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Diamond Nanopit Arrays Fabricated by Room-Temperature Nanoimprinting using Diamond Molds

MRS Online Proceedings Library 2011年第1期1282卷 117-122页

作者： Shuji Kiyohara Masaya Kumagai Yoshio Taguchi Yoshinari Sugiyama Yukiko Omata Yuichi Kurashima Hirofumi Takikawa Advanced Faculty of Electric and Control System Engineering Course Maizuru National College of Technology Maizuru Japan Application and Technical Section ELIONIX INC. 3-7-6 Motoyokoyama Hachioji Tokyo Japan Department of Mechanical System Engineering University of Yamanashi 4-3-11 Takeda Kofu Yamanashi Japan Department of Electrical and Electronic Information Engineering Toyohashi University of Technology Toyohashi Aichi Japan

We have investigated the nanopatterning of chemical vapor deposited (CVD) diamond films in room-temperature nanoimprint lithography (RT-NIL), using a diamond nanodot mold. We have proposed the use of polysiloxane as an electron beam (EB) mask and RT-imprint resist materials. The diamond molds of cylinder dot using the RT-NIL process were fabricated with polysiloxane oxide mask in EB lithography technology. The dot in minimum diameter is 500 nm. The pitch between the dots is 2 μm, and dot has a height of about 600 nm. It was found that the optimum imprinting conditions for the RT-NIL : time from spin-coating to imprinting t1 of 1 min , pressure time t2 of 5 min, imprinting pressure P of 0.5 MPa. The imprint depth obtained after the press under their conditions was 500 nm. We carried out the RT-NIL process for the fabrication of diamond nanopit arrays, using the diamond nanodot molds that we developed. The resulting diamond nanopit arrays with 500 nm-diameter and 200 nm-depth after the electron cyclotron resonance (ECR) oxygen ion beam etching were fabricated. The diameter of diamond nanopit arrays was in good agreement with that of the diamond nanodot mold.

关键词： diamond ion-beam processing nanoscale

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Nanofabrication of DLC-dot arrays by room-temperature curing imprint-liftoff method

Nanofabrication of DLC-dot arrays by room-temperature curing...

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2012 MRS Fall Meeting

作者： Kiyohara, Shuji Matta, Shohei Ishikawa, Ippei Tanoue, Hideto Takikawa, Hirofumi Taguchi, Yoshio Sugiyama, Yoshinari Omata, Yukiko Kurashima, Yuichi Electric and Control System Engineering Course Faculty of Advanced Engineering Maizuru National College of Technology 234 Aza Shiroya Maizuru Kyoto 625-8511 Japan Department of Electrical and Electronic Information Engineering Toyohashi University of Technology 1-1 Hibarigaoka Tenpaku Toyohashi Aichi 441-8580 Japan Application and Technical Section Elionix Inc. 3-7-6 Motoyokoyama Hachioji Tokyo 192-0063 Japan Research Center for Ubiquitous MEMS and Micro Engineering AIST 1-2-1 Namiki Tsukuba Ibaraki 305-8564 Japan

ISBN: (纸本)9781632661043

As an application to the nanoemitter, we investigated the nanofabrication of diamond-like carbon (DLC)-dot arrays by room-temperature curing imprint-liftoff (RTCIL) method using aluminum mask. The DLC film which has excellent properties similar to diamond properties was used as the patterning material. A polished glass like carbon (GC) was used as a mold material. The polysiloxane in the state of sticky liquid at room temperature and stable in air exhibits a negative-exposure characteristics. Therefore, the polysiloxane was used as electron beam (EB) resist and oxide mask material in EB lithography, and also used as RTC-imprint resist material. An aluminum was used as oxide metal mask material of liftoff. We have fabricated the GC mold of dot arrays with 5 μm-square and 500 nm-height. We carried out the RTCIL process using the GC mold under the following optimum imprint conditions: 0.5 MPa-imprinting pressure and 5 min- holding time. Aluminum film on the imprinted polysiloxane was prepared by vacuum evaporation method and its thickness is 20 nm. Finally, the polysiloxane patterns were removed with acetone and aluminum mask patterns were fabricated. We found that the maximum etching selectivity of aluminum film against DLC film was as high as 35, which was obtained under an ion energy of 400 eV. Then we processed the patterned aluminum on DLC film with an ECR oxygen ion shower. We fabricated DLC-dot arrays with 5 μm-square and 400 nm-height with an aspect ratio of 0.08. © 2013 Materials Research Society.

