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Fabrication of Micro-OLEDs by Room-temperature Curing Nanocontact-print Lithography Using DLC Molds

MRS Online Proceedings Library (OPL) 2013年第1期1511卷 mrsf12-1511-ee05-03-mrsf12-1511-ee05-03页

作者： Ippei Ishikawa Keisuke Sakurai Shuji Kiyohara Taisuke Okuno Hideto Tanoue Yoshiyuki Suda Hirofumi Takikawa Yoshio Taguchi Yoshinari Sugiyama Yukiko Omata Electric and Control System Engineering Course Faculty of Advanced Engineering Maizuru National College of Technology 234 Shiroya Maizuru Kyoto 625-8511 Japan Department of Electrical and Electronic Information Engineering Toyohashi University of Technology 1-1 Hibarigaoka Tenpaku Toyohashi Aichi 441-8580 Japan Application and Technical Section ELIONIX INC. 3-7-6 Motoyokoyama Hachioji Tokyo 192-0063 Japan

The microfabrication technologiesfor organic light-emitting devices (OLEDs) are essential to the fabrication of the next generation of light-emitting devices. The micro-OLEDs fabricated by room-temperature curing nanoimprint lithography (RTC-NIL) using diamond molds have been investigated. However, light emissions from 10 μm-square-dot OLEDs fabricated by the RTC-NIL method have not been uniform. Therefore, we proposed the fabrication of micro-OLEDs by room-temperature curing nanocontact-print lithography (RTC-NCL) using the diamond-like carbon (DLC) mold. The DLC molds used in RTC-NCL were fabricated by an electron cyclotron resonance (ECR) oxygen ion shower with polysiloxane oxide mask in electron beam (EB) lithography technology. The mold patterns are square and rectangle dots which has 10 µm-width, 10 µm-width and50 µm-length, respectively. The height of the patterns is 500 nm. The DLC molds were used to form the insulating layer of polysiloxane in RTC-NCL. We carried out the RTC-NCL process using the DLC mold under the following optimum conditions: 0.1 MPa-pressure for coating DLC mold with polysiloxane film, 2.1 MPa-pressure for transferring polysiloxane from DLC mold pattern to indium tin oxide (ITO) glass substrate. We deposited N, N'-Diphenyl -N, N'-di (m-tolyl)benzidine (TPD) [40 nm-thickness] as hole transport layer / Tris(8-quinolinolato)aluminum (Alq3) [40 nm-thickness] as electron transport layer / Al [200 nm-thickness] as cathode on ITO glass substrateas anode in this order. We succeeded in formation of the insulating layer with square and rectangle dots which has 10 µm-width,10 µm-width and 50 µm-length, and operation of micro-OLEDs by RTC-NIL using DLC molds.

关键词： ion-beam processing microstructure diamond

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Nanofabrication of DLC-dot Arrays by Room-temperature Curing Imprint-liftoff Method

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MRS Online Proceedings Library (OPL) 2013年第1期1511卷 mrsf12-1511-ee05-02-mrsf12-1511-ee05-02页

作者： Shuji Kiyohara Shohei Matta Ippei Ishikawa Hideto Tanoue Hirofumi Takikawa Yoshio Taguchi Yoshinari Sugiyama Yukiko Omata Yuichi Kurashima Electric and Control System Engineering Course Faculty of Advanced Engineering Maizuru National College of Technology 234 Aza Shiroya Maizuru Kyoto 625-8511 Japan Department of Electrical and Electronic Information Engineering Toyohashi University of Technology 1-1 Hibarigaoka Tenpaku Toyohashi Aichi 441-8580 Japan Application and Technical Section ELIONIX INC. 3-7-6 Motoyokoyama Hachioji Tokyo 192-0063 Japan Research Center for Ubiquitous MEMS and Micro Engineering AIST 1-2-1 Namiki Tsukuba Ibaraki 305-8564 Japan

