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Deterioration diagnosis of lead acid battery by phase change of impedance

IEEJ Transactions on Power and Energy 2014年第8期134卷 743-744页

作者： Mizumoto, Iwao Yoshii, Yostumi Oguma, Hiroshi Yamamoto, Keiichiro Maki, Keishirou Department of Electronics and Computer Engineering Toyama National College of Technology 1-2 Ebie-neriya Imizu933-0293 Japan Advanced Course of Control Information System Engineering Program Toyama National College of Maritime Technology 1-2 Ebie-neriya Imizu933-0293 Japan

Deterioration diagnosis of a lead acid battery by phase change between impedance and reactance was measured. The measurement frequency of inner impedance was changed from 100 Hz to 5 kHz. The lead acid battery with 11V open terminal voltage at the charge condition of 60% was judged as enabled in case the phase of impedance was more than 35 degrees when the application limit is CCA 180 Ampere. © 2014 The Institute of Electrical Engineers of Japan.

关键词： Lead acid batteries

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Fabrication of DLC-based micro-gear patterns by room-temperature curing nanoimprint lithography using glass-like carbon molds

Fabrication of DLC-based micro-gear patterns by room-tempera...

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2012 MRS Fall Meeting

作者： Kiyohara, Shuji Ikegaki, Tomu Ito, Chigaya Ishikawa, Ippei Tanoue, Hideto Takikawa, Hirofumi Taguchi, Yoshio Sugiyama, Yoshinari Omata, Yukiko Kurashima, Yuichi Electric and Control System Engineering Course Faculty of Advanced Engineering Maizuru National College of Technology 234 Aza Shiroya Maizuru Kyoto 625-8511 Japan Department of Electrical and Electronic Information Engineering Toyohashi University of Technology 1-1 Hibarigaoka Tenpaku Toyohashi Aichi 441-8580 Japan Application and Technical Section ELIONIX INC 3-7-6 Motoyokoyama Hachioji Tokyo 192-0063 Japan Research Center for Ubiquitous MEMS and Micro Engineering AIST 1-2-1 Namiki Tsukuba Ibaraki 305-8564 Japan

ISBN: (纸本)9781632661043

The fabrication of diamond-like carbon (DLC) micro-gear by room temperature curing nanoimprint lithography (RTC-NIL) using glass-like carbon (GC) molds as applications to the DLC-based medical MEMS (Micro Electronic Mechanical systems) was investigated. The DLC film which has excellent properties similar to chemical vapor deposited (CVD) diamond films was used as the patterning material. We propose GC as mold material because GC has higher etching selectivity than a diamond film. The etching selectivity of polysiloxane film against a GC substrate is about 5 times as high as that of a diamond film. Therefore we fabricated the GC molds that have micro-gear patterns with 30 μm-tip diameter and 500 nm-tooth thickness. We carried out the RTC-NIL process using the GC micro-gear molds under the following optimum conditions. 1 min-time from spin-coating to imprint: t1, 0.5 MPa-imprinting pressure: P and 5 min-holding time: t2, and then the imprinted polysiloxane pattern on DLC film was processed with an electron cyclotron resonance (ECR) oxygen ion shower. However, we were not able to fabricate micro-gear patterns in high accuracy because of a remaining residual layer on the DLC film. Therefore we propose the removing process for the residual layer with trifluoromethane (CHF3) ion shower under the optimum conditions of 300 eV-ion energy and 4 min-etching time. As a result, we succeeded to fabricate concave DLC-based micro-gear patterns in high accuracy which has 30 μm-tip diameter and 1 μm-depth. © 2013 Materials Research Society.

关键词： Molds

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Fabrication of micro-OLEDs by room-temperature curing nanocontact-print lithography using DLC molds

Fabrication of micro-OLEDs by room-temperature curing nanoco...

