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advanced Metallization Conference 2006

作者： Watanabe, K. Miyajima, H. Shimada, M. Nakamura, N. Shimayama, T. Enomoto, Y. Yano, H. Yoda, T. Process and Manufacturing Engineering Center Semiconductor Company Toshiba Corporation Yokohama Kanagawa 235-8522 8 Shinsugita-cho Japan Advanced BEOL Technology Department Center for Semiconductor Research and Development Toshiba Corporation Yokohama Kanagawa 235-8522 8 Shinsugita-cho Japan Semiconductor Technology Development Group Semiconductor Business Unit Sony Corporation Yokohama Kanagawa 235-8522 8 Shinsugita-cho Japan

ISBN: (纸本)9781558999473

In order to realize highly reliable dual damascene (DD) structure for 45 mn node interconnects, porous PAr (Poly-arylene)/porous MSX (Methyl-siloxane) stack structure was developed. Porous MSX film, coated by spin-on technique, is determined by the balance of plasma resistance and mechanical strength. It was clarified that the combination of methylene bridge (Si-CH2-Si) addition and eBeam cure was very effective to achieve highly secure MSX material for via layer. It was concluded that dense differ SOG with high carbon content between p-PAr/p-MSX films relieves the plasma damage of the trench bottom in hybrid DD scheme. Excellent material design of the trench-layer, the via-layer and the differ-layer materials made it possible to realize high performance Cu/low-k interconnects for 45 mn wide.

关键词： Optical interconnects

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Vitrification of a waste molten salt by using a reactive heat source

Vitrification of a waste molten salt by using a reactive hea...

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作者： Kim, Joon-Hyung Kim, In-Tae Park, Hwan-Seo Hyun, Jang-Soo Korea Atomic Energy Research Institute Advanced Fuel Cycle Process Development Group P.O. Box 105 Yuseong Daejeon 305-600 Korea Republic of Energy and Environment Corporation Haechang-ri Paltan-myun Hwasung-si Kyeongki-do 445-914 Korea Republic of

ISBN: (纸本)9780923204822

Waste molten salt mainly consisting of metal chlorides is difficult to directly apply to the conventional vitrification process at a high temperature. A reactive inorganic material synthesized by our research group can convert metal chlorides into thermally stable products at a medium temperature and produces a chlorine gas that is not easy to remove from off gas stream. This study shows a novel method to convert a mixture containing inorganic material and molten salt waste into stable products and simultaneously change chlorine to hydrogen chloride gas that is more favorable to treat at off gas system. The reactive heat source can give a heat necessary for desirable reactions and helps the conversion of chlorine gas into hydrochloric acid gas.

关键词： Vitrification

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Novel Heat Dissipating Cell Scheme for Improving a Reset Distribution in a 512M Phase-change Random Access Memory (PRAM)

Novel Heat Dissipating Cell Scheme for Improving a Reset Dis...

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Symposium on VLSI Technology

作者： D.H. Kang J.S. Kim Y.R. Kim Y.T. Kim M.K. Lee Y.J. Jun J.H. Park F. Yeung C.W. Jeong J. Yu J.H. Kong D.W. Ha S.A. Song J. Park Y.H. Park Y.J. Song C.Y. Eum K.C. Ryoo J.M. Shin D.W. Lim S.S. Park J.H. Kim W.I. Park K.R. Sim J.H. Cheong J.H. Oh J.I. Kim Y.T. Oh K.W. Lee S.P. Koh S.H. Eun N.B. Kim G.H. Koh G.T. Jeong H.S. Jeong Kinam Kim Advanced Technology Development Team 2 Yongin-City Gyunggi-Do South Korea Semi. Business Samsung Electronic Co. Ltd. Yongin-City Gyunggi-Do South Korea CAE Yongin-City Gyunggi-Do South Korea Analytical Engineering Center Samsung Advanced Institute of Technology Yongin-City Gyunggi-Do South Korea Process Analysis & Control Group Memory R&D Div. Yongin-City Gyunggi-Do South Korea

ISBN: (纸本)4900784036;97

Programming with larger current than optimized one is often preferable to ensure a good resistance distribution of high-resistive reset state in high-density phase-change random access memories because it is very effective to increase the resistance of cells to a target value. In this paper, we firstly report that this larger current writing may conversely degrade the reset distribution by reducing the resistance of normal cells via the partial crystallization of amorphous Ge 2 Sb 2 Te 5 and this degradation can be suppressed by designing a novel cell structure with a heat dissipating layer.