关键词： Carbon

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Fabrication of Diamond-Like Carbon Emitter Patterns by Roomerature Curing Nanoimprint Lithography with PDMS Molds Using Polysiloxane

Fabrication of Diamond-Like Carbon Emitter Patterns by Roome...

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作者： Kiyohara, Shuji Yoshida, Shogo Ishikawa, Ippei Harigai, Toru Takikawa, Hirofumi Watanabe, Masahiko Sugiyama, Yoshinari Omata, Yukiko Kurashima, Yuichi Electric and Electron System Engineering Course Department of Multidisciplinary Engineering Faculty of Advanced Engineering National Institute of Technology 234 Aza Shiroya Maizuru Kyoto625-8511 Japan Department of Electrical and Electronic Information Engineering Toyohashi University of Technology 1-1 Hibarigaoka Tempaku Toyohashi Aichi441-8580 Japan Application and Technical Section Elionix Inc. 3-7-6 Motoyokoyama Hachioji Tokyo192-0063 Japan Research Center for Ubiquitous MEMS and Micro Engineering National Institute of Advanced Industrial Science and Technology 1-2-1 Namiki Tsukuba Ibaraki305-8564 Japan

We investigated the fabrication of diamond-like carbon (DLC) emitter patterns by roomerature curing nanoimprint lithography (RTC-NIL) with polydimethylsiloxane (PDMS) molds using polysiloxane, as an application to the emitter for the next generation flat panel display. The DLC which has excellent properties similar to diamond properties was used as a pattern material. A PDMS was used as a mold material and fabricated by the following optimum conditions of the first curing time at RT for 36 h and the second curing time at the temperature of 150 °C for 15 mins. The polysiloxane is in the state of sticky liquid at RT and stable in air. Therefore, the polysiloxane was used the electron beam (EB) resist and oxide mask material in EB lithography, and also used as RT-imprint material. First, we fabricated the PDMS mold with pit array. Each dot is 5 Âm-diameter and 400 nm-depth. We carried out the RTC-NIL process with PDMS molds using polysiloxane under the following optimum imprint conditions of 0.5 MPa-imprinting pressure, 1.5 min-the time between spin-coat and imprint, and 5 min-imprinting time. Next, the residual layer of imprinted polysiloxane pattern was 450 nm and then was removed with electron cyclotron resonance (ECR) trifluoromethane (CHF3) ion shower under the conditions of 300 eV-ion energy and 3 min-etching time. Then, we processed the imprinted polysiloxane patterns on the DLC film with an ECR oxygen (O2) ion shower under the conditions of 400 eV-ion energy and 12 min-etching time. As a result, we succeeded in fabricating convex DLC emitter patterns with high accuracy which has 5 m-diameter and 500 nm-height. © 2016 Materials Research Society.

关键词： Silicones

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Fabrication of Diamond-Like Carbon Microgears in Roomerature Curing Nanoimprint Lithography Using Ladder-Type Hydrogen Silsesquioxane

Fabrication of Diamond-Like Carbon Microgears in Roomerature...

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作者： Kiyohara, Shuji Shimizu, Yuto Ishikawa, Ippei Harigai, Toru Takikawa, Hirofumi Watanabe, Masahiko Sugiyama, Yoshinari Omata, Yukiko Kurashima, Yuichi Electric and Electron System Engineering Course Department of Multidisciplinary Engineering Faculty of Advanced Engineering National Institute of Technology 234 Aza Shiroya Maizuru Kyoto625-8511 Japan Department of Electrical and Electronic Information Engineering Toyohashi University of Technology 1-1 Hibarigaoka Tempaku Toyohashi Aichi441-8580 Japan Application and Technical Section Elionix Inc. 3-7-6 Motoyokoyama Hachioji Tokyo192-0063 Japan Research Center for Ubiquitous MEMS and Micro Engineering National Institute of Advanced Industrial Science and Technology 1-2-1 Namiki Tsukuba Ibaraki305-8564 Japan