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2012 MRS Fall Meeting

作者： Ishikawa, Ippei Sakurai, Keisuke Kiyohara, Shuji Okuno, Taisuke Tanoue, Hideto Suda, Yoshiyuki Takikawa, Hirofumi Taguchi, Yoshio Sugiyama, Yoshinari Omata, Yukiko Kurashima, Yuichi Electric and Control System Engineering Course Faculty of Advanced Engineering Maizuru National College of Technology 234 Shiroya Maizuru Kyoto 625-8511 Japan Department of Electrical and Electronic Information Engineering Toyohashi University of Technology 1-1 Hibarigaoka Tenpaku Toyohashi Aichi 441-8580 Japan Application and Technical Section Elionix Inc. 3-7-6 Motoyokoyama Hachioji Tokyo 192-0063 Japan Research Center for Ubiquitous MEMS and Micro Engineering AIST 1-2-1 Namiki Tsukuba Ibaraki 305-8564 Japan

ISBN: (纸本)9781632661043

The microfabrication technologies for organic light-emitting devices (OLEDs) are essential to the fabrication of the next generation of light-emitting devices. The micro-OLEDs fabricated by room-temperature curing nanoimprint lithography (RTC-NIL) using diamond molds have been investigated. However, light emissions from 10 μm-square-dot OLEDs fabricated by the RTC-NIL method have not been uniform. Therefore, we proposed the fabrication of micro-OLEDs by room-temperature curing nanocontact-print lithography (RTC-NCL) using the diamond-like carbon (DLC) mold. The DLC molds used in RTC-NCL were fabricated by an electron cyclotron resonance (ECR) oxygen ion shower with polysiloxane oxide mask in electron beam (EB) lithography technology. The mold patterns are square and rectangle dots which has 10 μm-width, 10 μm-width and 50 μm-length, respectively. The height of the patterns is 500 nm. The DLC molds were used to form the insulating layer of polysiloxane in RTC-NCL. We carried out the RTC-NCL process using the DLC mold under the following optimum conditions: 0.1 MPa-pressure for coating DLC mold with polysiloxane film, 2.1 MPa-pressure for transferring polysiloxane from DLC mold pattern to indium tin oxide (ITO) glass substrate. We deposited N,N′-Diphenyl -N,N′-di (m-tolyl)benzidine (TPD) [40 nm-thickness] as hole transport layer / Tris(8-quinolinolato)aluminum (Alq3) [40 nm-thickness] as electron transport layer / A1 [200 nm-thickness] as cathode on ITO glass substrate as anode in this order. We succeeded in formation of the insulating layer with square and rectangle dots which has 10 μm-width, 10 μm-width and 50 μm-length, and operation of micro-OLEDs by RTC-NIL using DLC molds. © 2012 Materials Research Society.

关键词： Silicones

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A unified optimization method for real-time trajectory generation of mobile robots with kinodynamic constraints in dynamic environment

A unified optimization method for real-time trajectory gener...

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IEEE Conference on Robotics, Automation and Mechatronics

作者： Wenhao Luo Jun Peng Weirong Liu Jing Wang Wentao Yu Department of Automation Key Laboratory of System Control And Information Processing Shanghai China School of Information Science and Engineering Hunan Engineering Laboratory for Advanced Controland Intelligent Automation Changsha China Computer Engineering Program Bethune-Cookman University Daytona Beach FL USA

This paper presents an efficient analytic method for a mobile robot to determine a collision-free trajectory with unified optimization. The robot kinodynamic constraints and the geometric constraints due to obstacles are addressed by considering a set of constrained inequalities from parameterized trajectories model. Two optimal performance matrices are employed to assess optimization problems. Particularly, both the constraints and performance functions are incorporated by similar forms in terms of trajectory parameters, which thereby can be considered in a uniform way. A parameter space of adjustable trajectory parameters is constructed to solve the unified optimization problem with constraints and results in more flexible and better optimal performance. The proposed approach is complete and enhances methods of deterministic real-time planning by overcoming typical drawbacks as intermediate configuration, curvature discontinuities, vertical singularities and incomplete optimization. Simulation results verify the validity and superiority of the proposed method.

关键词： Trajectory Robot kinematics Collision avoidance Mobile robots Acceleration Optimization

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Nanofabrication of DLC-dot arrays by room-temperature curing imprint-liftoff method

Nanofabrication of DLC-dot arrays by room-temperature curing...

