In this paper a novel Gabor filter hardware scheme for the fingerprint image enhancement is presented. For each pixel of the image, we use accurate local frequency and orientation to generate the corresponding convolu...
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In this paper a novel Gabor filter hardware scheme for the fingerprint image enhancement is presented. For each pixel of the image, we use accurate local frequency and orientation to generate the corresponding convolution kernel and thus achieve a better enhancement effect. And compared to the previous works, our design yields a higher throughput which is due to the pipeline techniques. Moreover the proposed design can be reconfigured to fulfill the different requirements. Evaluation results demonstrate that, when convolution kernel size is 11×11, our design can achieve 2MPixels/s @ 250MHz, and equivalent gate count is 63.8k at SMIC 0.13um worst process corner. Indeed, it's very suitable for the embedded fingerprint recognition system.
This paper presents a mobile security SoC to deal with intensive cryptography algorithms for different security protocols. A MlPS-like general processor, a dedicated package processor for fast data package, and multip...
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This paper presents a mobile security SoC to deal with intensive cryptography algorithms for different security protocols. A MlPS-like general processor, a dedicated package processor for fast data package, and multiple security processors for cryptography are integrated in the SoC. Moreover, the performance can be greatly enhanced by the well-designed DTU (Data Transfer Unit), memory architecture and synchronization units. With the help of our MIPS, software of the processors could be programmed flexibly to fulfill the requirements of the different security protocols. A test chip is implemented in SMIC 0.13 urn standard CMOS technology, and its functionality and performance are well verified. It can achieve 565Mbps, 256Mbps, 19Kbps and 16Kbps throughput for AES (128), SHA-1, RSA(1024), ECC (192) respectively.
The properties of ultrathin RuC film and RuC/TaN stack as the Cu diffusion barrier on Si substrate were studied. The results show that the thermal stability of the Cu/RuC/TaN/Si structure is better than that of the Cu...
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In this work, the metal gate effective work function (EWF) modulation for the TiN/Ta/TiN/SiO2/p-Si(100) structure was investigated. Comparing with TiN/SiO2/p-Si(100) structure, after annealing the introduction of Ta c...
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In this work, the effects of electrodes on the performance of sol-gel fabricated ZnO thin film transistor were investigated. The metal with high work function such as Pt was employed as the source-drain electrodes. Co...
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In this work, the effects of electrodes on the performance of sol-gel fabricated ZnO thin film transistor were investigated. The metal with high work function such as Pt was employed as the source-drain electrodes. Compared to the device with Al electrodes as reported before, the transistor fabricated with Pt electrode exhibited lower saturation voltage and current, which was due to the Schottky contact between the Pt electrode and the ZnO film. The result has also been proved by the current-voltage (IV) measurement of the Pt-ZnO-Pt structure. For the Schottky contact between the electrodes and the channel layer, the current saturated when the source was depleted. This kind of device reduced the operation voltage and power dissipations effectively.
In our work, we investigate the effective work function (EWF) modulation of the metal gate about the Al/TiN/SiO 2 /p-Si structure through the thermal annealing. Through different annealing temperature and different an...
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In our work, we investigate the effective work function (EWF) modulation of the metal gate about the Al/TiN/SiO 2 /p-Si structure through the thermal annealing. Through different annealing temperature and different annealing time, we find the EWF of gate electrode shifts from 4.73 eV (suitable for PMOS) to 4.18 eV (suitable for NMOS). We think the diffusion of Al to the interface and the variation of the thin TiN film characteristic are responsible for the decrease of the EWF.
In this paper, We propose a single sideband RoF system based on MSK modulation. One sideband of terahertz wave undergoes the single sideband MSK modulation while the terahertz wave is obtained via carrier-suppression ...
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In this paper, We propose a single sideband RoF system based on MSK modulation. One sideband of terahertz wave undergoes the single sideband MSK modulation while the terahertz wave is obtained via carrier-suppression double sideband modulation. The BER performance achieves 1 × 10 -9 and the sensitivity of the receiver is -17.8dBm with a data rate of 5Gb/s after 40km transmission.
The metal-oxide-semiconductor field-effect transistor (MOSFET) with a surrounding-gate (SG) is investigated. Poisson's Equation (PE) is solved analytically. The analytic expressions for electrical potential and th...
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ISBN:
(纸本)9781424457977
The metal-oxide-semiconductor field-effect transistor (MOSFET) with a surrounding-gate (SG) is investigated. Poisson's Equation (PE) is solved analytically. The analytic expressions for electrical potential and threshold voltage (Vth) are obtained. The results are verified with Sentaurus simulations, good agreement is observed. The Vth model can be used for the integrated circuit designers.
The threshold voltage, Vth of a double-gate SchottkyBarrier (DGSB) source/drain (S/D) metal-oxidesemiconductor field-effect transistor (MOSFET) has been investigated. An analytic expression for surface potential in th...
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ISBN:
(纸本)9781424457977
The threshold voltage, Vth of a double-gate SchottkyBarrier (DGSB) source/drain (S/D) metal-oxidesemiconductor field-effect transistor (MOSFET) has been investigated. An analytic expression for surface potential in the channel is obtained and the results are verified via simulations, good agreement is observed. A new definition for Vth is given, and an analytic expression for V,h is presented. We find that when the silicon thickness, tsi is small (<3 nm), V,h is very sensitive to it. Vth increases dramatically with the decreasing of tsi. Vth also increases with the increasing of the oxide thickness, and with the decreasing of the drain-so'irce voltage. These results can be of great help to the ultralargescale integrated-circuit (ULSI) designers.
This paper presents a theoretical study on the possible realization of high frequency ultrasonic phased array transducer (f>100 MHz) using MEMS technologies. A silicon based lithium niobate (LiNbO3) single crystal ...
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