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检索条件"机构=Advanced Technology Development Team 1"
58 条 记 录,以下是1-10 订阅
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Dry basal plane graphene wrappings on spherical nickel-rich oxide layered particles for lithium-ion batteries
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Journal of Energy Chemistry 2025年 第5期104卷 10-19页
作者: Van-Chuong Ho Thanh N.Huynh Thi Huong Pham Hyun-seung Kim Hun-Gi Jung Ki Jae Kim Seung-Min Oh Young-Jun Kim Junyoung Mun School of Advanced Materials Science and Engineering Sungkyunkwan UniversitySeobu-roJangan-guSuwon-siGyeonggi-do 2066Republic of Korea SKKU Advanced Institute of Nano Technology(SAINT) Sungkyunkwan UniversitySuwonRepublic of Korea Advanced Batteries Research Center Korea Electronics Technology Institute25Saenari-roSeongnam 13509Republic of Korea Energy Storage Research Center Korea Institute of Science and TechnologySeoul 02792Republic of Korea KIST-SKKU Carbon-Neutral Research Center Sungkyunkwan UniversitySuwon 16419Republic of Korea Department of Energy Science Sungkyunkwan UniversitySuwon 16419Republic of Korea Battery Cell Development Team 1 Research&Development DivisionHyundai Motor Company150Hyundaiyeonguso-roNamyang-eupHwaseong-siGyeonggi-do 18280Republic of Korea Department of Nano Engineering Sungkyunkwan UniversitySuwonRepublic of Korea SKKU Institute of Energy Science and Technology(SIEST) Sungkyunkwan University2066Seobu-roJangan-guSuwon-siGyeonggi-do 16419Republic of Korea
Particle-to-particle dry graphene coatings on Ni-rich layered oxide materials are proposed for highenergy lithium-ion batteries(LIBs)to mitigate the inherent and engineering challenges related to the electrochemically... 详细信息
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development of mine detection system for mobile robot system
Development of mine detection system for mobile robot system
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2008 International Conference on Control, Automation and Systems, ICCAS 2008
作者: Seokhwan, Kim Seung, Park Jeongyeob, Lee Byunghak, Han Changhwan, Choi Advanced Research Team HyundaiRotem Uiwang Korea Republic of Department of Technology Planning 1 Defense Agency for Technology and Quality Korea Republic of System Development Team HyundaiRotem Uiwang Korea Republic of Nuclear Fuel Cycle Remote Technology Lab. Korea Atomic Energy Research Institute Daejeon Korea Republic of
This paper introduces a development process of a manipulator that is installed to a mobile robot system and used to detect explosive ordnance and dispose it. Based on system requirements, its boundary conditions are a... 详细信息
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Vertical structure NAND flash array integration with paired FinFET multi-bit scheme for high-density NAND flash memory application
Vertical structure NAND flash array integration with paired ...
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2008 Symposium on VLSI technology Digest of Technical Papers, VLSIT
作者: Koo, June-Mo Yoon, Tae-Eung Lee, Taehee Byun, Sungjae Jin, Young-Gu Kim, Wonjoo Kim, Sukpil Park, Jongbong Cho, Junseok Choe, Jeong-Dong Lee, Choong-Ho Jong, Jin Lee Han, Je-Woo Kang, Yunseung Park, Sangjun Kwon, Byoungho Jung, Yong-Ju Yoo, Inkyoung Park, Yoondong Samsung Advanced Institute of Technology San 14-1 Giheung-Gu Yongin-City Gyeonggi-Do 449-712 Korea Republic of Advanced Technology Development Team 2 Semiconductor R and D Center Samsung Electronics Co. Ltd. Korea Republic of DRAM Process Architecture Team Semiconductor R and D Center Samsung Electronics Co. Ltd. Korea Republic of Process Development Team Semiconductor R and D Center Samsung Electronics Co. Ltd. Korea Republic of FAB Process Technology Development Group 1 Semiconductor R and D Center Samsung Electronics Co. Ltd. Korea Republic of
Multi-bit Vertical Structure NAND (VsNAND) Flash memories with 32-paired FinFET cell string have been successfully integrated for the first time. Its array integration issues regarding the sub-10nm vertical structure ... 详细信息
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Sub-10 nm gate-all-around CMOS nanowire transistors on bulk Si substrate
Sub-10 nm gate-all-around CMOS nanowire transistors on bulk ...
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2009 Symposium on VLSI technology, VLSIT 2009
作者: Ming, Li Kyoung, Hwan Yeo Sung, Dae Suk Yun, Young Yeoh Kim, Dong-Won Tae, Young Chung Kyung, Seok Oh Lee, Won-Seong Advanced Technology Development Team 1 Semiconductor R and D Center Samsung Electronics Co. Ltd. San 24 Nongseo-Dong Kiheung-Ku Yongin-City Kyoungi-Do 449-711 Korea Republic of
In this paper, sub-10nm gate-all-around (GAA) CMOS silicon nanowire field-effect transistors (SNWFET) on bulk Si substrate are fabricated successfully for the first time with 13-nm-diameter silicon nanowire channel. O... 详细信息
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A Novel Body Effect Reduction Technique to Recessed Channel Transistor Featuring Partially Insulating Layer Under Source and Drain: Application to Sub-50nm DRAM Cell
A Novel Body Effect Reduction Technique to Recessed Channel ...
