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检索条件"机构=Advanced Forming Process R&D Center"
116 条 记 录,以下是1-10 订阅
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New structure transistors for advanced technology node CMOS ICs
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National Science review 2024年 第3期11卷 24-41页
作者: Qingzhu Zhang Yongkui Zhang Yanna Luo Huaxiang Yin Integrated Circuit Advanced Process R&D Center Institute of Microelectronics of Chinese Academy of Sciences(IMECAS) State key Lab of Fabrication Technologies for Integrated Circuits Institute of Microelectronics of Chinese Academy of Sciences School of Integrated Circuits University of Chinese Academy of Sciences
Over recent decades, advancements in complementary metal-oxide-semiconductor integrated circuits(ICs)have mainly relied on structural innovations in transistors. From planar transistors to the fin field-effect transis... 详细信息
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Microstructural Evolution Near Microcrack in AZ31 Mg Alloy Under Electropulses
Microstructural Evolution Near Microcrack in AZ31 Mg Alloy U...
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Magnesium Technology Symposium held at the TMS Annual Meeting and Exhibition, 2024
作者: Yu, Jinyeong Lee, Seong Ho Cheon, Seho Mun, Mooseong Lee, Jeong Hun Lee, Taekyung School of Mechanical Engineering Pusan National University Busan46241 Korea Republic of Advanced Forming Process R&D Group Korea Institute of Industrial Technology Ulsan44413 Korea Republic of
Electropulsing treatment (EPT) is a novel method utilizing the Joule effect for efficient metal heating. EPT's advantages over traditional furnace methods have led to growing interest, particularly its defect-repa... 详细信息
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Effects of the VGS sweep range on the short channel effect in negative capacitance FinFETs
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Science China(Information Sciences) 2024年 第6期67卷 463-464页
作者: Fan ZHANG Zhaohao ZHANG Jiaxin YAO Qingzhu ZHANG Gaobo XU Zhenhua WU Huan LIU Genquan HAN Yan LIU Huaxiang YIN Integrated Circuit Advanced Process R&D Center State Key Lab of Fabrication Technologies for Integrated CircuitsInstitute of Microelectronics of Chinese Academy of Sciences School of Microelectronics Xidian University School of Integrated Circuits University of Chinese Academy of Sciences
As the CMOS technology scaling is reaching fundamental limits,there is a substantial demand for energy-efficient devices with lower operating *** capacitance field-effect transistors (NCFETs) exhibit the capability ... 详细信息
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Fano resonance from Air-mode Photonic Crystal Nanobeam Cavity with 248-nm dUV Lithography
Fano Resonance from Air-mode Photonic Crystal Nanobeam Cavit...
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2023 Opto-Electronics and Communications Conference, OECC 2023
作者: Sun, Fujun Yang, Gang Zhang, Peng Tang, Bo Li, Zhihua Li, Bin Yang, Yan Institute of Microelectronics Integrated Circuit Advanced Process R&D Center of IMECAS Chinese Academy of Sciences Beijing China
Photonic crystal nanobeam cavity (PCNC) is important building block for large-scale photonic integrated circuits (PICs). Nevertheless, most state-of-the-art demonstrations rely on electron beam lithography (EBL). Here... 详细信息
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Nanosheet Count Optimization Strategy of Complementary FET (CFET) Scaling beyond 2 nm from device to Circuit  7
Nanosheet Count Optimization Strategy of Complementary FET (...
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7th International Workshop on advanced Patterning Solutions, IWAPS 2023
作者: He, Hao Li, Shixin Luo, Yanna Xu, Haoqing Yin, Huaxiang Wu, Zhenhua EDA Center Institute of Microelectronics Beijing China Integrated Circuit Advanced Process R&D Center Institute of Microelectronics Beijing China
Complementary Field-Effect Transistors is one of the most promising structures for replacing GAA (Gate-All-Around) field-effect transistors while continuing the advancement of Moore's Law. Thus, optimizing its str... 详细信息
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Analysis of Indium-Silver Alloy Thermal Interface Material reliability and Coverage degradation Mechanisms  26
Analysis of Indium-Silver Alloy Thermal Interface Material R...