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2012 MRS Fall Meeting

作者： Kiyohara, Shuji Matta, Shohei Ishikawa, Ippei Tanoue, Hideto Takikawa, Hirofumi Taguchi, Yoshio Sugiyama, Yoshinari Omata, Yukiko Kurashima, Yuichi Electric and Control System Engineering Course Faculty of Advanced Engineering Maizuru National College of Technology 234 Aza Shiroya Maizuru Kyoto 625-8511 Japan Department of Electrical and Electronic Information Engineering Toyohashi University of Technology 1-1 Hibarigaoka Tenpaku Toyohashi Aichi 441-8580 Japan Application and Technical Section Elionix Inc. 3-7-6 Motoyokoyama Hachioji Tokyo 192-0063 Japan Research Center for Ubiquitous MEMS and Micro Engineering AIST 1-2-1 Namiki Tsukuba Ibaraki 305-8564 Japan

ISBN: (纸本)9781632661043

As an application to the nanoemitter, we investigated the nanofabrication of diamond-like carbon (DLC)-dot arrays by room-temperature curing imprint-liftoff (RTCIL) method using aluminum mask. The DLC film which has excellent properties similar to diamond properties was used as the patterning material. A polished glass like carbon (GC) was used as a mold material. The polysiloxane in the state of sticky liquid at room temperature and stable in air exhibits a negative-exposure characteristics. Therefore, the polysiloxane was used as electron beam (EB) resist and oxide mask material in EB lithography, and also used as RTC-imprint resist material. An aluminum was used as oxide metal mask material of liftoff. We have fabricated the GC mold of dot arrays with 5 μm-square and 500 nm-height. We carried out the RTCIL process using the GC mold under the following optimum imprint conditions: 0.5 MPa-imprinting pressure and 5 min- holding time. Aluminum film on the imprinted polysiloxane was prepared by vacuum evaporation method and its thickness is 20 nm. Finally, the polysiloxane patterns were removed with acetone and aluminum mask patterns were fabricated. We found that the maximum etching selectivity of aluminum film against DLC film was as high as 35, which was obtained under an ion energy of 400 eV. Then we processed the patterned aluminum on DLC film with an ECR oxygen ion shower. We fabricated DLC-dot arrays with 5 μm-square and 400 nm-height with an aspect ratio of 0.08. © 2013 Materials Research Society.

关键词： Carbon

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Fabrication of Micro-OLEDs by Room-temperature Curing Nanocontact-print Lithography Using DLC Molds

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MRS Online Proceedings Library (OPL) 2013年第1期1511卷 mrsf12-1511-ee05-03-mrsf12-1511-ee05-03页

作者： Ippei Ishikawa Keisuke Sakurai Shuji Kiyohara Taisuke Okuno Hideto Tanoue Yoshiyuki Suda Hirofumi Takikawa Yoshio Taguchi Yoshinari Sugiyama Yukiko Omata Electric and Control System Engineering Course Faculty of Advanced Engineering Maizuru National College of Technology 234 Shiroya Maizuru Kyoto 625-8511 Japan Department of Electrical and Electronic Information Engineering Toyohashi University of Technology 1-1 Hibarigaoka Tenpaku Toyohashi Aichi 441-8580 Japan Application and Technical Section ELIONIX INC. 3-7-6 Motoyokoyama Hachioji Tokyo 192-0063 Japan