As an application to the nanoemitter, we investigated the nanofabrication of diamond-like carbon (DLC)-dot arrays by room-temperature curing imprint-liftoff (RTCIL) method using aluminum mask. The DLC film which has excellent properties similar to diamond properties was used as the patterning material. A polished glass like carbon (GC) was used as a mold material. The polysiloxane in the state of sticky liquid at room temperature and stable in air exhibits a negative-exposure characteristics. Therefore, the polysiloxane was used as electron beam (EB) resist and oxide mask material in EB lithography, and also used as RTC-imprint resist material. An aluminum was used as oxide metal mask material of liftoff. We have fabricated the GC mold of dot arrays with 5 µm-square and 500 nm-height. We carried out the RTCIL process using the GC mold under the following optimum imprint conditions: 0.5 MPa-imprinting pressure and 5 min- holding time. Aluminum film on the imprinted polysiloxane was prepared by vacuum evaporation method and its thickness is 20 nm. Finally, the polysiloxane patterns were removed with acetone and aluminum mask patterns were fabricated. We found that the maximum etching selectivity of aluminum film against DLC film was as high as 35, which was obtained under an ion energy of 400 eV. Then we processed the patterned aluminum on DLC film with an ECR oxygen ion shower. We fabricated DLC-dot arrays with 5 µm-square and 400 nm-height with an aspect ratio of 0.08.

关键词： diamond ion-beam processing microstructure

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Fabrication of DLC-Based Micro-Gear Patterns by Room-Temperature Curing Nanoimprint Lithography Using Glass-Like Carbon Molds

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MRS Online Proceedings Library (OPL) 2013年第1期1511卷 mrsf12-1511-ee05-01-mrsf12-1511-ee05-01页

作者： Shuji Kiyohara Tomu Ikegaki Chigaya Ito Ippei Ishikawa Hideto Tanoue Hirofumi Takikawa Yoshio Taguchi Yoshinari Sugiyama Yukiko Omata Yuichi Kurashima Electric and Control System Engineering Course Faculty of Advanced Engineering Maizuru National College of Technology 234 Aza Shiroya Maizuru Kyoto 625-8511 Japan Department of Electrical and Electronic Information Engineering Toyohashi University of Technology 1-1 Hibarigaoka Tenpaku Toyohashi Aichi 441-8580 Japan Application and Technical Section ELIONIX INC. 3-7-6 Motoyokoyama Hachioji Tokyo 192-0063 Japan Research Center for Ubiquitous MEMS and Micro Engineering AIST 1-2-1 Namiki Tsukuba Ibaraki 305-8564 Japan

The fabrication of diamond-like carbon (DLC) micro-gear by room temperature curing nanoimprint lithography (RTC-NIL) using glass-like carbon (GC) molds as applications to the DLC-based medical MEMS (Micro Electronic Mechanical systems) was investigated. The DLC film which has excellent properties similar to chemical vapor deposited (CVD) diamond films was used as the patterning material. We propose GC as mold material because GC has higher etching selectivity than a diamond film. The etching selectivity of polysiloxane film against a GC substrate is about 5 times as high as that of a diamond film. Therefore we fabricated the GC molds that have micro-gear patterns with 30 µm-tip diameter and 500 nm-tooth thickness. We carried out the RTC-NIL process using the GC micro-gear molds under the following optimum conditions. 1 min-time from spin-coating to imprint: t1, 0.5 MPa-imprinting pressure: P and 5 min-holding time: t2, and then the imprinted polysiloxane pattern on DLC film was processed with an electron cyclotron resonance (ECR) oxygen ion shower. However, we were not able to fabricate micro-gear patterns in high accuracy because of a remaining residual layer on the DLC film. Therefore we propose the removing process for the residual layer with trifluoromethane (CHF3) ion shower under the optimum conditions of 300 eV-ion energy and 4 min-etching time. As a result, we succeeded to fabricate concave DLC-based micro-gear patterns in high accuracy which has 30 µm-tip diameter and 1 µm-depth.

关键词： diamond ion-beam processing microelectro-mechanical (MEMS)

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Micro-organic light-emitting devices fabricated by room-temperature curing nanoimprint lithography using diamond molds

Micro-organic light-emitting devices fabricated by room-temp...