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2007 IEEE International Electron Devices Meeting (IEDM 2007), vol.2
作者: Jong-Man Park Si-Ok Sohn Jung-Soo Park Sang-Yeon Han Jun-Bum Lee Wookje Kim Chang-Hoon Jeon Shin-Deuk Kim Young-Pil Kim Yong-Seok Lee Satoru Yamada Wouns Yang Donggun Park Won-Seong Lee Advanced Technology Development Team 1 Hwaseong South Korea Process Development Team Samsung Electronics Co. Manufacturing Technology Team 2 Samsung Electronics Co. Hwasung-city Gyeonggi-Do KOREA
We have successfully fabricated fully integrated advanced RCAT (Recess Channel Array Transistor) featuring partially insulating oxide layers in bulk Si substrate, named Partially-insulated-RCAT (Pi-RCAT) to suppress b... 详细信息
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EFFECTS OF MODIFICATION OF THE CARBIDE CHARACTERISTICS THROUGH GRAIN BOUNDARY SERRATION ON CREEP-FATIGUE LIFE IN AUSTENITIC STAINLESS STEELS
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Acta Metallurgica Sinica(English Letters) 2004年 第5期17卷 632-638页
作者: K.J.Kim H.U.Hong K.S.Min S.W.Nam Dept. of Materials Science and Engineering Korea Advanced Institute of Science and Technology 373-1 Guseong-dong Yuseong-gu Deajeon 305-701 KoreaPosco Technical Research Laboratory #1 Koedong-dong Nam-gu Pohang 790-300 KoreaProcess Solution Development Team 1 LCD R&D Center AMLCD Division Device Solution Network Samsung Electronics Co. LTD.San 24 Nongseo-ri Giheung-eup Yongin Gyeonggi-do 449-771 KoreaDept. of Materials Science and Engineering Korea Advanced Institute of Science and Technology 373-1 Guseong-dong Yuseong-gu Deajeon 305-701 Korea
Modification of the carbide characteristics through the grain boundary serration is investigated, using an AISI 316 and 304 stainless steels. In both steels, triangular carbides were observed at straight grain boundar... 详细信息
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Twin silicon nanowire FET (TSNWFET) On SOI with 8 nm silicon nanowires and 25 nm surrounding TiN gate
Twin silicon nanowire FET (TSNWFET) On SOI with 8 nm silicon...
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IEEE SOI-3D-Subthreshold Microelectronics technology Unified Conference (S3S)
作者: Dong-Won Kim Ming Li Kyoung Hwan Yeo Yun Young Yeoh Sung Dae Suk Keun Hwi Cho Kyungseok Oh Won-Seong Lee Advanced Technology Development Team 1 Semiconductor Research & Development Center Samsung Electronics Company Limited Yongin si Gyeonggi South Korea
In this work, fabrication of TSNWFET on SOI with down to 25-nm TiN surrounding gate and 8-nm silicon nanowires is reported with high manufacturability and improved device reliability including reduced junction and gat... 详细信息
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Electrochemical properties of carbon nanotube/silicon composites for anode of Li-ion battery
Electrochemical properties of carbon nanotube/silicon compos...
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Lithium-Ion Batteries: Materials and Devices - 210th ECS Meeting
作者: Eom, J.Y. Kwon, H.S. Department of Materials Science and Engineering Korea Advanced Institute of Science and Technology 373-1 GuSeongDong YuSeongGu DaeJeonSi 305-701 Korea Republic of Development Team Energy Business Division Samsung SDI 508 SungSungDong CheonAnSi ChungCheongNamDo 330-300 Korea Republic of
Multi-walled carbon nanotube (MWNT)/silicon composites with different weight ratios were produced from purified MWNTs and Si powder by high energy ball-milling and then electrochemically inserted with lithium. The cha... 详细信息
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Effect of macropore formation in Pt catalyst supports on the oxidation activity for diesel fuel mist
Effect of macropore formation in Pt catalyst supports on the...
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作者: Uchisawa, Junko Obuchi, Akira Nanba, Tetsuya Hara, Shigeki Caravella, Alessio Tango, Takeru Murakami, Tatsuro Nakagawa, Hideyuki Kogawa, Takahiro Abe, Akira Energy-saving System Team Research Center for New Fuels and Vehicle Technology National Institute of Advanced Industrial Science and Technology 16-1 Onogawa Tsukuba 305-8569 Japan Membrane Separation Processes Group Research Institute for Innovation in Sustainable Chemistry National Institute of Advanced Industrial Science and Technology 1-1-1 Higashi Tsukuba 305-8565 Japan Adsorption Functional Materials Development Group Research and Development Department Mizusawa Industrial Chemicals Ltd. 1-1 Mizusawa Tainai 959-2638 Japan Mitsui Mining and Smelting Co. Ltd. 1013-1 Ageoshimo Ageo 362-0025 Japan
The effect of macropore formation in catalyst supports on the oxidation activity for diesel fuel mist was examined with the goal of improving catalyst efficiency. To investigate the effect on a laboratory scale using ... 详细信息
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Experimental Investigation on Superior PMOS Performance of Uniaxial Strained ≪110≫ Silicon Nanowire Channel By Embedded SiGe Source/Drain
Experimental Investigation on Superior PMOS Performance of U...
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International Electron Devices Meeting (IEDM)
作者: Ming Li Kyoung Hwan Yeo Yun Young Yeoh Sung Dae Suk Keun Hwi Cho Dong-Won Kim Donggun Park Won-Seong Lee Advanced Technology Development Team1 Semiconductor Research and Development Center Samsung Electronics Company Limited Yongin si Gyeonggi South Korea
Strained silicon nanowire transistor with embedded SiGe (e-SG) source/drain is investigated for the first time on experiments. By compressive stress induced by e-SG, PMOS performance is improved by about 85%. -oriente... 详细信息
来源: 评论