The microfabrication technologiesfor organic light-emitting devices (OLEDs) are essential to the fabrication of the next generation of light-emitting devices. The micro-OLEDs fabricated by room-temperature curing nanoimprint lithography (RTC-NIL) using diamond molds have been investigated. However, light emissions from 10 μm-square-dot OLEDs fabricated by the RTC-NIL method have not been uniform. Therefore, we proposed the fabrication of micro-OLEDs by room-temperature curing nanocontact-print lithography (RTC-NCL) using the diamond-like carbon (DLC) mold. The DLC molds used in RTC-NCL were fabricated by an electron cyclotron resonance (ECR) oxygen ion shower with polysiloxane oxide mask in electron beam (EB) lithography technology. The mold patterns are square and rectangle dots which has 10 µm-width, 10 µm-width and50 µm-length, respectively. The height of the patterns is 500 nm. The DLC molds were used to form the insulating layer of polysiloxane in RTC-NCL. We carried out the RTC-NCL process using the DLC mold under the following optimum conditions: 0.1 MPa-pressure for coating DLC mold with polysiloxane film, 2.1 MPa-pressure for transferring polysiloxane from DLC mold pattern to indium tin oxide (ITO) glass substrate. We deposited N, N'-Diphenyl -N, N'-di (m-tolyl)benzidine (TPD) [40 nm-thickness] as hole transport layer / Tris(8-quinolinolato)aluminum (Alq3) [40 nm-thickness] as electron transport layer / Al [200 nm-thickness] as cathode on ITO glass substrateas anode in this order. We succeeded in formation of the insulating layer with square and rectangle dots which has 10 µm-width,10 µm-width and 50 µm-length, and operation of micro-OLEDs by RTC-NIL using DLC molds.

关键词： ion-beam processing microstructure diamond

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Nanofabrication of DLC-dot Arrays by Room-temperature Curing Imprint-liftoff Method

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MRS Online Proceedings Library (OPL) 2013年第1期1511卷 mrsf12-1511-ee05-02-mrsf12-1511-ee05-02页

作者： Shuji Kiyohara Shohei Matta Ippei Ishikawa Hideto Tanoue Hirofumi Takikawa Yoshio Taguchi Yoshinari Sugiyama Yukiko Omata Yuichi Kurashima Electric and Control System Engineering Course Faculty of Advanced Engineering Maizuru National College of Technology 234 Aza Shiroya Maizuru Kyoto 625-8511 Japan Department of Electrical and Electronic Information Engineering Toyohashi University of Technology 1-1 Hibarigaoka Tenpaku Toyohashi Aichi 441-8580 Japan Application and Technical Section ELIONIX INC. 3-7-6 Motoyokoyama Hachioji Tokyo 192-0063 Japan Research Center for Ubiquitous MEMS and Micro Engineering AIST 1-2-1 Namiki Tsukuba Ibaraki 305-8564 Japan

As an application to the nanoemitter, we investigated the nanofabrication of diamond-like carbon (DLC)-dot arrays by room-temperature curing imprint-liftoff (RTCIL) method using aluminum mask. The DLC film which has excellent properties similar to diamond properties was used as the patterning material. A polished glass like carbon (GC) was used as a mold material. The polysiloxane in the state of sticky liquid at room temperature and stable in air exhibits a negative-exposure characteristics. Therefore, the polysiloxane was used as electron beam (EB) resist and oxide mask material in EB lithography, and also used as RTC-imprint resist material. An aluminum was used as oxide metal mask material of liftoff. We have fabricated the GC mold of dot arrays with 5 µm-square and 500 nm-height. We carried out the RTCIL process using the GC mold under the following optimum imprint conditions: 0.5 MPa-imprinting pressure and 5 min- holding time. Aluminum film on the imprinted polysiloxane was prepared by vacuum evaporation method and its thickness is 20 nm. Finally, the polysiloxane patterns were removed with acetone and aluminum mask patterns were fabricated. We found that the maximum etching selectivity of aluminum film against DLC film was as high as 35, which was obtained under an ion energy of 400 eV. Then we processed the patterned aluminum on DLC film with an ECR oxygen ion shower. We fabricated DLC-dot arrays with 5 µm-square and 400 nm-height with an aspect ratio of 0.08.

关键词： diamond ion-beam processing microstructure

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Fabrication of DLC-Based Micro-Gear Patterns by Room-Temperature Curing Nanoimprint Lithography Using Glass-Like Carbon Molds

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MRS Online Proceedings Library (OPL) 2013年第1期1511卷 mrsf12-1511-ee05-01-mrsf12-1511-ee05-01页