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2011 MRS Fall Meeting

作者： Ishikawa, Ippei Okuno, Taisuke Kiyohara, Shuji Taguchi, Yoshio Sugiyama, Yoshinari Omata, Yukiko Kurashima, Yuichi Electric and Control System Engineering Course Faculty of Advanced Engineering Maizuru National College of Technology 234 Shiroya Maizuru Kyoto 625-8511 Japan Application and Technical Section Elionix Inc. 3-7-6 Motoyokoyama Hachioji Tokyo 192-0063 Japan Department of Mechanical System Engineering University of Yamanashi 4-3-11 Takeda Kofu Yamanashi 400-8511 Japan

ISBN: (纸本)9781605113722

Organic light-emitting devices (OLEDs) have attracted a lot of attention as a next generation display. In this study, we fabricated the micro-OLEDs by room-temperature curing nanoimprint lithography (RTC-NIL) using diamond molds. The diamond has superior durability and was used as mold material for RTC-NIL. The diamond molds have been fabricated by electron cyclotron resonance (ECR) oxygen ion shower with polysiloxane oxide mask in the electron beam (EB) lithography technology. We fabricated the diamond mold pattern with 10 μm-square dot. The diamond molds have been used to form an insulating layer in micro-OLEDs. The optimum thickness of N,N′-Diphenyl-N,N′-di(m- tolyl)benzidine (TPD) [hole transport layer], Tris(8-quinolinolato)aluminum (Alq3) [electron transport layer] and aluminum (Al) [cathode] were 40 nm, 40 nm and 200 nm, respectively. We succeeded in formation of insulating layer in micro-OLEDs and operation of micro-OLEDs with 10 μm-square-dot by RTC-NIL using diamond molds. © 2012 Materials Research Society.

关键词： Silicones

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Fabrication of diamond nanopit arrays by room-temperature curing nanoimprint lithography using glass-like carbon molds

Fabrication of diamond nanopit arrays by room-temperature cu...

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2011 MRS Fall Meeting

作者： Kiyohara, Shuji Ito, Chigaya Ishikawa, Ippei Takikawa, Hirofumi Taguchi, Yoshio Sugiyama, Yoshinari Omata, Yukiko Kurashima, Yuichi Electric and Control System Engineering Course Faculty of Advanced Engineering Maizuru National College of Technology 234 Aza Shiroya Maizuru Kyoto 625-8511 Japan Department of Electrical and Electronic Information Engineering Toyohashi University of Technology Toyohashi Aichi 441-8580 Japan Application and Technical Section Elionix Inc. 3-7-6 Motoyokoyama Hachioji Tokyo 192-0063 Japan Department of Mechanical System Engineering University of Yamanashi 4-3-11 Takeda Kofu Yamanashi 400-8511 Japan

ISBN: (纸本)9781605113722

We have proposed the use of glass-like carbon (GC), as mold material because the 27-maximum etching selectivity of polysiloxane film against GC, which was approximately six times larger than that of polysiloxane film against chemical vapor deposited (CVD) diamond film. We have investigated the fabrication of diamond nanopit arrays by room-temperature curing nanoimprint lithography (RTC-NIL) using GC mold, as applications to the emitter and the micro-gear. The polysiloxane has in the state of sticky liquid at room-temperature and negative-exposure characteristic. Therefore, the polysiloxane was used as RTC-imprint resist material, and also used as electron beam (EB) resist (oxide mask) material in EB lithography. We have fabricated the cylindrical GC nanodot mold with 500 nm-diameter, 600 nm-height and 2 μm-pitch. We carried out RTC-NIL using GC mold under the following optimum conditions: time from spin-coating to imprint of 1 min, imprinting pressure of 0.5 MPa and imprinting time of 5 min. Then, we have processed the diamond film with an electron cyclotron resonance (ECR) oxygen ion shower. We have fabricated diamond nanopit array with 250 nm-depth and 500 nm-diameter. The diameter of diamond nanopit pattern was in good agreement with that of GC mold. Moreover, the depth of the diamond nanopit patterns fabricated by RTC-NIL using cylindrical GC mold was three times larger than that using conical diamond mold. © 2012 Materials Research Society.

关键词： Chemical vapor deposition

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Pneumatic rubber actuators for a rehabilitation device to prevent contractures of finger joints

Pneumatic rubber actuators for a rehabilitation device to pr...