关键词： Phase change random access memory Crystallization Degradation Amorphous materials Writing Resistance heating Temperature Phase change materials Switches Cooling

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Abstracts for the 6th Congress of Asian Sleep research Society

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Sleep and Biological Rhythms 2009年第4期7卷 A1-A49页

作者： Seog Ju Kim In Kyoon Lyoo Yu-Jin Lee Do-Un Jeong Hirohiko Kanai Masanori Ookubo Atsushi Yoshimura Masako Okawa Noto Yamada Takeshi Munezawa Yoshitaka Kaneita Yoneatsu Osaki Hideyuki Kanda Tadahiro Ohtsu Masumi Minowa Kenji Suzuki Susumu Hijuchi Hiroyuki Suzuki Takashi Ohida Takashi Abe Yoko Komada Shoichi Asaoka Yuichi Inoue Jin-Seong Lee Sang-Yong Cho Deependra Kumar Hruda N. Mallick Velayudhan M. Kumar Mahesh K. Kaushik Akihiro Karashima Noiihiro Katayama Mitsuyuki Nakao Ravindra P. Nagendra Sathiamma Sulekha Sathyaprabha T. Narasappa Pradhan Nityanadan Bindu M. Kutty M. Nirmala P. N. Ravindra Basavaraj Ramappa Tubaki T. N. Sathyaprabha D. Sudhakar G. S. Lavekar C. R. Chandrashekar Kazuyoshi Kitaoka Mika Shimizu Sachiko Chikahisa Kazuo Yoshizaki Hiroyoshi Sei Jong-Won Kim Misa Takegami Shin Yamazaki Yasuaki Hayashino Rei Ono Koji Otani Miho Sekiguchi Shinichi Konno Shunichi Fukuhara Antonia J. Jakobson Paul Fitzgerald Russell Conduit Xin Shirley Li Siu Ping Joyce Lam Wai Man Mandy Yu Yun Kwok Wing Kazue Okamoto-Mizuno Koh Mizuno Mituaki Yamamoto Shuichiro Shirakawa Hirokazu Doi Mikako Kato Kazuyuki Shinohara Masako Tamaki Shiori Matsuda Katsuo Yamazaki Tadao Hori Keiko Ogawa Kazumi Takahashi Kunio Kitahama Katuo Yamazaki Yoshimasa Koyama Kohei Shioda Yugo Ueda Yukiko Nakamura Clara Inoue Kazushige Goto Sunao Uchida Yuko Morita Yoshiko Honda Tohru Kodama Mari Hagihara Toru Nakajima Masato Saito Yoshihiko Koga Shinichiro Tanaka Hiroshi Yamadera Madoka Takahara Sachiko Suwa Minoru Onozuka Sadao Sato Fumiharu Togo Taiki Komatsu Takeshi Mitani Jongbae Choi Bin Zhang Taeko Sasai Hiromi Mitsubayashi Mitsuhiro Ohtsu Isao Hasegawa Tatsuya Ishii Akira Komori Asami Suzuki Yue Nakahara Mitsuyasu Hiroki Mariko Nakauma Nobuo Someya Tomomasa Ochiai Shouhei Komori Rayleigh Ping-Ying Chiang Zai-Ting Yeh Seong T. Kim Seung H. Yoon Jeong S. Kwon Jong H. Choi Hyung J. Ahn Youngsoo Kim Bolortuya Yunren Lichao Chen Radhika Basheer Robert W. Mccarley Robert E. Strecker Makoto Honda Tetsuaki Arai Miyuki Fukazawa Yutaka Honda Kuniaki T Department of Psychiatry Gachon University of Medicine and Science Incheon Republic of Korea Department of Psychiatry Seoul National University Seoul Republic of Korea Department of Neuropsychiatry and Center for Sleep and Chronobiology Seoul National University Hospital Seoul Republic of Korea Department of Neuropsychiatry Seoul National University Hospital Seoul Republic of Korea Seoul National University Hospital Seoul Republic of Korea Department of Psychiatry Shiga University of Medical Science Otsu Japan Division of Public Health Department of Social Medicine Nihon University School of Medicine Tokyo Japan Department of Public Health Nihon University School of Medicine Tokyo Japan Division of Environmental and Preventive Medicine Department of Social Medicine Faculty of Medicine Tottori University Yonago Japan Department of Hygiene and Preventive Medicine Fukushima Medical University Fukushima Japan Department of Public Health Showa University School of Medicine Tokyo Japan Faculty of Humanities Seitoku University Matsudo Japan Section on Behavioral Science Division of Clinical Research National Hospital Organization Kurihama Alcoholism Center Yokosuka Japan Department of Otolaryngology Second Hospital Fujita Health University Nagoya Japan National Hospital Organization Kurihama Alcoholism Center Kanagawa Japan Metropolitan Police Department Criminal Investigation Laboratory Tokyo Japan Japan Somnology Center Neuropsychiatrie Research Institute Tokyo Japan Department of Somnology Tokyo Medical University Tokyo Japan Japan Somnology Center Neuropsychiatric Research Institute Tokyo Japan Department of Somnology Tokyo Medical and Dental University Tokyo Japan Center for Sleep and Chronobiology Department of Psychiatry and Behavioral Science Seoul National University College of Medicine Seoul Republic of Korea Department of Psychiatry and Behavioral Science Center for Sleep and Chronobiology Seoul Republic of Korea Department of Physiology Al

