2012 MRS Fall Meeting

作者： Ishikawa, Ippei Sakurai, Keisuke Kiyohara, Shuji Okuno, Taisuke Tanoue, Hideto Suda, Yoshiyuki Takikawa, Hirofumi Taguchi, Yoshio Sugiyama, Yoshinari Omata, Yukiko Kurashima, Yuichi Electric and Control System Engineering Course Faculty of Advanced Engineering Maizuru National College of Technology 234 Shiroya Maizuru Kyoto 625-8511 Japan Department of Electrical and Electronic Information Engineering Toyohashi University of Technology 1-1 Hibarigaoka Tenpaku Toyohashi Aichi 441-8580 Japan Application and Technical Section Elionix Inc. 3-7-6 Motoyokoyama Hachioji Tokyo 192-0063 Japan Research Center for Ubiquitous MEMS and Micro Engineering AIST 1-2-1 Namiki Tsukuba Ibaraki 305-8564 Japan

ISBN: (纸本)9781632661043

The microfabrication technologies for organic light-emitting devices (OLEDs) are essential to the fabrication of the next generation of light-emitting devices. The micro-OLEDs fabricated by room-temperature curing nanoimprint lithography (RTC-NIL) using diamond molds have been investigated. However, light emissions from 10 μm-square-dot OLEDs fabricated by the RTC-NIL method have not been uniform. Therefore, we proposed the fabrication of micro-OLEDs by room-temperature curing nanocontact-print lithography (RTC-NCL) using the diamond-like carbon (DLC) mold. The DLC molds used in RTC-NCL were fabricated by an electron cyclotron resonance (ECR) oxygen ion shower with polysiloxane oxide mask in electron beam (EB) lithography technology. The mold patterns are square and rectangle dots which has 10 μm-width, 10 μm-width and 50 μm-length, respectively. The height of the patterns is 500 nm. The DLC molds were used to form the insulating layer of polysiloxane in RTC-NCL. We carried out the RTC-NCL process using the DLC mold under the following optimum conditions: 0.1 MPa-pressure for coating DLC mold with polysiloxane film, 2.1 MPa-pressure for transferring polysiloxane from DLC mold pattern to indium tin oxide (ITO) glass substrate. We deposited N,N′-Diphenyl -N,N′-di (m-tolyl)benzidine (TPD) [40 nm-thickness] as hole transport layer / Tris(8-quinolinolato)aluminum (Alq3) [40 nm-thickness] as electron transport layer / A1 [200 nm-thickness] as cathode on ITO glass substrate as anode in this order. We succeeded in formation of the insulating layer with square and rectangle dots which has 10 μm-width, 10 μm-width and 50 μm-length, and operation of micro-OLEDs by RTC-NIL using DLC molds. © 2012 Materials Research Society.

关键词： Silicones

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Fabrication of DLC-based micro-gear patterns by room-temperature curing nanoimprint lithography using glass-like carbon molds

Fabrication of DLC-based micro-gear patterns by room-tempera...

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2012 MRS Fall Meeting

作者： Kiyohara, Shuji Ikegaki, Tomu Ito, Chigaya Ishikawa, Ippei Tanoue, Hideto Takikawa, Hirofumi Taguchi, Yoshio Sugiyama, Yoshinari Omata, Yukiko Kurashima, Yuichi Electric and Control System Engineering Course Faculty of Advanced Engineering Maizuru National College of Technology 234 Aza Shiroya Maizuru Kyoto 625-8511 Japan Department of Electrical and Electronic Information Engineering Toyohashi University of Technology 1-1 Hibarigaoka Tenpaku Toyohashi Aichi 441-8580 Japan Application and Technical Section ELIONIX INC 3-7-6 Motoyokoyama Hachioji Tokyo 192-0063 Japan Research Center for Ubiquitous MEMS and Micro Engineering AIST 1-2-1 Namiki Tsukuba Ibaraki 305-8564 Japan

ISBN: (纸本)9781632661043

The fabrication of diamond-like carbon (DLC) micro-gear by room temperature curing nanoimprint lithography (RTC-NIL) using glass-like carbon (GC) molds as applications to the DLC-based medical MEMS (Micro Electronic Mechanical systems) was investigated. The DLC film which has excellent properties similar to chemical vapor deposited (CVD) diamond films was used as the patterning material. We propose GC as mold material because GC has higher etching selectivity than a diamond film. The etching selectivity of polysiloxane film against a GC substrate is about 5 times as high as that of a diamond film. Therefore we fabricated the GC molds that have micro-gear patterns with 30 μm-tip diameter and 500 nm-tooth thickness. We carried out the RTC-NIL process using the GC micro-gear molds under the following optimum conditions. 1 min-time from spin-coating to imprint: t1, 0.5 MPa-imprinting pressure: P and 5 min-holding time: t2, and then the imprinted polysiloxane pattern on DLC film was processed with an electron cyclotron resonance (ECR) oxygen ion shower. However, we were not able to fabricate micro-gear patterns in high accuracy because of a remaining residual layer on the DLC film. Therefore we propose the removing process for the residual layer with trifluoromethane (CHF3) ion shower under the optimum conditions of 300 eV-ion energy and 4 min-etching time. As a result, we succeeded to fabricate concave DLC-based micro-gear patterns in high accuracy which has 30 μm-tip diameter and 1 μm-depth. © 2013 Materials Research Society.

