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Nanofabrication of Inter-digitized Graphene Devices by Resist-free Stencil Lithography

Nanofabrication of Inter-digitized Graphene Devices by Resis...

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The 6th International Conference on Nanoscience and Technology, China 2015 (第六届中国国际纳米科学技术会议)

作者： Junjie Li Yifang Chen Nanolithography and Application Research Group State Key Lab of Asic and SystemFudan UniversityShanghaiChina

Stencil lithography(SL)is a high resolution shadow mask technique that allows the patterning of structures and devices such as metallic nano-dots,nanowires and NEMS [1].Compared to other techniques such as EBL,NIL and DUV/EUV lithography,SL has important advantages of not requiring any resists or light/e-beam exposure to avoid potential damage on the lattice structures of *** on this motivation,this work attempts to apply SL for the fabrication of interdigitated electrodes as a comb shape on *** overall comb size is 60 μm.

关键词： stencil lithography photoconductive sensor interdigitated electrodes graphene

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A scalable and reconfigurable 2.5D integrated multicore processor on silicon interposer

A scalable and reconfigurable 2.5D integrated multicore proc...

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IEEE Custom Integrated Circuits Conference, CICC 2015

作者： Lin, Jie Zhu, Shikai Yu, Zhiyi Xu, Dongjun Manoj, P. D. Sai Yu, Hao State Key Lab. of ASIC and System Fudan University Shanghai201203 China SYSU-CMU Joint Institute of Engineering Sun Yat-sen University Guangzhou510006 China School of EEE Nanyang Technological University Singapore639798 Singapore

ISBN: (纸本)9781479986828

This paper presents a novel 2.5D multicore processor which consists of 3 distinct silicon dies: a processor die with 8 MIPS-cores, a 16kB SRAM die, and an accelerator die for multimedia and communication applications. These dies are interconnected into multi-modes, like core-core (up to 32 cores), core-memory (4x storage capacity) and core-accelerator (4.4x speedup in H.264 decoder), to establish a scalable and reconfigurable platform with less tape-out die area cost. A pair of 8Gbps SerDes is custom designed for each of the 12 inter-die communication channels, achieving a 2.5D I/O bandwidth of 24GB/s. The processor was implemented in GF 65nm process, and operates at 500MHz under 1.2V supply, with 1.08W power dissipation. © 2015 IEEE.

关键词： Dies

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Fast Parallel Extract-Shift and Parallel Deposit-Shift in General-Purpose Processors

Fast Parallel Extract-Shift and Parallel Deposit-Shift in Ge...

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Symposia and Workshops on Ubiquitous, Autonomic and Trusted Computing, UIC-ATC

作者： Wei Li Zhongxiang Chang Xiao Feng Zibin Dai State-Key lab of ASIC and System Fudan University Shanghai China Institue of Information Science and Technology ZhengZhou China

ISBN: (纸本)9781467372121

This paper describes a new basis for the implementation of the extract-shift and deposit-shift functional units in microprocessors that can implement new advanced bit manipulations as well as standard shift, extract and deposit operations. Our design is based on the inverse butterfly (butterfly) data path circuits, rather than omega-flip, crossover and crossbar designs used. We show how this new unit can implement the standard shift, rotate, extract and deposit operations, as well as more advanced extract-shift and deposit-shift operations. Furthermore, it can perform important new kinds of even more advanced bit manipulation instructions like arbitrary bit permutations, bit gather (or parallel extract-shift), and bit scatter (or parallel deposit-shift) instructions. Thus, our new functional unit performs the functionality of two functional units -- the basic shifter and the advanced bit manipulation functional unit, while having a less latency and area than that of the shift-permute functional unit.

关键词： Data mining Routing Program processors Silicon Switches Algorithm design and analysis Hardware

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Nanofabrication and Optical Property of Submicron Gold Nanopillar Array in both Visible and Near-Infrared Spectra

Nanofabrication and Optical Property of Submicron Gold Nanop...

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The 6th International Conference on Nanoscience & Technology, China 2015

作者： Yaqi Ma Jianpeng Liu Sichao Zhang Jinhai Shao Yifang Chen Nanolithogrophy and Application Research Group State Key Lab of ASIC and System School of Information Science and EngineeringFudan University

