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检索条件"机构=Advanced Process Control Research and Development Group"
179 条 记 录,以下是161-170 订阅
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development AND CERTIFICATION OF HSLA-100 STEEL FOR NAVAL SHIP CONSTRUCTION - REPLY
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NAVAL ENGINEERS JOURNAL 1990年 第4期102卷 103-104页
作者: CZYRYCA, EJ LINK, RE WONG, RJ AYLOR, DA MONTEMARANO, TW GUDAS, JP Ernest J. Czyryca:is a research project leader in the Metals and Welding Division of the David Taylor Research Center. He participated in the cooperative education program at the Center with Drexel University graduating in 1965 with a B.S. degree in metallurgical engineering. He has since received a B.S. degree in civil engineering in 1969 from Johns Hopkins University and an M.S. degree in engineering mechanics in 1970 from the Pennsylvania State University. In his career at the Center he has been involved in or managed major development programs in naval structural metals alloys for machinery applications failure analyses and fatigue and fracture research. Richard E. Link:is a mechanical engineer in the Metals and Welding Division of the David Taylor Research Center. He received his B.S. and M.S. degrees in Mechanical Engineering from the University of Maryland in 1984 and 1985 respectively. His work at the Center includes participation in structural and machinery alloy development programs and research in elastic-plastic fracture mechanics analysis methods. He is an active member of ASTM Committee E-24 on Fracture Testing and the Society for Experimental Mechanics. Richard J. Wong:is a metallurgist in the Metals and Welding Division of David Taylor Research Center. He received his B.S. in materials science from the University of California Berkeley in 1979 and a M.S. degree in engineering science from Catholic University in 1984. His work at the Center includes advanced joining processes weld process development and weldability analysis of naval structural materials. Denise A. Aylor:is a materials engineer in the Metals and Welding Division of the David Taylor Research Center. She received her B.S. degree in materials engineering from Virginia Tech in 1980 and her M.S. degree in materials science and engineering from The Johns Hopkins University in 1984. Her work at the Center has focused on corrosion and corrosion control research of various Navy metallic alloys and of composite materials. Thomas W. M
A significant tonnage of HY-100 steel has been used in the structural designs of new ships and submarines for weight reduction, where HT and HY-80 steels had been previously used. A reduction in hull fabrication costs... 详细信息
来源: 评论
COMPUTER-SYSTEM ARCHITECTURE CONCEPTS FOR FUTURE COMBAT SYSTEMS
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NAVAL ENGINEERS JOURNAL 1990年 第3期102卷 43-62页
作者: ZITZMAN, LH FALATKO, SM PAPACH, JL Dr. Lewis H. Zitzman:is the group supervisor of the Advanced Systems Design Group Fleet Systems Department The Johns Hopkins University Applied Physics Laboratory (JHU/APL). He has been employed at JHU/APL since 1972 performing applied research in computer science and in investigating and applying advanced computer technologies to Navy shipboard systems. He is currently chairman of Aegis Computer Architecture Data Bus and Fiber Optics Working Group from which many concepts for this paper were generated. Dr. Zitzman received his B.S. degree in physics from Brigham Young University in 1963 and his M.S. and Ph.D. degrees in physics from the University of Illinois in 1967 and 1972 respectively. Stephen M. Falatko:was a senior engineering analyst in the Combat Systems Engineering Department Comptek Research Incorporated for the majority of this effort. He is currently employed at ManTech Services Corporation. During his eight-year career first at The Johns Hopkins University Applied Physics Laboratory and currently with ManTech Mr. Falatko's work has centered around the development of requirements and specifications for future Navy systems and the application of advanced technology to Navy command and control systems. He is a member of both the Computer Architecture Fiber Optics and Data Bus Working Group and the Aegis Fiber Optics Working Group. Mr. Falatko received his B.S. degree in aerospace engineering with high distinction from the University of Virginia in 1982 and his M.S. degree in applied physics from The Johns Hopkins University in 1985. Mr. Falatko is a member of Tau Beta Pi Sigma Gamma Tau the American Society of Naval Engineers and the U.S. Naval Institute. Janet L. Papach:is a section leader and senior engineering analyst in the Combat Systems Engineering Department Comptek Research Incorporated. She has ten years' experience as an analyst supporting NavSea Spa War and the U.S. Department of State. She currently participates in working group efforts under Aegis Combat System Doctrin
This paper sets forth computer systems architecture concepts for the combat system of the 2010–2030 timeframe that satisfy the needs of the next generation of surface combatants. It builds upon the current Aegis comp... 详细信息