We investigated the fabrication of convex diamond-like carbon (DLC) based microgears in roomerature curing nanoimprint lithography (RTC-NIL) using the ladder-type hydrogen silsesquioxane (HSQ), as an application for the medical micro electro mechanical system (MEMS). The HSQ which is an inorganic polymer of sol-gel system turns into a gel when exposed to air and has the siloxane bond. Therefore, the HSQ was used as RT-imprinting material, and also used as an oxide mask material in electron cyclotron resonance (ECR) oxygen (O2) ion shower etching. We fabricated the polydimethylsiloxane (PDMS) mold with concave microgear patterns which has 40, 50 and 60 μm-tip diameter and 300 nm-depth. We carried out the RTC-NIL process using the PDMS mold under the following optimum conditions of 0.10 MPa-imprinting pressure and 1.0 min-imprinting time. We found that the residual layer of imprinted HSQ microgear patterns was removed with ECR trifluoromethane (CHF3) ion shower under the following conditions of 300 eV-ion energy and 2.0 min-etching time, and then microgears of the HSQ on the DLC film were etched with ECR O2 ion shower under the following conditions of 400 eV-ion energy and 10 min-etching time. As a result, the convex DLC based microgears which have 40, 50 and 60 μm-tip diameter and 400 nm-height were fabricated with high accuracy in the new fabrication process of RTC-NIL. © 2016 Materials Research Society.

关键词： Silicones

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Fabrication of Micro-OLEDs by Room-temperature Curing Nanocontact-print Lithography Using DLC Molds

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MRS Online Proceedings Library (OPL) 2013年第1期1511卷 mrsf12-1511-ee05-03-mrsf12-1511-ee05-03页

作者： Ippei Ishikawa Keisuke Sakurai Shuji Kiyohara Taisuke Okuno Hideto Tanoue Yoshiyuki Suda Hirofumi Takikawa Yoshio Taguchi Yoshinari Sugiyama Yukiko Omata Electric and Control System Engineering Course Faculty of Advanced Engineering Maizuru National College of Technology 234 Shiroya Maizuru Kyoto 625-8511 Japan Department of Electrical and Electronic Information Engineering Toyohashi University of Technology 1-1 Hibarigaoka Tenpaku Toyohashi Aichi 441-8580 Japan Application and Technical Section ELIONIX INC. 3-7-6 Motoyokoyama Hachioji Tokyo 192-0063 Japan

The microfabrication technologiesfor organic light-emitting devices (OLEDs) are essential to the fabrication of the next generation of light-emitting devices. The micro-OLEDs fabricated by room-temperature curing nanoimprint lithography (RTC-NIL) using diamond molds have been investigated. However, light emissions from 10 μm-square-dot OLEDs fabricated by the RTC-NIL method have not been uniform. Therefore, we proposed the fabrication of micro-OLEDs by room-temperature curing nanocontact-print lithography (RTC-NCL) using the diamond-like carbon (DLC) mold. The DLC molds used in RTC-NCL were fabricated by an electron cyclotron resonance (ECR) oxygen ion shower with polysiloxane oxide mask in electron beam (EB) lithography technology. The mold patterns are square and rectangle dots which has 10 µm-width, 10 µm-width and50 µm-length, respectively. The height of the patterns is 500 nm. The DLC molds were used to form the insulating layer of polysiloxane in RTC-NCL. We carried out the RTC-NCL process using the DLC mold under the following optimum conditions: 0.1 MPa-pressure for coating DLC mold with polysiloxane film, 2.1 MPa-pressure for transferring polysiloxane from DLC mold pattern to indium tin oxide (ITO) glass substrate. We deposited N, N'-Diphenyl -N, N'-di (m-tolyl)benzidine (TPD) [40 nm-thickness] as hole transport layer / Tris(8-quinolinolato)aluminum (Alq3) [40 nm-thickness] as electron transport layer / Al [200 nm-thickness] as cathode on ITO glass substrateas anode in this order. We succeeded in formation of the insulating layer with square and rectangle dots which has 10 µm-width,10 µm-width and 50 µm-length, and operation of micro-OLEDs by RTC-NIL using DLC molds.