Local surface plasmonic resonance(LSPR) existing in noble metallic nanostructures, which is caused by the resonant excitation of collective oscillations between the surface free electrons in metallic nanostructures with specific frequency of light, is very important for the development of novel nanoscopic bio/chemosensors. Especially for anistropic nanostructures, such as sub-wavelength gold nano pillars, the high quality factors and sensitivity comparable to conventional surface plasmonic resonance(SPR) sensors should be able to provide us with broad prospects in various applications. According to our previous work [1], in order to improve the sensitivity and quality factors of gold nano pillars as LSPR sensor, ultra-high and well-ordered gold nano pillars with extremely small gaps are in great need. As a matter of fact, our numerical simulations by finite-difference time-domain(FDTD) method suggest that, a 3D LSPR system induced by sub-wavelength gold nano pillars other than traditional 2D system can improve the quality of LSPR sensor by local electromagnetic field enhancement at the top of the pillars as well as the longitude direction. However, neither traditional chemical synthesis nor porous anodized aluminum oxide(AAO) film template method has succeeded in the fabrication of gold nano pillars with high aspect ratio. In our work, we have developed an effective top-down method combined with high resolution electron beam lithography(EBL) and electroplating process for the nanofabrication of sub-wavelength gold pillars with the height up to 2.6 mm and various gaps ranging from 20 nm to 100 nm. The optical measurements suggest a sensitivity up to 128.5 nm/RIU in visible wavelength, and our numerical simulations also predict high sensitivity over 2000 nm/RIU in near-infrared wavelength. Both optical measurements and numerical simulations suggest great potential for ultra-high gold pillars with extremely small gaps as LSPR sensors in visible and near-infrared area.

关键词： local surface plasmonic resonance,electron beam lithography,sub-wavelength,ultra-high,sensors

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A High-Throughput Processor for Dual-Field Elliptic Curve Cryptography with Power Analysis Resistance

A High-Throughput Processor for Dual-Field Elliptic Curve Cr...

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Symposia and Workshops on Ubiquitous, Autonomic and Trusted Computing, UIC-ATC

作者： Wei Li Xiaoyang Zeng Xiao Feng Zibin Dai State-Key lab of ASIC and System Fudan University Shanghai China Institue of Information Science and Technology ZhengZhou China

ISBN: (纸本)9781467372121

In this paper, a mixture of VLIW and vector architecture of ECC processor is proposed to perform either prime field GF(p) operations or binary field GF(2m) operations for arbitrary prime numbers and irreducible polynomials. Besides, an application specific instruction set for ECC is presented to support parallel processing with VLIW instruction structure features and vector register addressing modes. Moreover, a new randomized clock cycle's insertion technique in regular calculation is designed against SPA and DPA attacks with 3% area and 4% power overhead. After implemented in 65-nm CMOS process, our proposed 521-bit dual field elliptic curve cryptographic processor can perform scalar multiplication in 1.3 ms over GF(p521) and 0.94 ms over GF(2521). Our ECC processor chip is advantageous not only in terms of functionality, scalability, and performance but also in protection against power-analysis attacks.

关键词： Registers Algorithm design and analysis Elliptic curve cryptography Clocks Schedules Throughput Hardware

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Nanofabrication of 100nm radial nanoslits in Au by a novel PMMA/NEB bilayer technique for manipulating vectorial optical field

Nanofabrication of 100nm radial nanoslits in Au by a novel P...

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The 6th International Conference on Nanoscience & Technology, China 2015

作者： XiaQi Huang Jinhai Shao Chialin Tsou Sichao Zhang Bingrui Lu Yifang Chen Nanolithography and Application Research Group State key lab of Asic and SystemSchool of Information Science and EngineeringFudan University

Inhomogeneous spatial polarization state of vectorial optical field is of importance in biophotonics, communication, single molecule imaging and optical tweezers etc[1]. It have been reported that the radial sub-wavelength nanoslits can generate vector field due to the surface plasmon polarization effect[2], but fabrication of nanoslits in gold still remains a daunting challenge. To achieve high quality orbital polarization with high extinction, the width of nanoslits should be below wavelength. Conventional fabrication method for such a structure is to employ electron beam lithography(EBL) in negative tone resist with high sensitivity. However, there is always a problem in the lift off process because of the hardness in cured negative tone resists. To overcome this difficulty, a novel EBL process in a bilayer of PMMA/NEB has been developed. The top resist NEB is used to define line-width since the developer for NEB is alkali TMAH, which doesn‘t attack PMMA, NEB lines can be independently replicated on PMMA. A subsequent dry etch in O2 plasma can etched away the PMMA layer using NEB lines as mask, after this step, a deposition of 150-nm thick gold is carried out, followed by a lift off in hot acetone. Radial nanoslits with the width of 100 nm defined by NEB line-width have been successfully fabricated by using this novel process. Optical demonstration of manipulating polarization state by radial slits is under the way. In summary, the brand new concept of EBL combine the merit of positive and negative tone resists, which makes the fabrication of the radial nanoslits become more easily.

关键词： vectorial optical field,radial nanoslits,electron beam lithography,PMMA/NEB bilayer

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Nanofabrication of high aspect ratio optical components for hard X-ray optics

Nanofabrication of high aspect ratio optical components for ...