作者： Shuji Kiyohara Tomu Ikegaki Chigaya Ito Ippei Ishikawa Hideto Tanoue Hirofumi Takikawa Yoshio Taguchi Yoshinari Sugiyama Yukiko Omata Yuichi Kurashima Electric and Control System Engineering Course Faculty of Advanced Engineering Maizuru National College of Technology 234 Aza Shiroya Maizuru Kyoto 625-8511 Japan Department of Electrical and Electronic Information Engineering Toyohashi University of Technology 1-1 Hibarigaoka Tenpaku Toyohashi Aichi 441-8580 Japan Application and Technical Section ELIONIX INC. 3-7-6 Motoyokoyama Hachioji Tokyo 192-0063 Japan Research Center for Ubiquitous MEMS and Micro Engineering AIST 1-2-1 Namiki Tsukuba Ibaraki 305-8564 Japan

The fabrication of diamond-like carbon (DLC) micro-gear by room temperature curing nanoimprint lithography (RTC-NIL) using glass-like carbon (GC) molds as applications to the DLC-based medical MEMS (Micro Electronic Mechanical systems) was investigated. The DLC film which has excellent properties similar to chemical vapor deposited (CVD) diamond films was used as the patterning material. We propose GC as mold material because GC has higher etching selectivity than a diamond film. The etching selectivity of polysiloxane film against a GC substrate is about 5 times as high as that of a diamond film. Therefore we fabricated the GC molds that have micro-gear patterns with 30 µm-tip diameter and 500 nm-tooth thickness. We carried out the RTC-NIL process using the GC micro-gear molds under the following optimum conditions. 1 min-time from spin-coating to imprint: t1, 0.5 MPa-imprinting pressure: P and 5 min-holding time: t2, and then the imprinted polysiloxane pattern on DLC film was processed with an electron cyclotron resonance (ECR) oxygen ion shower. However, we were not able to fabricate micro-gear patterns in high accuracy because of a remaining residual layer on the DLC film. Therefore we propose the removing process for the residual layer with trifluoromethane (CHF3) ion shower under the optimum conditions of 300 eV-ion energy and 4 min-etching time. As a result, we succeeded to fabricate concave DLC-based micro-gear patterns in high accuracy which has 30 µm-tip diameter and 1 µm-depth.

关键词： diamond ion-beam processing microelectro-mechanical (MEMS)

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Fabrication of diamond nanopit arrays by room-temperature curing nanoimprint lithography using glass-like carbon molds

Fabrication of diamond nanopit arrays by room-temperature cu...

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2011 MRS Fall Meeting

作者： Kiyohara, Shuji Ito, Chigaya Ishikawa, Ippei Takikawa, Hirofumi Taguchi, Yoshio Sugiyama, Yoshinari Omata, Yukiko Kurashima, Yuichi Electric and Control System Engineering Course Faculty of Advanced Engineering Maizuru National College of Technology 234 Aza Shiroya Maizuru Kyoto 625-8511 Japan Department of Electrical and Electronic Information Engineering Toyohashi University of Technology Toyohashi Aichi 441-8580 Japan Application and Technical Section Elionix Inc. 3-7-6 Motoyokoyama Hachioji Tokyo 192-0063 Japan Department of Mechanical System Engineering University of Yamanashi 4-3-11 Takeda Kofu Yamanashi 400-8511 Japan

ISBN: (纸本)9781605113722

We have proposed the use of glass-like carbon (GC), as mold material because the 27-maximum etching selectivity of polysiloxane film against GC, which was approximately six times larger than that of polysiloxane film against chemical vapor deposited (CVD) diamond film. We have investigated the fabrication of diamond nanopit arrays by room-temperature curing nanoimprint lithography (RTC-NIL) using GC mold, as applications to the emitter and the micro-gear. The polysiloxane has in the state of sticky liquid at room-temperature and negative-exposure characteristic. Therefore, the polysiloxane was used as RTC-imprint resist material, and also used as electron beam (EB) resist (oxide mask) material in EB lithography. We have fabricated the cylindrical GC nanodot mold with 500 nm-diameter, 600 nm-height and 2 μm-pitch. We carried out RTC-NIL using GC mold under the following optimum conditions: time from spin-coating to imprint of 1 min, imprinting pressure of 0.5 MPa and imprinting time of 5 min. Then, we have processed the diamond film with an electron cyclotron resonance (ECR) oxygen ion shower. We have fabricated diamond nanopit array with 250 nm-depth and 500 nm-diameter. The diameter of diamond nanopit pattern was in good agreement with that of GC mold. Moreover, the depth of the diamond nanopit patterns fabricated by RTC-NIL using cylindrical GC mold was three times larger than that using conical diamond mold. © 2012 Materials Research Society.

