In Central Vietnam, the aggregate typically originates from highly acidic rocks containing a significant amount of silicon dioxide (SiO2), leading to poor adhesion quality with virgin asphalt binder. Hence, the asphal...
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Symmetric diblock copolymers undergo a disorder to order transition below a microphase separation transition temperature. In this temperature range the structure is characterized by alternating lamellae of thickness L...
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Symmetric diblock copolymers undergo a disorder to order transition below a microphase separation transition temperature. In this temperature range the structure is characterized by alternating lamellae of thickness L. In thin film geometries, the lamellae are oriented normal to the substrate if there is a preferential interaction between either of the block constituents and the substrate/copolymer or copolymer/vacuum interfaces. Depending on the relation between the film thickness and L, the topography of the film might comprise of holes, islands or spinodal-like structures. We show that in a polystyrene-b-poly(methyl methacrylate) diblock copolymer of molecular weight 20, 000 g/mol, above the microphase separation transition temperature, the topography of the film depends on the thickness. A heirarchy of bicontinuous patterns and holes is observed with increasing film thickness for films thinner than 35 nm.
Symmetric diblock copolymers undergo a disorder to order transition below a microphase separation transition temperature. In this temperature range the structure is characterized by alternating lamellae of thickness L...
Symmetric diblock copolymers undergo a disorder to order transition below a microphase separation transition temperature. In this temperature range the structure is characterized by alternating lamellae of thickness L. In thin film geometries, the lamellae are oriented normal to the substrate if there is a preferential interaction between either of the block constituents and the substrate/copolymer or copolymer/vacuum interfaces. Depending on the relation between the film thickness and L, the topography of the film might comprise of holes, islands or spinodal-like structures. We show that in a polystyrene-b-poly(methyl methacrylate) diblock copolymer of molecular weight 20, 000 g/mol, above the microphase separation transition temperature, the topography of the film depends on the thickness. A heirarchy of bicontinuous patterns and holes is observed with increasing film thickness for films thinner than 35 nm.
The solidification of low molecular weight materials from their melts (in the absence of temperature fields) generally leads to a product with no preferred orientation, independent of the extent or rate of deformation...
The solidification of low molecular weight materials from their melts (in the absence of temperature fields) generally leads to a product with no preferred orientation, independent of the extent or rate of deformation of the melt. The solidification of polymers from a highly deformed melt or solution nearly always leads to a product with preferred molecular orientation. Further, the rate of solidification can be significantly increased by melt deformation. The change in rate, relative to that in a quiescent melt or solution, can be several orders of magnitude [1]. These differences, relative to small-molecule systems, arise from the degree to which orientation and local strain can be maintained in the melt. Due to the long-range connectivity within a polymer molecule, it is possible to impart large extensions to these molecules in the molten state, and significant time is often required for the molecules to relax back to their undistorted, coiled state. If crystallization or glass formation occurs before the chain can relax, an extended molecular configuration can be retained. Thus in the solidification of oriented polymers there exists a competition between the “freezing” of the molecular orientation and the relaxation (re-coiling) of the molecules.
materials used in handheld consumer electronic devices (CEDs), such as cell phones or personal digital assistants, create environmental risks both during procurement and disposal. The increasing global demand for CEDs...
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The surface morphology and structure of AlN deposited by metal organic vapor phase epitaxy (MOVPE) on Si (111) at growth temperatures ranging from 825 to 1175°C was investigated. Transmission electron microscopy ...
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The surface morphology and structure of AlN deposited by metal organic vapor phase epitaxy (MOVPE) on Si (111) at growth temperatures ranging from 825 to 1175°C was investigated. Transmission electron microscopy (TEM), reflection high energy electron diffraction (RHEED), atomic force microscopy (AFM), and secondary ion mass spectrometry (SIMS) techniques were used to study the resulting film structure. Growth at high temperatures but less than ∼1100°C, resulted in a wire texture with some degree of in-plane alignment with (0001)AlN//(111)si′, 〈10¯10〉AlN//〈211〉Si, and 〈1120〉AlN // 〈110〉Si. Deposition at temperatures greater than 1100°C results in single crystal films consisting of domains 60 nm across with an aspect ratio near unity. Growth below 1100°C leads to degraded crystal quality with the grains developing random rotational misalignments around the AlN [0001] axis. Growth at lower temperatures produces islands elongated along the [1120] direction. At the growth temperature of 825°C, the aspect ratio of the islands increased to 3 and a width of 25 nm. Cross-sectional TEM reveals that these islands are faceted due to slow growth on the {1¯101} planes.
In this paper, a computational modeling analysis on cell growth is presented. This study aims at deriving a mathematical model for cell growth in order to understand, analyze and predict the complex mechanisms of cell...
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Consumer electronic devices (CEDs) contain toxic materials including heavy metals and brominated flame retardants that can pose a threat to public and environmental health if improperly disposed Recent legislation ena...
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LiNbO3 thin films were deposited by dip coating Li-Nb alkoxide solutions onto silicate glass substrates and single crystal sapphire substrates. Microstructural characterization using transmission electron microscopy (...
LiNbO3 thin films were deposited by dip coating Li-Nb alkoxide solutions onto silicate glass substrates and single crystal sapphire substrates. Microstructural characterization using transmission electron microscopy (TEM) showed significant differences in film microstructures dependent on the initial solution chemistry. Fully crystalline films could be obtained after heat treatments at 400°C in air. The grain size and porosity were dependent on the amount of water of hydrolysis in the alkoxide sol. The higher the water content, the larger the grain size and porosity. Crystallization studies of nucleation and growth of LiNbO3 for films heat treated from 300–600°C indicated that higher temperatures or long soak times generated large facetted grain structures. Single crystalline films were obtained on (0001) sapphire substrates.
We report a structural analysis of GaN layers with thicknesses ranging from 10 u,m to 250 µm which have been grown on sapphire substrates by halide vapor phase epitaxy (HVPE). The effect of growth rate during HVP...
We report a structural analysis of GaN layers with thicknesses ranging from 10 u,m to 250 µm which have been grown on sapphire substrates by halide vapor phase epitaxy (HVPE). The effect of growth rate during HVPE growth has also been examined. The growth was performed using GaCl and ammonia as reactants; growth rates in excess of 90 u.m/hr have been achieved. The structural characteristics of these layers have been performed wit'i high resolution x-ray diffractometry. Longitudinal scans parallel to the GaN [0002] direction, transverse scans perpendicular to the [0002], and reciprocal space maps of the total diffracted intensity have been obtained from a variety of GaN layers. The transverse scans typically show broad rocking curves with peak breadths of several hundreds of arcseconds. In contrast, the longitudinal scans (or “9/20 scans") which are sensitive only to strains in the GaN layers (and not their mosaic distributions) showed peak widths that were at least an order of magnitude smaller and in some cases were as narrow as 16 arcseconds. These results suggest that the defect structure of the GaN layers grown by HVPE is dominated by a dislocation-induced mosaic distribution, with the effects of strain in these materials being negligible in comparison.
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