来源: 评论
Formation of reliable Al-Si/Si contacts by chemical oxidation of the contact area  19
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19th European Solid State Device research Conference, ESSDERC 1989
作者: Agricola, F.T. Suijkerbuijk, W.G.M. Sprokel, M.A. Advanced MOS Process Development Group Philips Research Laboratories P.O. Box 80.000 Eindhove5600 JA Netherlands
As feature sizes become smaller than 2 μm, and also contact sizes cross this limit, the resistance and reliability of AlSi to Si contacts are limited by silicon recrystallization from the AlSi into the contacts. This... 详细信息
来源: 评论
The influence of tungsten contact filling on junction quality and contact resistance  19
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19th European Solid State Device research Conference, ESSDERC 1989
作者: Ramselaar, W.L.T.M. Agricola, F.T. Seams, C.A. Advanced MOS Process Development Group Philips Research Laboratories P.O. Box 80.000 Eindhoven5600 JA Netherlands
In this paper the benificial effect of tungsten contact filling is described for two aspects of modern VLSI technology. First, aluminium spiking through thin TiW barrier layers is effectively prevented by W-plugs. Thi... 详细信息
来源: 评论
Enhanced process window for BPSG flow in a salicide process using a LPCVD nitride cap layer  19
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19th European Solid State Device research Conference, ESSDERC 1989
作者: De Vries, R.G.M. Penning Osinski, K. Advanced MOS Process Development Group Philips Research Laboratories P.O. Box 80.000 Eindhoven5600 JA Netherlands
Optimisation of BPSG flow and TiSi2 degradation in a 1.0 μm CMOS process is studied. It is shown that a nitride cap layer allows to flow the BPSG in a steam ambient without excessive degradation of the silicide. A si... 详细信息
来源: 评论
Gate oxide reliability in a sealed interface local oxidation scheme  19
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19th European Solid State Device research Conference, ESSDERC 1989
作者: Voors, I.J. Osinski, K. Vollebregt, F.H.A. Seams, C.A. Advanced MOS Process Development Group Philips Research Laboratories P.O. Box 80 000 Eindhoven5600 JA Netherlands
The influence of process steps, preceding the gate oxidation, on gate oxide integrity in a Sealed Interface Local Oxidation (SILO) scheme, is studied. Bird's beak etchback procedure and double sacrificial oxidatio... 详细信息
来源: 评论
The Influence of Tungsten Contact Filling on Junction Quality and Contact Resistance
The Influence of Tungsten Contact Filling on Junction Qualit...
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European Conference on Solid-State Device research (ESSDERC)
作者: W.L.T.M. Ramselaar F.T. Agricola C.A. Seams Advanced MOS Process Development Group Philips Research Laboratories Eindhoven Netherlands
In this paper the benificial effect of tungsten contact filling is described for two aspects of modern VLSI technology. First, aluminium spiking through thin TiW barrier layers is effectively prevented by W-plugs. Thi... 详细信息
来源: 评论
Gate Oxide Reliability in a Sealed Interface Local Oxidation Scheme
Gate Oxide Reliability in a Sealed Interface Local Oxidation...
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European Conference on Solid-State Device research (ESSDERC)
作者: I. J. Voors K. Osinski F. H. A. Vollebregt C. A. Seams Advanced MOS Process Development Group Philips Research Laboratories Eindhoven Netherlands
The influence of process steps, preceding the gate oxidation, on gate oxide integrity in a Sealed Interface Local Oxidation (SILO) scheme, is studied. Bird's beak etchback procedure and double sacrificial oxidatio... 详细信息
来源: 评论
Enhanced process Window for BPSG Flow in a Salicide process Using a LPCVD Nitride Cap Layer
Enhanced Process Window for BPSG Flow in a Salicide Process ...
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European Conference on Solid-State Device research (ESSDERC)
作者: R.G.M. Penning de Vries K. Osinski Advanced MOS Process Development Group Philips Research Laboratories P.O. Box 80.000 5600 JA Eindhoven The Netherlands Advanced MOS Process Development Group Philips Research Laboratories Eindhoven Netherlands
Optimisation of BPSG flow and TiSi 2 degradation in a 1.0 μm CMOS process is studied. It is shown that a nitride cap layer allows to flow the BPSG in a steam ambient without excessive degradation of the silicide. A ... 详细信息
来源: 评论
control structure determination and enhanced self-tuning using the 'MUSE' AI toolkit
Control structure determination and enhanced self-tuning usi...
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IEE Colloquium on Knowledge Based Environments for Industrial Applications Including Co-Operating Expert Systems in control
作者: R. Corea D. Peel A.J. Morris Advanced Process Control and Knowledge Based Systems Research Group Department of Chemical and Process Engineering University of Newcastle UK
The basis of a comprehensive real-time knowledge based system for control structure design and supervisory control is developed using the MUSE AT toolkit. Representation of control engineering knowledge as procedural ... 详细信息
来源: 评论