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Failure analysis system for submicron semiconductor devices

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Hitachi Review 2006年第2期55卷 68-72页

作者： Fukui, Munetoshi Mitsui, Yasuhiro Nara, Yasuhiko Yano, Fumiko Furukawa, Takashi Application Technology Department Advanced Equipment and Systems Sales Division Hitachi High-Technologies Corporation Advanced Microscope Systems Design Department Nanotechnology Products Business Group Hitachi High-Technologies Corporation Failure Analysis Technology Group Process and Device Analysis Engineering Development Department Renesas Technology Corp. Advanced Technology Research Department Central Research Laboratory

Failure analysis of semiconductor device is becoming increasingly difficult as VLSI technology evolves toward smaller features and semiconductor device structures become more complex. Especially considering that the defective area obtained through diagnosis pin-pointing faulty sites is not the same size as the area subjected to physical analysis, and this disparity becomes more pronounced as feature sizes shrink. This prompted us to develop an extremely fine scaled SEM mechanical probing system permitting identification of minute fault sites. The development involved a number of related projects including investigation of a precision probe and stage mechanism that can deal with submicron semiconductor devices, a six-probe mechanism for expanded capabilities of performing inverter measurements and precision single transistor measurements, a probe and sample exchange mechanism that works while under vacuum to achieve high throughput, and a robust CAD navigation system. The system is now ready and available for practical application to 65-nm feature devices, and can be readily adapted to at least the next couple of generation nodes.

关键词： Failure analysis

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Robust 45-nm Node Cu/LJLK Interconnects using Effective Porogen control

Robust 45-nm Node Cu/LJLK Interconnects using Effective Poro...

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IEEE International Conference on Interconnect Technology

作者： Y. Kagawa Y. Enornoto T. Shimayama T. Kameshima M. Okamoto H. Kawashima A. Yamada T. Hasegawa K. Ahyama H. Masuda H. Miyajirna H. Shibata S. Kadornura Semiconductor Technology Development Group Semiconductor Business Unit Sony Corporation Japan Process & Manufacturing Engineering Center Semiconductor Company Toshiba Corporation Japan Advanced CMOS Technology Department SoC Research & Developmmt Center Toshiba Corporation Japan

An integration method using effective porogen control to improve the reliability of 45-nm (hp65) Cu interconnects with ultra low-k (ULK) stacked $porous-polyarylene (PAr)/porous-SiOC (k = 2.3/2.3) - hybrid dual damascene (DD) structures. By optimizing an electron beam (EB) assisted thermal cure, the target amount of porogen left in via inter layer dielectric (ILD) to enhance the etching damage resistance of the film. Quantitative analyses of the porogen amount showed that the remaining porogen was eliminated using a second thermal cure after the DD patterning. We found that the remaining porogen keeps the backbone structure of via-ILD from being damaged by active radicals during trench etching

关键词： Robust control Etching Curing Capacitance CMOS technology Dielectrics Thermal resistance Spine Degradation Plasma applications

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research on advanced diesel aftertreatment devices

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Review of Automotive Engineering 2006年第3期27卷 395-399页