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The 6th International Conference on Nanoscience & Technology, China 2015

作者： Jianpeng Liu Jinhai Shao Xin Li Sichao Zhang Bingrui Lu Yifang Chen Nanolithography and Application Research Group State key lab of Asic and SystemSchool of Information Science and EngineeringFudan University

Full-field transmission X-ray microscopy(TXM) is widely applied in basic study of science, covering microelectronics, bioscience, organic chemistry, materials science, etc [1]. The key components in X-ray optics are condensers providing an illumination onto the testing samples and the high-resolution zone plate as an objective lens forming a magnified image of the sample [2, 3]. So the high aspect ratio(height/width) condensers and zone plates are very important. In this work, we have conducted systematic processing study of high resolution electron beam lithography to fulfill the tasks for high quality X-ray optic components such as lens(condensers and Fresnel zone plates). In the research, the effects of charge distribution on the resist profile control with high aspect ratio configuration have been both theoretically and experimentally investigated. Monte Carlo(MC) simulation by BEAMER-TRACER-lab simulators supplied by Gen ISys Ltd was first applied to calculate the charge distributions in thick PMMA and the resist profiles after development. In the experiment, we designed a condenser based on number of subfield linear gratings with the same area. Guided by theoretical results, fabrication has been successfully carried out for achieving high aspect ratio condensers with 200 nm outermost width and 50 nm outermost width for Fresnel zone plate on in-house made 100 nm thick Si3N4 membranes. By summary, basic study of EBL for achieving resistprofiles with both ultra small feature dimensions and high aspect ratio has been systematically conducted using Monte Carlo algorithm and processing approach. It is expected that the achieved results are applicable not only in the fabrication of X-ray components for high quality imaging and diffraction, but also any other structures where both high resolution and high aspect ratio are demanded.

关键词： Electron beam lithography.High aspect ratio.Hard x-ray optics

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Nanofabrication of 100nm radial nanoslits in Au by a novel PMMA/NEB bilayer technique for manipulating vectorial optical field

Nanofabrication of 100nm radial nanoslits in Au by a novel P...

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The 6th International Conference on Nanoscience and Technology, China 2015 (第六届中国国际纳米科学技术会议)

关键词： vectorial optical field radial nanoslits electron beam lithography PMMA/NEB bilayer

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Optical behavior in visible frequency through free-standing chiral metamaterial in SiNx membrane

Optical behavior in visible frequency through free-standing ...

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The 6th International Conference on Nanoscience & Technology, China 2015

作者： Bingrui Lu Chen Xu Sichao Zhang Junjie Li Yifang Chen Nanolithography and Application Research Group State key lab of Asic and SystemSchool of Information Science and EngineeringFudan University

Metamaterials are artificially structured media that are engineered for electromagnetic properties such as negative refractive index, giant optical activity and circular dichroism. Applications include multiband circular polarization transformers and wave plates, chirality based sensors etc. Theoretical studies on metamaterials for their enormously strong chiral responses, covers various structural designs such as helical, split ring, combined U- or L-shape, twisted arc, twisted rosette, metallic cut wire structures etc. However, the research on the actual devices is limited because the actual structures are normally generated on a substrate, which interferes with the optical behavior of the metamaterial itself, making it difficult to distinguish the contributions between the two factors. In order to study the optical behavior of the metamaterial, developing a method to create free-standing metamaterial structures is crucial. Here we report a method for free-standing chiral metamaterials on Si Nx membrane. First, a suspended Si Nx membrane of 100 nm thickness is fabricated on a double-side-polished silicon substrate. The Si Nx layer is deposited by LPCVD onto one side of the silicon substrate. On the other side multiple windows in the size of 1 mm by 1 mm are etched through the silicon substrate using KOH chemical with the protection of photoresist, leaving the Si Nx film suspended. Then a JEOL 6300 FS EBL system is used to create chiral patterns in the PMMA resist on the Si Nx membrane. Afterwards, Reactive Ion Etching by Samco RIE system is applied with CHF3 and O2 to etch through the Si Nx membrane to form the stencil mask. After depositing the metal film on top of the etched Si Nx membrane, the free-standing metamaterial structures are created. With this method, free-standing chiral metamaterial structures are generated for optical behavior study within the visible frequency range. This facilitates enhanced experimental research on metamaterial devices in the st

关键词： chiral metamaterial free-standing visible frequency optical behavior

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Nanofabrication and Optical Property of Submicron Gold Nanopillar Array in both Visible and Near-Infrared Spectra

Nanofabrication and Optical Property of Submicron Gold Nanop...

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The 6th International Conference on Nanoscience and Technology, China 2015 (第六届中国国际纳米科学技术会议)

作者： Yaqi Ma Jianpeng Liu Sichao Zhang Jinhai Shao Yifang Chen Nanolithogrophy and Application Research Group State Key Lab of ASIC and SystemSchool of Information Science and EngineeringFudan UniversityChina

关键词： local surface plasmonic resonance electron beam lithography sub-wavelength ultra-high sensors

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