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International Conference on Mechatronics and Machine Vision in Practice

作者： Hironari Taniguchi Hidenori Toyooka Tetsuya Minatohara Makoto Fukuda Feifei Zhao Department of Electronics and Control Engineering Tsuyama National College of Technology Tsuyama-city OKAYAMA 708-8509 JAPAN Advanced Mechanical and Control System Engineering Course Tsuyama National College of Technology Tsuyama-city OKAYAMA 708-8509 JAPAN

ISBN: (纸本)9781467316439

There has been increased interest in use of pneumatic actuators in many fields, such as medical care and welfare. In particular, a pneumatic rubber actuator with soft material has many advantages such as low mass, flexibility, safety and user-friendliness. We therefore focus on pneumatic rubber actuators as a drive source of a rehabilitation device. This paper presents pneumatic rubber actuators for a rehabilitation device to prevent contractures of the finger joints. We propose two types of actuators. The fabrication of the actuators was based on molding silicon rubber. The actuators can not only operate in flexion and extension but can also twist and stretch out the finger. The actuators force and motion were characterized at different supply pressures. In addition, we investigated different possible methods of rehabilitation for fingers using the actuators. The metacarpophalangeal (MP) and the proximal interphalangeal (PIP) joint motion -were measured with the supply pressure of 150 kPa. The range of MP/PIP joint motion was from minus 3/9 degrees to 53/55 degrees. It was shown about 40 percent of its normal range. As a result, we confirmed the viability of the actuators for a finger rehabilitation device.

关键词： Pneumatic actuator rehabilitation device preventing contractures. actuators Pneumatic actuators Contracture supply pressures Pneumatic Finger Joint Rehabilitation rubbers Lake Restoration Fingers

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Micro-organic Light-emitting Devices Fabricated by Room-temperature Curing Nanoimprint Lithography Using Diamond Molds

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MRS Online Proceedings Library 2011年第1期1395卷 33-38页

作者： Ippei Ishikawa Taisuke Okuno Shuji Kiyohara Yoshio Taguchi Yoshinari Sugiyama Yukiko Omata Yuichi Kurashima Electric and Control System Engineering Course Faculty of Advanced Engineering Maizuru National College of Technology Maizuru Kyoto Japan Application and Technical Section ELIONIX INC. Hachioji Tokyo Japan Department of Mechanical System Engineering University of Yamanashi Kofu Yamanashi Japan

Organic light-emitting devices (OLEDs) have attracted a lot of attention as a next generation display. In this study, we fabricated the micro-OLEDs by room-temperature curing nanoimprint lithography (RTC-NIL) using diamond molds. The diamond has superior durability and was used as mold material for RTC-NIL. The diamond molds have been fabricated by electron cyclotron resonance (ECR) oxygen ion shower with polysiloxane oxide mask in the electron beam (EB) lithography technology. We fabricated the diamond mold pattern with 10 µm-square dot. The diamond molds have been used to form an insulating layer in micro-OLEDs. The optimum thickness of N,N’-Diphenyl-N,N’-di(m-tolyl)benzidine (TPD) [hole transport layer], Tris(8-quinolinolato)aluminum (Alq3) [electron transport layer] and aluminum (Al) [cathode] were 40 nm, 40 nm and 200 nm, respectively. We succeeded in formation of insulating layer in micro-OLEDs and operation of micro-OLEDs with 10 µm-square-dot by RTC-NIL using diamond molds.

关键词： diamond optoelectronic microelectronics

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Diamond nanopit arrays fabricated by room-temperature nanoimprinting using diamond molds

Diamond nanopit arrays fabricated by room-temperature nanoim...

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2010 MRS Fall Meeting

作者： Kiyohara, Shuji Kumagai, Masaya Taguchi, Yoshio Sugiyama, Yoshinari Omata, Yukiko Kurashima, Yuichi Takikawa, Hirofumi Advanced Faculty of Electric and Control System Engineering Course Maizuru National College of Technology 234 Aza Shiroya Maizuru Kyoto 625-8511 Japan Application and Technical Section ELIONIX Inc. 3-7-6 Motoyokoyama Hachioji Tokyo 192-0063 Japan Department of Mechanical System Engineering University of Yamanashi 4-3-11 Takeda Kofu Yamanashi 400-8511 Japan Department of Electrical and Electronic Information Engineering Toyohashi University of Technology Toyohashi Aichi 441-8580 Japan