关键词： ion-beam processing microstructure diamond

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Nanofabrication of DLC-dot Arrays by Room-temperature Curing Imprint-liftoff Method

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MRS Online Proceedings Library (OPL) 2013年第1期1511卷 mrsf12-1511-ee05-02-mrsf12-1511-ee05-02页

作者： Shuji Kiyohara Shohei Matta Ippei Ishikawa Hideto Tanoue Hirofumi Takikawa Yoshio Taguchi Yoshinari Sugiyama Yukiko Omata Yuichi Kurashima Electric and Control System Engineering Course Faculty of Advanced Engineering Maizuru National College of Technology 234 Aza Shiroya Maizuru Kyoto 625-8511 Japan Department of Electrical and Electronic Information Engineering Toyohashi University of Technology 1-1 Hibarigaoka Tenpaku Toyohashi Aichi 441-8580 Japan Application and Technical Section ELIONIX INC. 3-7-6 Motoyokoyama Hachioji Tokyo 192-0063 Japan Research Center for Ubiquitous MEMS and Micro Engineering AIST 1-2-1 Namiki Tsukuba Ibaraki 305-8564 Japan

As an application to the nanoemitter, we investigated the nanofabrication of diamond-like carbon (DLC)-dot arrays by room-temperature curing imprint-liftoff (RTCIL) method using aluminum mask. The DLC film which has excellent properties similar to diamond properties was used as the patterning material. A polished glass like carbon (GC) was used as a mold material. The polysiloxane in the state of sticky liquid at room temperature and stable in air exhibits a negative-exposure characteristics. Therefore, the polysiloxane was used as electron beam (EB) resist and oxide mask material in EB lithography, and also used as RTC-imprint resist material. An aluminum was used as oxide metal mask material of liftoff. We have fabricated the GC mold of dot arrays with 5 µm-square and 500 nm-height. We carried out the RTCIL process using the GC mold under the following optimum imprint conditions: 0.5 MPa-imprinting pressure and 5 min- holding time. Aluminum film on the imprinted polysiloxane was prepared by vacuum evaporation method and its thickness is 20 nm. Finally, the polysiloxane patterns were removed with acetone and aluminum mask patterns were fabricated. We found that the maximum etching selectivity of aluminum film against DLC film was as high as 35, which was obtained under an ion energy of 400 eV. Then we processed the patterned aluminum on DLC film with an ECR oxygen ion shower. We fabricated DLC-dot arrays with 5 µm-square and 400 nm-height with an aspect ratio of 0.08.

关键词： diamond ion-beam processing microstructure

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Fabrication of DLC-Based Micro-Gear Patterns by Room-Temperature Curing Nanoimprint Lithography Using Glass-Like Carbon Molds

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MRS Online Proceedings Library (OPL) 2013年第1期1511卷 mrsf12-1511-ee05-01-mrsf12-1511-ee05-01页

作者： Shuji Kiyohara Tomu Ikegaki Chigaya Ito Ippei Ishikawa Hideto Tanoue Hirofumi Takikawa Yoshio Taguchi Yoshinari Sugiyama Yukiko Omata Yuichi Kurashima Electric and Control System Engineering Course Faculty of Advanced Engineering Maizuru National College of Technology 234 Aza Shiroya Maizuru Kyoto 625-8511 Japan Department of Electrical and Electronic Information Engineering Toyohashi University of Technology 1-1 Hibarigaoka Tenpaku Toyohashi Aichi 441-8580 Japan Application and Technical Section ELIONIX INC. 3-7-6 Motoyokoyama Hachioji Tokyo 192-0063 Japan Research Center for Ubiquitous MEMS and Micro Engineering AIST 1-2-1 Namiki Tsukuba Ibaraki 305-8564 Japan

The fabrication of diamond-like carbon (DLC) micro-gear by room temperature curing nanoimprint lithography (RTC-NIL) using glass-like carbon (GC) molds as applications to the DLC-based medical MEMS (Micro Electronic Mechanical systems) was investigated. The DLC film which has excellent properties similar to chemical vapor deposited (CVD) diamond films was used as the patterning material. We propose GC as mold material because GC has higher etching selectivity than a diamond film. The etching selectivity of polysiloxane film against a GC substrate is about 5 times as high as that of a diamond film. Therefore we fabricated the GC molds that have micro-gear patterns with 30 µm-tip diameter and 500 nm-tooth thickness. We carried out the RTC-NIL process using the GC micro-gear molds under the following optimum conditions. 1 min-time from spin-coating to imprint: t1, 0.5 MPa-imprinting pressure: P and 5 min-holding time: t2, and then the imprinted polysiloxane pattern on DLC film was processed with an electron cyclotron resonance (ECR) oxygen ion shower. However, we were not able to fabricate micro-gear patterns in high accuracy because of a remaining residual layer on the DLC film. Therefore we propose the removing process for the residual layer with trifluoromethane (CHF3) ion shower under the optimum conditions of 300 eV-ion energy and 4 min-etching time. As a result, we succeeded to fabricate concave DLC-based micro-gear patterns in high accuracy which has 30 µm-tip diameter and 1 µm-depth.