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26th Electronics Packaging Technology Conference, EPTC 2024
作者: Kong, MinJae Park, dongHyeon ree, Won Koo, YoungJun Bae, JoHyun Jeong, YeonKi Sohn, EunSook ryu, dongSu Park, dongJoo Park, Kyungrok Advanced Process & Material Project Global R&D center Amkor Technology Korea Inc. 150 Songdomirae-ro Yeonsu-gu Incheon21991 Korea Republic of
Thermal management of microprocessor chips has emerged as a critical issue to ensure high-power operation, especially in high-performance computing (HPC) applications such as artificial intelligence (AI). To effective... 详细信息
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domain Adaptation based Fin Height Measurement for drAM  5
Domain Adaptation based Fin Height Measurement for DRAM
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5th IEEE International Women in Technology Conference, WINTECHCON 2024
作者: Singh, ramya Bagavath Sultania, Gaurav Pedapudi, Lakshmi Narayana Ahn, Joonyoung Song, Je Ung Ahn, Hyomin Smart Equipment Solutions Group Samsung Semiconductor India Research Bangalore India Advanced Process Development Team 4 Semiconductor R&D Center Hwaseong Korea Republic of
Fin Height is critical quality parameter of drAM device and its measurement is destructive process. This measurement process has some disadvantages – destroying wafer/chips, limitation on number of chips for measurem... 详细信息
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design and Simulation of Hinge-type ro-ro (roll-on/roll-off) Ship Car deck Structure  33rd
Design and Simulation of Hinge-type Ro-Ro (Roll-on/Roll-off)...
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33rd International Ocean and Polar Engineering Conference, ISOPE 2023
作者: Kim, Hyun Soo Cho, Min Goo Kang, Sung Wook Kim, Jae Woong Pyo, Chang Min Ji, Chang Wook Park, Jang Ik Precision Mechanical Process and Control R&D Group Korea Institute of Industrial Technology Gyeongsangnam-do Jinju Korea Republic of Automotive Materials & Components R&D Group Korea Institute of Industrial Technology Gwangju Korea Republic of Advanced Forming Process R&D Group Korea Institute of Industrial Technology Ulsan Korea Republic of Research center Dae Lyun Engineering Co. Ltd. Busan Korea Republic of
ro-ro ships can roll-on or roll-off cargo with self-driving power such as passenger cars and trucks, and container cargo on transport devices such as trucks or trailers on a ramp. The representative types of ro-ro shi... 详细信息
来源: 评论
Improve the Breakdown Voltage of Silicon Pixel Sensor With Optimized Multi-Guard rings
Improve the Breakdown Voltage of Silicon Pixel Sensor With O...
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2023 China Semiconductor Technology International Conference, CSTIC 2023
作者: Sun, Peng Xu, Gaobo Fu, Jianyu ding, Mingzheng Yan, Yinan Zhang, Luoyun Yin, Huaxiang Institute of Microelectronics Chinese Academy of Sciences Integrated Circuit Advanced Process R&d Center Beijing100029 China University of Chinese Academy of Sciences Beijing100049 China
The silicon pixel sensor (SPS) for X-ray free electron laser detection requires ultra-high operating voltage. In this paper, for an optimized multi-guard rings, a SPS with ultra-high breakdown voltage and low leakage ... 详细信息
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The advanced Failure Analysis methods based on dynamic Hot Electron Analyzer and Idd3P Measurements for HKMG Sub-nm drAM  50
The Advanced Failure Analysis methods based on Dynamic Hot E...
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50th International Symposium for Testing and Failure Analysis Conference, ISTFA 2024
作者: Lee, Sunah Son, Jihoon Park, Jihoon Jeon, Bohyeon Yun, Seokmin Kim, Chaesoo Kwon, Hagyeong Lee, Jayoung Kim, Sangjun Jung, Ilwoo Park, SeGuen DRAM Process Architecture Team Samsung Electronics Gyeong-gi-do Hwasung-si Korea Republic of Advanced Analysis Science & Engineering Team Semiconductor R&D Center Samsung Electronics Gyeong-gi-do Hwasung-si Korea Republic of
In this paper, we propose an advanced failure analysis method for specifying the location of gate-related fails in the High-k Metal Gate (HKMG) MOSFET. The test sample for this experiment is the sub-15nm technology dr... 详细信息
来源: 评论