ISBN: (纸本)9781605112596

We have investigated the nanopatterning of chemical vapor deposited (CVD) diamond films in room-temperature nanoimprint lithography (RT-NIL), using a diamond nanodot mold. We have proposed the use of polysiloxane as an electron beam (EB) mask and RT-imprint resist materials. The diamond molds of cylinder dot using the RT-NIL process were fabricated with polysiloxane oxide mask in EB lithography technology. The dot in minimum diameter is 500 nm. The pitch between the dots is 2 μm, and dot has a height of about 600 nm. It was found that the optimum imprinting conditions for the RT-NIL : time from spin-coating to imprinting t1 of 1 min , pressure time t2 of 5 min, imprinting pressure P of 0.5 MPa. The imprint depth obtained after the press under their conditions was 500 nm. We carried out the RT-NIL process for the fabrication of diamond nanopit arrays, using the diamond nanodot molds that we developed. The resulting diamond nanopit arrays with 500 nm-diameter and 200 nm-depth after the electron cyclotron resonance (ECR) oxygen ion beam etching were fabricated. The diameter of diamond nanopit arrays was in good agreement with that of the diamond nanodot mold. © 2011 Materials Research Society.

关键词： Silicones

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Fabrication of Diamond Nanopit arrays by Room-temperature Curing Nanoimprint Lithography Using Glass-like Carbon Molds

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MRS Online Proceedings Library 2011年第1期1395卷 27-32页

作者： Shuji Kiyohara Chigaya Ito Ippei Ishikawa Hirofumi Takikawa Yoshio Taguchi Yoshinari Sugiyama Yukiko Omata Yuichi Kurashima Electric and Control System Engineering Course Faculty of Advanced Engineering Maizuru National College of Technology Maizuru Kyoto Japan Department of Electrical and Electronic Information Engineering Toyohashi University of Technology Toyohashi Aichi Japan Application and Technical Section ELIONIX INC. Hachioji Tokyo Japan Department of Mechanical System Engineering University of Yamanashi Kofu Yamanashi Japan

We have proposed the use of glass-like carbon (GC), as mold material because the 27-maximum etching selectivity of polysiloxane film against GC, which was approximately six times larger than that of polysiloxane film against chemical vapor deposited (CVD) diamond film. We have investigated the fabrication of diamond nanopit arrays by room-temperature curing nanoimprint lithography (RTC-NIL) using GC mold, as applications to the emitter and the micro-gear. The polysiloxane has in the state of sticky liquid at room-temperature and negative-exposure characteristic. Therefore, the polysiloxane was used as RTC-imprint resist material, and also used as electron beam (EB) resist (oxide mask) material in EB lithography. We have fabricated the cylindrical GC nanodot mold with 500 nm-diameter, 600 nm-height and 2 µm-pitch. We carried out RTC-NIL using GC mold under the following optimum conditions: time from spin-coating to imprint of 1 min, imprinting pressure of 0.5 MPa and imprinting time of 5 min. Then, we have processed the diamond film with an electron cyclotron resonance (ECR) oxygen ion shower. We have fabricated diamond nanopit array with 250 nm-depth and 500 nm-diameter. The diameter of diamond nanopit pattern was in good agreement with that of GC mold. Moreover, the depth of the diamond nanopit patterns fabricated by RTC-NIL using cylindrical GC mold was three times larger than that using conical diamond mold.

关键词： diamond nanostructure ion-beam processing

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Diamond Nanopit Arrays Fabricated by Room-Temperature Nanoimprinting using Diamond Molds

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MRS Online Proceedings Library 2011年第1期1282卷 117-122页

作者： Shuji Kiyohara Masaya Kumagai Yoshio Taguchi Yoshinari Sugiyama Yukiko Omata Yuichi Kurashima Hirofumi Takikawa Advanced Faculty of Electric and Control System Engineering Course Maizuru National College of Technology Maizuru Japan Application and Technical Section ELIONIX INC. 3-7-6 Motoyokoyama Hachioji Tokyo Japan Department of Mechanical System Engineering University of Yamanashi 4-3-11 Takeda Kofu Yamanashi Japan Department of Electrical and Electronic Information Engineering Toyohashi University of Technology Toyohashi Aichi Japan

关键词： diamond ion-beam processing nanoscale

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