关键词： Chemical vapor deposition

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Human genome meeting 2016 : Houston, TX, USA. 28 February - 2 March 2016

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Human genomics 2016年第1期10 Suppl 1卷 12页

作者： A. K. Srivastava Y. Wang R. Huang C. Skinner T. Thompson L. Pollard T. Wood F. Luo R. Stevenson R. Polimanti J. Gelernter X. Lin I. Y. Lim Y. Wu A. L. Teh L. Chen I. M. Aris S. E. Soh M. T. Tint J. L. MacIsaac F. Yap K. Kwek S. M. Saw M. S. Kobor M. J. Meaney K. M. Godfrey Y. S. Chong J. D. Holbrook Y. S. Lee P. D. Gluckman N. Karnani A. Kapoor D. Lee A. Chakravarti C. Maercker F. Graf M. Boutros G. Stamoulis F. Santoni P. Makrythanasis A. Letourneau M. Guipponi N. Panousis M. Garieri P. Ribaux E. Falconnet C. Borel S. E. Antonarakis S. Kumar J. Curran J. Blangero S. Chatterjee J. Akiyama D. Auer C. Berrios L. Pennacchio T. R. Donti G. Cappuccio M. Miller P. Atwal A. Kennedy A. Cardon C. Bacino L. Emrick J. Hertecant F. Baumer B. Porter M. Bainbridge P. Bonnen B. Graham R. Sutton Q. Sun S. Elsea Z. Hu P. Wang Y. Zhu J. Zhao M. Xiong David A. Bennett A. Hidalgo-Miranda S. Romero-Cordoba S. Rodriguez-Cuevas R. Rebollar-Vega E. Tagliabue M. Iorio E. D’Ippolito S. Baroni B. Kaczkowski Y. Tanaka H. Kawaji A. Sandelin R. Andersson M. Itoh T. Lassmann Y. Hayashizaki P. Carninci A. R. R. Forrest C. A. Semple E. A. Rosenthal B. Shirts L. Amendola C. Gallego M. Horike-Pyne A. Burt P. Robertson P. Beyers C. Nefcy D. Veenstra F. Hisama R. Bennett M. Dorschner D. Nickerson J. Smith K. Patterson D. Crosslin R. Nassir N. Zubair T. Harrison U. Peters G. Jarvik F. Menghi K. Inaki X. Woo P. Kumar K. Grzeda A. Malhotra H. Kim D. Ucar P. Shreckengast K. Karuturi J. Keck J. Chuang E. T. Liu B. Ji A. Tyler G. Ananda G. Carter H. Nikbakht M. Montagne M. Zeinieh A. Harutyunyan M. Mcconechy N. Jabado P. Lavigne J. Majewski J. B. Goldstein M. Overman G. Varadhachary R. Shroff R. Wolff M. Javle A. Futreal D. Fogelman L. Bravo W. Fajardo H. Gomez C. Castaneda C. Rolfo J. A. Pinto K. C. Akdemir L. Chin S. Patterson C. Statz S. Mockus S. N. Nikolaev X. I. Bonilla L. Parmentier B. King F. Bezrukov G. Kaya V. Zoete V. Seplyarskiy H. Sharpe T. McKee K. Popadin N. Basset-Seguin R. Ben Chaabene M. Andrianova C. Verdan K. Grosdemange O. Sumara M. E JCSRI Greenwood Genetic Center Greenwood USA School of Computing Clemson University Clemson USA Biochemical Genetics Laboratory Greenwood Genetic Center Greenwood USA Department Psychiatry Yale Sch Med and VA CT Healthcare Center West Haven USA Department Genetics Yale Sch Med and VA CT Healthcare Center West Haven USA Department Neurobiology Yale Sch Med and VA CT Healthcare Center West Haven USA Singapore Institute for Clinical Sciences Singapore Singapore National University of Singapore Singapore Singapore University of British Columbia Vancouver Canada KK Women’s and Children’s Hospital Singapore Singapore University of Southampton and University Hospital Southampton NHS Foundation Trust Southampton UK University of Auckland Auckland New Zealand McKusick-Nathans Institute of Genetic Medicine Johns Hopkins University School of Medicine Baltimore USA Esslingen University of Applied Sciences Esslingen Germany German Cancer Research Center Heidelberg Germany Department of Genetic Medicine and Development University of Geneva Medical School Geneva Switzerland Geneva University Hospitals-HUG Service of Genetic Medicine Geneva Switzerland GE3 Institute of Genetics and Genomics of Geneva University of Geneva Medical School Geneva Switzerland South Texas Diabetes and Obesity Institute School of Medicine University of Texas Rio-Grande Valley Edinburg USA South Texas Diabetes and Obesity Institute School of Medicine University of Texas Rio-Grande Valley Brownsville USA Institute of Genetic Medicine Johns Hopkins University Baltimore USA Genomics Division Lawrence Berkeley National Laboratory Berkeley USA Molecular and Human Genetics Baylor College of Medicine Houston USA Department of Translational Medical Sciences Federico II University Naples Italy Metabolon Inc Durham USA Section of Pediatric Neurology and Neuroscience Baylor College of Medicine Houston USA Tawam Hospital Abu Dhabi United Arab Emirates Stanford Medical School Stanford USA Sch