作者： Hara, Shinji Oyama, Koji Kakegawa, Toshiaki Senbokuya, Shigeo Nakamura, Qsamu Shibuya, Masahiko Itoyama, Hiroyuki Okada, Masanori Sugiyama, Gen Hasegawa, Tsutomu Group No. 5 Engine Component Dept. No. 2 Isuzu Motors Limited 8 Tsuchidana Fujisawa Kanagawa 252-8501 Japan Fuel Products R and D Group Fuel Research Laboratory Research and Development Division 8 Chidoricho Naka-ku Yokohama Kanagawa 231-0815 Japan Technical Liaison Dept. Development Management Division Hino Motors Ltd. 3-1-1 Hino-dai Hino Tokyo 191-8660 Japan Fuel Quality Technology Section Manufacturing Department Idemitsu Kosan Co. Ltd. 1280 Kami-humi Sodegaura Chiba 299-0293 Japan Fuels and Process Division Research Center TonenGeneral Sekiyu K.K. 6-1 Ukishima-cho Kawasaki-ku Kawasaki Kanagawa 210-9526 Japan Oil Products Development Section Research and Development Division Showa Shell Sekiyu K.K. 2-3-2 Daiba Minato-ku Tokyo 135-8074 Japan Components Engineering Group Engine Engineering Department No. 3 Powertrain Engineering Division 6-1 Daikoku-cho Tsurumi-ku Yokohama Kanagawa 230-0053 Japan Quality Audit Department Engine Administration Division Power Train Development Group 1 Toyota-cho Toyota Aicht 471-8572 Japan Engine and Environmental Research Division Japan Automobile Research Institute 2530 Karima Tsukuba Ibaraki 305-0822 Japan Fuel Research Laboratory Advanced Technology and Research Institute Japan Petroleum Energy Center 1-4-10 Ohnodai Midori-ku Chiba Chiba 267-0056 Japan

This article reports the effects of fuel sulfur on advanced diesel emission aftertreatment devices as tested by the JCAPII Diesel WG For a Urea SCR system, the NOx emissions reduction performance was compared at low exhaust gas temperature ranges with and without an oxidation catalyst installed in front of the SCR catalyst. For a NOx storage reduction catalyst system, the effect of fuel sulfur content on exhaust emissions and fuel economy during 50,000km driving was examined. © 2006 Society of Automotive Engineers of Japan, Inc. All rights reserved.

关键词： Urea

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Plasma Arc Waste Destruction System (PAWDS) a novel approach to waste elimination aboard ships

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NAVAL ENGINEERS JOURNAL 2006年第3期118卷 139-150页

作者： Kaldas, Aida Picard, Isabelle Chronopoulos, Christos Chevalier, Philippe Carabin, Pierre Holcroft, Gillian Alexander, Gary Spezio, Joseph Mann, Jim Molintas, Henry AIDA KALDAS Eng. is the principal author and Technical Manager at PyroGenesis Inc. She is currently leading the process development team of the Plasma Arc Waste Destruction System for applications on board ships. She holds a Bachelor in Chemical Engineering from Cairo University and a Masters in Engineering Science from the University of Western Ontario. She is a member of “l'Ordre des Ingénieurs du Québec” since 1981. Prior to joining PyroGenesis Inc. Mrs. Kaldas has led several development programs working for Orica (formally ICI Explosives)for over 20 years. Her areas of expertise include process optimization and debottlenecking process modeling and particles processing. ISABELLE PICARD ENG. is a Product Development Engineer at PyroGenesis Inc. She is currently part of the process development team of the Plasma Arc Waste Destruction System for applications on board ships. She holds a Bachelor in Chemical Engineering from “école Polytechnique de Montréal”. She is a member of “l'Ordre des Ingénieurs du Québec” since 1995. Prior to joining PyroGenesis Inc. Mrs. Picard has worked as project leader for several development project related to natural gas applications working for The Natural Gas Technologies Center and as Product Development Engineer for the fuel cell industry working for H Power Canada inc. Her areas of expertise include process development and optimization system integration and equipment sizing. CHRISTOS CHRONOPOULOS Eng. is presently a Product Development Engineer at PyroGenesis Inc. Over the last two years Mr. Chronopoulos has worked on the design and development processes for the treatment of all types of wastes. Prior to joining PyroGenesis Inc. Mr. Chronopoulos worked on process engineering and process development in the Fuel Cell industry for a period of two years and also in the Electronic Plating industry for 4 years. He holds a Bachelor's degree in Chemical Engineering from Sherbrooke University. He is a member of “l'Ordre des Ingénieurs du Québec”. PHILIPPE CHEVALIER Eng. is the