关键词： Molds

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Nanofabrication of DLC-dot arrays by room-temperature curing imprint-liftoff method

Nanofabrication of DLC-dot arrays by room-temperature curing...

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2012 MRS Fall Meeting

作者： Kiyohara, Shuji Matta, Shohei Ishikawa, Ippei Tanoue, Hideto Takikawa, Hirofumi Taguchi, Yoshio Sugiyama, Yoshinari Omata, Yukiko Kurashima, Yuichi Electric and Control System Engineering Course Faculty of Advanced Engineering Maizuru National College of Technology 234 Aza Shiroya Maizuru Kyoto 625-8511 Japan Department of Electrical and Electronic Information Engineering Toyohashi University of Technology 1-1 Hibarigaoka Tenpaku Toyohashi Aichi 441-8580 Japan Application and Technical Section Elionix Inc. 3-7-6 Motoyokoyama Hachioji Tokyo 192-0063 Japan Research Center for Ubiquitous MEMS and Micro Engineering AIST 1-2-1 Namiki Tsukuba Ibaraki 305-8564 Japan

ISBN: (纸本)9781632661043

As an application to the nanoemitter, we investigated the nanofabrication of diamond-like carbon (DLC)-dot arrays by room-temperature curing imprint-liftoff (RTCIL) method using aluminum mask. The DLC film which has excellent properties similar to diamond properties was used as the patterning material. A polished glass like carbon (GC) was used as a mold material. The polysiloxane in the state of sticky liquid at room temperature and stable in air exhibits a negative-exposure characteristics. Therefore, the polysiloxane was used as electron beam (EB) resist and oxide mask material in EB lithography, and also used as RTC-imprint resist material. An aluminum was used as oxide metal mask material of liftoff. We have fabricated the GC mold of dot arrays with 5 μm-square and 500 nm-height. We carried out the RTCIL process using the GC mold under the following optimum imprint conditions: 0.5 MPa-imprinting pressure and 5 min- holding time. Aluminum film on the imprinted polysiloxane was prepared by vacuum evaporation method and its thickness is 20 nm. Finally, the polysiloxane patterns were removed with acetone and aluminum mask patterns were fabricated. We found that the maximum etching selectivity of aluminum film against DLC film was as high as 35, which was obtained under an ion energy of 400 eV. Then we processed the patterned aluminum on DLC film with an ECR oxygen ion shower. We fabricated DLC-dot arrays with 5 μm-square and 400 nm-height with an aspect ratio of 0.08. © 2013 Materials Research Society.

关键词： Carbon

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Nanofabrication of DLC-dot Arrays by Room-temperature Curing Imprint-liftoff Method

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MRS Online Proceedings Library (OPL) 2013年第1期1511卷 mrsf12-1511-ee05-02-mrsf12-1511-ee05-02页

作者： Shuji Kiyohara Shohei Matta Ippei Ishikawa Hideto Tanoue Hirofumi Takikawa Yoshio Taguchi Yoshinari Sugiyama Yukiko Omata Yuichi Kurashima Electric and Control System Engineering Course Faculty of Advanced Engineering Maizuru National College of Technology 234 Aza Shiroya Maizuru Kyoto 625-8511 Japan Department of Electrical and Electronic Information Engineering Toyohashi University of Technology 1-1 Hibarigaoka Tenpaku Toyohashi Aichi 441-8580 Japan Application and Technical Section ELIONIX INC. 3-7-6 Motoyokoyama Hachioji Tokyo 192-0063 Japan Research Center for Ubiquitous MEMS and Micro Engineering AIST 1-2-1 Namiki Tsukuba Ibaraki 305-8564 Japan