O1 The metabolomics approach to autism: identification of biomarkers for early detection of autism spectrum disorder A. K. Srivastava, Y. Wang, R. Huang, C. Skinner, T. Thompson, L. Pollard, T. Wood, F. Luo, R. Stevenson O2 Phenome-wide association study for smoking- and drinking-associated genes in 26,394 American women with African, Asian, European, and Hispanic descents R. Polimanti, J. Gelernter O3 Effects of prenatal environment, genotype and DNA methylation on birth weight and subsequent postnatal outcomes: findings from GUSTO, an Asian birth cohort X. Lin, I. Y. Lim, Y. Wu, A. L. Teh, L. Chen, I. M. Aris, S. E. Soh, M. T. Tint, J. L. MacIsaac, F. Yap, K. Kwek, S. M. Saw, M. S. Kobor, M. J. Meaney, K. M. Godfrey, Y. S. Chong, J. D. Holbrook, Y. S. Lee, P. D. Gluckman, N. Karnani, GUSTO study group O4 High-throughput identification of specific qt interval modulating enhancers at the SCN5A locus A. Kapoor, D. Lee, A. Chakravarti O5 Identification of extracellular matrix components inducing cancer cell migration in the supernatant of cultivated mesenchymal stem cells C. Maercker, F. Graf, M. Boutros O6 Single cell allele specific expression (ASE) IN T21 and common trisomies: a novel approach to understand DOWN syndrome and other aneuploidies G. Stamoulis, F. Santoni, P. Makrythanasis, A. Letourneau, M. Guipponi, N. Panousis, M. Garieri, P. Ribaux, E. Falconnet, C. Borel, S. E. Antonarakis O7 Role of microRNA in LCL to IPSC reprogramming S. Kumar, J. Curran, J. Blangero O8 Multiple enhancer variants disrupt gene regulatory network in Hirschsprung disease S. Chatterjee, A. Kapoor, J. Akiyama, D. Auer, C. Berrios, L. Pennacchio, A. Chakravarti O9 Metabolomic profiling for the diagnosis of neurometabolic disorders T. R. Donti, G. Cappuccio, M. Miller, P. Atwal, A. Kennedy, A. Cardon, C. Bacino, L. Emrick, J. Hertecant, F. Baumer, B. Porter, M. Bainbridge, P. Bonnen, B. Graham, R. Sutton, Q. Sun, S. Elsea O10 A novel causal methylation network approach to Alzheimer’s

关键词： Pulmonary Arterial Hypertension Oral Squamous Cell Carcinoma Deep Neural Network Autosomal Recessive Polycystic Kidney Disease Whole Genome Bisulfite Sequencing

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