The Plasma Arc Waste Destruction System (PAWDS) uses plasma energy, with temperatures over 5,000 degrees C, to rapidly and efficiently destroy combustible waste aboard ships. PAWDS has proven itself to be a viable alternative to traditional incinerators. >> In September 2003, Carnival Cruise Lines were the first to install a PAWDS aboard their 2,056 passenger (plus 1,000 crew members) capacity, M/S Fantasy cruise ship, to treat ship waste including paper, cardboard, plastics, textiles, wood, and food. As of June 2004, it is being operated and maintained solely by Carnival Cruise Lines personnel and has been permitted to operate in port by the Bahamian port authorities. >> The Navy's next generation aircraft carrier, CVN 21, will be equipped with two FAWDS to process all of the non-food combustible solid waste generated with sufficient system redundancy. The US Navy has been jointly developing the PAWDS with PyroGenesis Inc. over the last 6 years. The development efforts in 2004 and 2005 coupled with lessons learned from operation aboard Carnival's cruise ship have resulted in the identification of additional process and design improvements. Source emission testing by an independent laboratory has also demonstrated that the PAWDS easily meets IMO MARPOL requirements for the destruction of solid waste.

关键词： Waste treatment

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Vibration test and analysis of a 20-kW-class ion engine

Vibration test and analysis of a 20-kW-class ion engine

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41st AIAA/ASME/SAE/ASEE Joint Propulsion Conference and Exhibit

作者： Snyder, John Steven Sengupta, Anita Beatty, John S. O'Connell, Michael R. Monheiser, Jeff Juhlin, Nils Sullivan, Brian Collins, Michael Jet Propulsion Laboratory California Institute of Technology Pasadena CA 91109 United States Aerojet- General Corporation Redmond WA 98073 United States NovaComp Engineering Inc. Bothell WA 98041 United States Materials Research and Design Inc. Wayne PA 19087 United States Advanced Propulsion Technology Group United States Materials Testing and Contamination Control Group Dynamics Environments Group United States Systems and Technology Development United States

Interest in science objectives at the outer planets, specifically at the moons of Jupiter, has spurred the development of high-power electric propulsion systems under the Prometheus program. As a part of this effort, a J PL-led team has designed, developed, and tested the 20kW-class NEXIS ion engine. This engine is derived from the proven 30-cm NSTAR engine design and incorporates carbon-carbon ion optics technology to achieve long life. Following the successful performance demonstration of a laboratory model thruster, a development Model (DM) thruster was designed and fabricated to meet performance and life objectives as well as to survive dynamic and thermal environments. The DM thruster and ion optics were subjected to random vibration testing at protoflight levels in three axes to validate the design and obtain data for dynamic modeling. The NEXIS DM thruster successfully passed the protoflight random vibration testing. Post-test inspection of the thruster showed no damage to any of the components. Ion optics inspection revealed minor adhesive material loss in non-structural bond joints in a few locations. There were no measurable changes in ion optics grid gap or alignment. Measured thruster natural frequencies were similar to, but not in exact agreement with, the predictions of pre-test modeling results using separate dynamically decoupled models. Post-test modeling efforts are underway and preliminary results have demonstrated the necessity of modeling the thruster and ion optics as an integrated unit. Based on the successful results of vibration testing and performance testing, the NEXIS DM thruster design has been demonstrated to be of flight quality. Copyright © 2005 by the American Institute of Aeronautics and Astronautics, Inc.

关键词： Ions

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BEOL process integration technology for 45 nm node porous low-k/copper interconnects

BEOL process integration technology for 45 nm node porous lo...

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IEEE International Conference on Interconnect Technology

作者： N. Matsunaga N. Nakamura K. Higashi H. Yamaguchi T. Watanabe K. Akiyama S. Nakao K. Fujita H. Miyajima S. Omoto A. Sakata T. Katata Y. Kagawa H. Kawashima Y. Enomoto T. Hasegawa H. Shibata Advanced CMOS Technology Dcpartment SoC Research & Development Center Toshiba Corporation Semiconductor Company Japan Process & Manufacturing Engineering Center Toshiba Corporation Semiconductor Company Japan Semiconductor Technology Development Group Sony Corporation Semiconductor Solutions Network Company Japan

Highly reliable BEOL integration technology with porous low-k (k=2.3) was realized by development focusing on plasma damage control and moisture control. A hybrid dielectric scheme with damage resistant porous low-k films and buffer film was applied in view of its inherent advantages for realizing reliable porous low-k integration. A metallization process was developed from the viewpoint of suppressing morphology and adhesion degradation of barrier metal by oxidation. A dummy wiring pattern was also adopted to remove moisture absorbed in porous low-k films. Stress-migration and electromigration satisfying practical reliability were obtained with via size of 75 nm for the first time by utilizing all possible measures for reducing the damage and the moisture.

关键词： Copper Moisture control Plasmas Dielectrics Metallization Morphology Adhesives Degradation Oxidation Wiring

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