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检索条件"机构=2Logic Technology Development"
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Publisher's Note: “Defect-induced bandgap narrowing in low-k dielectrics” [Appl. Phys. Lett. 107, 082903 (2015)]
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Applied Physics Letters 2015年 第13期107卷
作者: X. Guo H. Zheng S. W. King V. V. Afanas'ev M. R. Baklanov J.-F. de Marneffe Y. Nishi J. L. Shohet 1Plasma Processing & Technology Laboratory and Department of Electrical and Computer Engineering University of Wisconsin-Madison Madison Wisconsin 53706 USA 2Logic Technology Development Intel Corporation Hillsboro Oregon 97124 USA 3Department of Physics University of Leuven B-3001 Leuven Belgium 4IMEC Kapeldreef 75 B-3001 Leuven Belgium 5Department of Electrical Engineering Stanford University Stanford California 94305 USA
This article was originally published online on 26 August 2015 with the space missing in the name of the sixth author. The name is correct as it appears above.
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