关键词： diamond ion-beam processing microelectro-mechanical (MEMS)

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Adhesion of oxide layer to metal-doped aluminum hydride surface: Density functional calculations

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AIP Conference Proceedings 2017年第1期1865卷

作者： Tomoki Takezawa Junichi Itoi Takashi Kannan 1Dept. of Electrical and Computer Engineering National Institute of Technology Maizuru College 234 Aza Shiroya Maizuru Kyoto 625-8511 JAPAN 2Electrical-Control System Engineering Course Faculty of Advanced Engineering National Institute of Technology Maizuru College 234 Aza Shiroya Maizuru Kyoto 625-8511 JAPAN

The density functional theory (DFT) calculations were carried out to evaluate the adhesion energy of the oxide layer to the metal-doped surface of hydrogen storage material, aluminum hydride (alane, AlH3). The total energy calculations using slab model revealed that the surface doping of some metals to aluminum hydride weakens the adhesion strength of the oxide layer. The influence of titanium, iron, cobalt, and zirconium doping on adhesion strength were evaluated. Except for iron doping, the adhesion strength becomes weak by the doping.

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BOTTOM BOUNCE ARRAY SONAR SUBMARINE (BBASS)

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NAVAL ENGINEERS JOURNAL 1989年第5期101卷 59-72页

作者： JACKSON, HA NEEDHAM, WD SIGMAN, DE USN (RET.) Capt. Harry A. Jackson USN (Ret.) is a graduate of the University of Michigan in naval architecture and marine engineering and completed the General Electric Company's 3-year advanced engineering course in nuclear engineering. He has been an independent consulting engineer and participated in projects involving deep submergence waste disposal water purification and submarine design both commercial and government. Cdr. William D. Needham USN is currently assigned as the repair officer of USS Hunley (AS-31) in Norfolk Virginia. He received a regular commission through NROTC at Duke University where he graduated magna cum laude in mechanical engineering. Selected for the Nuclear Power Program he served as a division officer on the USS Grayling (SSN-646) as the production training assistant at the MARE Prototype Reactor in New York and as blue crew engineer of the USS Nathan Hale (SSBN-623) where he completed the requirements to be designated qualified for command of submarines. Following line transfer to the EDO community in 1981 he completed a tour as nuclear repair officer (Code 310) at Norfolk Naval Shipyard and earned master of science in materials science and ocean engineer's degrees at MIT. His awards include the Meritorius Service Medal Navy Commendation Medal Navy Achievement Medal Spear Foundation Award and the Vice Admiral C.R. Bryan Award. Cdr. Needham also holds a master of arts degree in business management from Central Michigan University. Capt. Jackson was technical director of Scorpion Search Phase II. The on-site investigation included descending over 12 000 feet to the bottom of the ocean. He was also supervisor of one of the Navy's largest peacetime shipbuilding and repair programs. His responsibilities included supervision of design production and contract administration. Capt. Jackson was third from the top in managaement of a major shipyard and responsible for design material procurement work order and financial control of two major surface ship prototypes as well a

Anticipated technological advances in the quieting of potential adversary submarines mandate the use of increasingly effective detection systems for U.S. ASW forces. Based on the assumptions that sonar will continue to be the primary means of detection and that the effectiveness of each individual sonar element will not change markedly, one must increase the projected area of the sonar array to improve its capability. The primary SSN mission of anti-submarine warfare will hence require increasing the hull area devoted to the primary sonar detection system. A revolutionary hull form is proposed that maximizes the area available for this purpose. The advantages and disadvantages of this hull form are discussed and feasibility study level design parameters and arrangements presented.

关键词： Submarines

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