As an application to the nanoemitter, we investigated the nanofabrication of diamond-like carbon (DLC)-dot arrays by room-temperature curing imprint-liftoff (RTCIL) method using aluminum mask. The DLC film which has excellent properties similar to diamond properties was used as the patterning material. A polished glass like carbon (GC) was used as a mold material. The polysiloxane in the state of sticky liquid at room temperature and stable in air exhibits a negative-exposure characteristics. Therefore, the polysiloxane was used as electron beam (EB) resist and oxide mask material in EB lithography, and also used as RTC-imprint resist material. An aluminum was used as oxide metal mask material of liftoff. We have fabricated the GC mold of dot arrays with 5 µm-square and 500 nm-height. We carried out the RTCIL process using the GC mold under the following optimum imprint conditions: 0.5 MPa-imprinting pressure and 5 min- holding time. Aluminum film on the imprinted polysiloxane was prepared by vacuum evaporation method and its thickness is 20 nm. Finally, the polysiloxane patterns were removed with acetone and aluminum mask patterns were fabricated. We found that the maximum etching selectivity of aluminum film against DLC film was as high as 35, which was obtained under an ion energy of 400 eV. Then we processed the patterned aluminum on DLC film with an ECR oxygen ion shower. We fabricated DLC-dot arrays with 5 µm-square and 400 nm-height with an aspect ratio of 0.08.

关键词： diamond ion-beam processing microstructure

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Fabrication of DLC-Based Micro-Gear Patterns by Room-Temperature Curing Nanoimprint Lithography Using Glass-Like Carbon Molds

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MRS Online Proceedings Library (OPL) 2013年第1期1511卷 mrsf12-1511-ee05-01-mrsf12-1511-ee05-01页

作者： Shuji Kiyohara Tomu Ikegaki Chigaya Ito Ippei Ishikawa Hideto Tanoue Hirofumi Takikawa Yoshio Taguchi Yoshinari Sugiyama Yukiko Omata Yuichi Kurashima Electric and Control System Engineering Course Faculty of Advanced Engineering Maizuru National College of Technology 234 Aza Shiroya Maizuru Kyoto 625-8511 Japan Department of Electrical and Electronic Information Engineering Toyohashi University of Technology 1-1 Hibarigaoka Tenpaku Toyohashi Aichi 441-8580 Japan Application and Technical Section ELIONIX INC. 3-7-6 Motoyokoyama Hachioji Tokyo 192-0063 Japan Research Center for Ubiquitous MEMS and Micro Engineering AIST 1-2-1 Namiki Tsukuba Ibaraki 305-8564 Japan

The fabrication of diamond-like carbon (DLC) micro-gear by room temperature curing nanoimprint lithography (RTC-NIL) using glass-like carbon (GC) molds as applications to the DLC-based medical MEMS (Micro Electronic Mechanical systems) was investigated. The DLC film which has excellent properties similar to chemical vapor deposited (CVD) diamond films was used as the patterning material. We propose GC as mold material because GC has higher etching selectivity than a diamond film. The etching selectivity of polysiloxane film against a GC substrate is about 5 times as high as that of a diamond film. Therefore we fabricated the GC molds that have micro-gear patterns with 30 µm-tip diameter and 500 nm-tooth thickness. We carried out the RTC-NIL process using the GC micro-gear molds under the following optimum conditions. 1 min-time from spin-coating to imprint: t1, 0.5 MPa-imprinting pressure: P and 5 min-holding time: t2, and then the imprinted polysiloxane pattern on DLC film was processed with an electron cyclotron resonance (ECR) oxygen ion shower. However, we were not able to fabricate micro-gear patterns in high accuracy because of a remaining residual layer on the DLC film. Therefore we propose the removing process for the residual layer with trifluoromethane (CHF3) ion shower under the optimum conditions of 300 eV-ion energy and 4 min-etching time. As a result, we succeeded to fabricate concave DLC-based micro-gear patterns in high accuracy which has 30 µm-tip diameter and 1 µm-depth.

关键词： diamond ion-beam processing microelectro-mechanical (MEMS)

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Adhesion of oxide layer to metal-doped aluminum hydride surface: Density functional calculations

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AIP Conference Proceedings 2017年第1期1865卷

作者： Tomoki Takezawa Junichi Itoi Takashi Kannan 1Dept. of Electrical and Computer Engineering National Institute of Technology Maizuru College 234 Aza Shiroya Maizuru Kyoto 625-8511 JAPAN 2Electrical-Control System Engineering Course Faculty of Advanced Engineering National Institute of Technology Maizuru College 234 Aza Shiroya Maizuru Kyoto 625-8511 JAPAN

The density functional theory (DFT) calculations were carried out to evaluate the adhesion energy of the oxide layer to the metal-doped surface of hydrogen storage material, aluminum hydride (alane, AlH3). The total energy calculations using slab model revealed that the surface doping of some metals to aluminum hydride weakens the adhesion strength of the oxide layer. The influence of titanium, iron, cobalt, and zirconium doping on adhesion strength were evaluated. Except for iron doping, the adhesion strength becomes weak by the doping.

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